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| 2007 | Verfahren zur Herstellung von dotierten Halbleiterbauelementen, insbesondere fuer die Solartechnik
Windbracke, W.; Bernt, H.; Neumann, G.; Futscher, H. | Patent |
| 1996 | Micro coils fabricated by UV depth lithography and galvanoplating
Löchel, B.; Maciossek, A.; Rothe, M.; Windbracke, W. | Journal Article |
| 1993 | Schnelle thermische Oxidation von Silizium in N2O-Atmosphäre
Lange, P.; Hartmannsgruber, E.; Naumann, F.; Windbracke, W. | Conference Paper |
| 1993 | Shallow junction formation by dopant outdiffusion from CoSi2 and its application in sub 0.5 mu m MOS processes
Niazmand, M.; Friedrich, D.; Windbracke, W. | Conference Paper |
| 1992 | Complete X-ray lithography processing of an 8-level 0.4 micron CMOS test device
Staudt-Fischbach, P.; Windbracke, W.; Bernt, H.; Zwicker, G.; Friedrich, D.; Hemicker, P.; Lange, P.; Schliwinski, H.-J.; Huber, H.-L.; Scheunemann, U.; Simon, K. | Conference Paper |
| 1992 | Stress modification and characterization of thin SiC films grown by plasma-enhanced chemical vapour deposition
Schliwinski, H.-J.; Pelka, M.; Windbracke, W.; Lange, P.; Buchmann, L.-M.; Csepregi, L. | Journal Article |
| 1992 | Thermal annealing effects on the mechanical properties of plasma-enhanced chemical vapor deposited silicon oxide films
Schliwinski, H.-J.; Schnakenberg, U.; Windbracke, W.; Neff, H.; Lange, P. | Journal Article |
| 1991 | A 0.25 mu m NMOS transistor fabricated with X-ray lithography
Breithaupt, B.; David, H.H.; Ballhorn, R.; Jacobs, E.P.; Windbracke, W.; Zwicker, G. | Conference Paper |
| 1991 | A 0.4 mym CMOS test circuit completely processed with 8-level X-ray lithography
Friedrich, D.; Windbracke, W.; Bernt, H.; Zwicker, G.; Staudt-Fischbach, P.; Hermicker, P.; Lange, P.; Pelka, M.; Schliwinski, H.-J. | Conference Paper |
| 1991 | Electrical and structural properties of ultrathin SiO2 gate dielectrics prepared under various conditions
Lange, P.; Schmidt, L.; Pelka, M.; Hemicker, P.; Bernt, H.; Windbracke, W. | Conference Paper |
| 1990 | Comparison between surface channel PMOS transistors processed with optical and X-ray lithography with regard to X-ray damage
Naumann, F.; Bernt, H.; Friedrich, D.; Kaatz, A.; Windbracke, W. | Conference Paper |
| 1990 | Verfahren zur Herstellung einer Schicht aus amorphem Silizium-Karbid
Csepregi, L.; Schliwinski, H.-J.; Pelka, M.; Windbracke, W. | Patent |
| 1989 | Application of pulse plating to form lead absorber patterns for x-ray masks
Löchel, B.; Trube, J.; Windbracke, W.; Huber, H.-L. | Journal Article |
| 1989 | Characterization of thermal and deposited thin oxide layers by LO-TO excitation in FTIR-transmission measurements
Lange, P.; Windbracke, W. | Journal Article |
| 1989 | Fabrication of 0.5 mym MOS test devices by application of X-ray lithography at all levels
Friedrich, D.; Bernt, H.; Windbracke, W.; Zwicker, G.; Huber, H.-L. | Conference Paper |
| 1989 | Fabrication of 0.5 myn- and p-type metal-oxide-semiconductor test devices using x-ray lithography
Zwicker, G.; Windbracke, W.; Bernt, H.; Friedrich, D.; Huber, H.-L.; Krullmann, E.; Pelka, M.; Lange, P.; Hermicker, P.; Staudt-Fischbach, P. | Journal Article |
| 1989 | Fabrication of sub-half mym patterns for MOS devices by beams of X-ray lithography and plasma etching
Windbracke, W.; Huber, H.-L.; Staudt, P.; Zwicker, G. | Journal Article |
| 1989 | Field isolation using shallow trenches for submicron CMOS technology
Zwicker, G.; Lange, P.; Staudt-Fischbach, P.; Windbracke, W. | Conference Paper |
| 1989 | Selective tungsten metallization for 0.5 mym MOS processes
Friedrich, D.; Staudt-Fischbach, P.; Windbracke, W.; Wagenaar, D. | Conference Paper |
| 1989 | State of the art of pattern placement accuracy of silicon X-ray master masks
Pongratz, S.; Mescheder, U.; Ehrlich, C.; Huber, H.-L.; Kohlmann, K.; Windbracke, W. | Conference Paper |
| 1988 | Roentgenmaske aus mit Siliziumnitridschichten kombiniertem Silizium und Verfahren zu ihrer Herstellung
Betz, H.; Csepregi, L.; Huber, H.L.; Windbracke, W. | Patent |
| 1988 | Subhalf micron critical dimension control in X-ray lithography mask technology
Mescheder, U.; Mund, F.; Trube, J.; Windbracke, W.; Huber, H.-L.; Pongratz, S. | Conference Paper |
| 1987 | Application of lead electroplating for X-ray absorber patterning
Trube, J.; Huber, H.-L.; Löchel, B.; Windbracke, W. | Journal Article |
| 1986 | Critical dimension control in x-ray masks with electroplated gold absorbers
Windbracke, W.; Betz, H.; Huber, H.-L.; Pilz, W.; Pongratz, S. | Conference Paper |
| 1986 | Silicon x-ray masks - pattern placement and overlay accuracy
Betz, H.; Huber, H.-L.; Pongratz, S.; Rohrmoser, W.; Windbracke, W.; Mescheder, U. | Conference Paper |