Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Guest Editorial Joint Special Section on Power Conversion & Control in Photovoltaic Power Plants
Johnson, B.; Chang, L.; Afridi, K.; Ali, M.H.; Appen, J. von; Chen, Y.-M.; Davoudi, A.; Dhople, S.; Enslin, J.H.; Flicker, J.; Islam, R.; Koutroulis, E.; Kim, K.A.; Li, Y.; Liserre, M.; Long, T.; Lu, X.; Mattavelli, P.; Rodriguez, P.; Ruan, X.; Suntio, T.; Wang, H.; Xu, D.; Xu, W.; Yazdani, A.; Zeineldin, H.; Zhu, J.
Journal Article
2018Evaluation of thermo-energetic behavior for demand-oriented operating of machine tool cooling systems
Regel, J.; Xu, D.; Bräunig, M.; Wittstock, V.; Putz, M.
Journal Article, Conference Paper
2018The GaN trench gate MOSFET with floating islands
Shen, L.; Müller, S.; Cheng, X.; Zhang, D.; Zheng, L.; Xu, D.; Yu, Y.; Meissner, E.; Erlbacher, T.
Journal Article
2017Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography
Erdmann, A.; Xu, D.; Evanschitzky, P.; Philipsen, V.; Luong, V.; Hendrickx, E.
Journal Article
2017Reducing EUV mask 3D effects by alternative metal absorbers
Philipsen, V.; Luong, K.V.; Souriau, L.; Hendrickx, E.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.
Conference Paper
2017Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers
Philipsen, V.; Luong, K.V.; Souriau, L.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.; Hendrickx, E.
Journal Article
2016Extreme ultraviolet multilayer defect analysis and geometry reconstruction
Xu, D.; Evanschitzky, P.; Erdmann, A.
Journal Article
2016Inverse image modeling for defect detection and optical system characterization
Xu, Dongbo
: Erdmann, Andreas
Dissertation
2015Application of principal component analysis to EUV multilayer defect printing
Xu, D.; Evanschitzky, P.; Erdmann, A.
Conference Paper
2015Application of the transport of intensity equation to EUV multilayer defect analysis
Xu, D.; Evanschitzky, P.; Erdmann, A.
Conference Paper
2015Optical and EUV projection lithography: A computational view
Erdmann, A.; Fühner, T.; Evanschitzky, P.; Agudelo, V.; Freund, C.; Michalak, P.; Xu, D.B.
Journal Article
2014Aberration measurement based on principal component analysis of aerial images of optimized marks
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.
Journal Article
2014Aberration measurement technique based on an analytical linear model of a through-focus aerial image
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Erdmann, A.
Journal Article
2014Pixel-based defect detection from high-NA optical projection images
Xu, D.B.; Fühner, T.; Erdmann, A.
Journal Article
2013Defect inspection and detection using optical image projection
Xu, D.; Li, S.; Wang, X.; Erdmann, A.
Presentation
2013Defect parameters retrieval based on optical projection images
Xu, D.; Li, S.; Wang, X.; Fühner, T.; Erdmann, A.
Conference Paper
2013High-order aberration measurement technique based on quadratic Zernike model with optimized source
Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.
Journal Article
2013In situ aberration measurement technique based on an aerial image with an optimized source
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Journal Article
2012Guidelines for the use and interpretation of assays for monitoring autophagy
Klionsky, D.J.; Abdalla, F.C.; Abeliovich, H.; Abraham, R.T.; Acevedo-Arozena, A.; Adeli, K.; Agholme, L.; Agnello, M.; Agostinis, P.; Aguirre-Ghiso, J.A.; Ahn, H.J.; Ait-Mohamed, O.; Ait-Si-Ali, S.; Akematsu, T.; Akira, S.; Al-Younes, H.M.; Al-Zeer, M.A.; Albert, M.L.; Albin, R.L.; Alegre-Abarrategui, J.; Aleo, M.F.; Alirezaei, M.; Almasan, A.; Almonte-Becerril, M.; Amano, A.; Amaravadi, R.; Amarnath, S.; Amer, A.O.; Andrieu-Abadie, N.; Anantharam, V.; Ann, D.K.; Anoopkumar-Dukie, S.; Aoki, H.; Apostolova, N.; Arancia, G.; Aris, J.P.; Asanuma, K.; Asare, N.Y.O.; Ashida, H.; Askanas, V.; Askew, D.S.; Auberger, P.; Baba, M.; Backues, S.K.; Baehrecke, E.H.; Bahr, B.A.; Bai, X.-Y.; Bailly, Y.; Baiocchi, R.; Baldini, G.; Balduini, W.; Ballabio, A.; Bamber, B.A.; Bampton, E.T.W.; Bánhegyi, G.; Bartholomew, C.R.; Bassham, D.C.; Bast Jr., R.C.; Batoko, H.; Bay, B.-H.; Beau, I.; Béchet, D.M.; Begley, T.J.; Behl, C.; Behrends, C.; Bekri, S.; Bellaire, B.; Bendall, L.J.; Benetti, L.; Berliocchi, L.; Bernardi,
Journal Article
2012In situ aberration measurement technique based on quadratic Zernike model
Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A.
Conference Paper
2012In-situ aberration measurement technique based on aerial image with optimized source
Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A.
Conference Paper