Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2015Imaging of phase change materials below a capping layer using correlative infrared near-field microscopy and electron microscopy
Lewin, M.; Hauer, B.; Bornhöfft, M.; Jung, L.; Benke, J.; Michel, A.-K.U.; Mayer, J.; Wuttig, M.; Taubner, T.
Journal Article
2014Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering
Schmidt, R.M.; Ries, P.; Pflug, A.; Wuttig, M.; Kubart, T.
Journal Article
2013Advanced properties of Al-doped ZnO films with a seed layer approach for industrial thin film photovoltaic application
Dewald, W.; Sittinger, V.; Szyszka, B.; Säuberlich, F.; Stannowski, B.; Köhl, D.; Ries, P.; Wuttig, M.
Journal Article
2012Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
Kubart, T.; Schmidt, R.M.; Austgen, M.; Nyberg, T.; Pflug, A.; Siemers, M.; Wuttig, M.; Berg, S.
Journal Article
2011Sputter yield amplification by tungsten doping of Al2O 3 employing reactive serial co-sputtering: Process characteristics and resulting film properties
Austgen, M.; Koehl, D.; Zalden, P.; Kubart, T.; Nyberg, T.; Pflug, A.; Siemers, M.; Berg, S.; Wuttig, M.
Journal Article
2010Low damping resonant magnetoelectric sensors
Greve, H.; Woltermann, E.; Jahns, R.; Marauska, S.; Wagner, B.; Knöchel, R.; Wuttig, M.; Quandt, E.
Journal Article
2010Modelling of sputtering yield amplification effect in reactive deposition of oxides
Kubart, T.; Nyberg, T.; Pflug, A.; Siemers, M.; Austgen, M.; Koehl, D.; Wuttig, M.; Berg, S.
Journal Article
2010Rotatable target serial co-sputtering
Szyszka, B.; Pflug, A.; Sittinger, V.; Ulrich, S.; Vergöhl, M.; Werner, W.; Kaiser, A.; Jung, S.; Bringmann, U.; Bräuer, G.; Köhl, D.; Austgen, M.; Wuttig, M.; Weis, H.; Herwig, W.; Polle, A.; Herlitze, L.
Conference Paper
2009Increase of the deposition rate in reactive sputtering of metal oxides using a ceramic nitride target
Severin, D.; Kappertz, O.; Nyberg, T.; Berg, S.; Pflug, A.; Wuttig, M.
Journal Article
2008Sputtering yield amplification for targets operated in reactive mode
Kubart, T.; Nyberg, T.; Pflug, A.; Kohl, D.; Wuttig, M.; Berg, S.
Conference Paper
2008Tailoring of structure formation and phase composition in reactively sputtered zirconium oxide films using nitrogen as an additional reactive gas
Severin, D.; Sarakinos, K.; Kappertz, O.; Pflug, A.; Wuttig, M.
Journal Article
2006Plasma stabilization and structure formation during reactive sputtering of metal oxides
Severin, D.; Wuttig, M.; Kappertz, O.; Nyberg, T.; Pflug, A.; Siemers, M.
Conference Paper
2006Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides
Severin, D.; Kappertz, O.; Kubart, T.; Nyberg, T.; Berg, S.; Pflug, A.; Siemers, M.; Wuttig, M.
Journal Article
2005Heuristische Simulation der Plasma-Impedanz beim reaktiven Magnetron-Sputtern
Pflug, A.; Siemers, M.; Szyszka, B.; Kappertz, O.; Nyberg, T.; Berg, S.; Severin, D.; Wuttig, M.
Conference Paper
2000Minimum time for laser induced amorphization of Ge2Sb2Te5 films
Weidenhof, V.; Pirch, N.; Friedrich, I.; Ziegler, S.; Wuttig, M.
Journal Article