Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2014Aberration measurement based on principal component analysis of aerial images of optimized marks
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.
Journal Article
2014Aberration measurement technique based on an analytical linear model of a through-focus aerial image
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Erdmann, A.
Journal Article
2014A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask
Li, S.; Wang, X.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A.
Conference Paper
2014Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography
Liu, Xiaolei; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Erdmann, A.
Journal Article
2014Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography
Liu, X.; Wang, X.; Li, S.; Yan, G.; Erdmann, A.
Conference Paper
2014In situ aberration measurement method using a phase-shift ring mask
Wang, X.; Li, S.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A.
Conference Paper
2013High-order aberration measurement technique based on quadratic Zernike model with optimized source
Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.
Journal Article
2013In situ aberration measurement technique based on an aerial image with an optimized source
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Journal Article
2012In situ aberration measurement technique based on quadratic Zernike model
Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.
Conference Paper
2012In-situ aberration measurement technique based on aerial image with optimized source
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Conference Paper