Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Ferroelectric and pyroelectric properties of polycrystalline La-doped HfO2 thin films
Mart, Clemens; Kühnel, Kati; Kämpfe, Thomas; Zybell, Sabine; Weinreich, Wenke
Journal Article
20183D Analysis of Thin Layers by ToF-SIMS
Mohammadian Kia, Alireza; Esmaeili, Sajjad; Mart, Clemens; Utriainen, Mikko; Haufe, Nora; Puurunen, Riikka L.; Weinreich, Wenke
Poster
2018CMOS compatible pyroelectric applications enabled by doped HfO2 films on deep-trench structures
Mart, Clemens; Weinreich, Wenke; Czernohorsky, Malte; Riedel, Stefan; Zybell, Sabine; Kühnel, Kati
Conference Paper
2018Frequency domain analysis of pyroelectric response in silicon-doped hafnium oxide (HfO2) thin films
Mart, Clemens; Czernohorsky, Malte; Zybell, Sabine; Kämpfe, Thomas; Weinreich, Wenke
Journal Article
2018Layer thickness scaling and wake-up effect of pyroelectric response in Si-doped HfO2
Mart, Clemens; Kämpfe, Thomas; Zybell, Sabine; Weinreich, Wenke
Journal Article
2018Lithium Detection and Tracking for Solid State Battery Test Stacks
Mohammadian Kia, Alireza; Haufe, Nora; Zybell, Sabine; Bönhardt, Sascha; Kühnel, Kati; Speulmanns, Jan K.; Weinreich, Wenke
Poster
2018Reliable high-density energy storage in Si-doped HfO2 thin films on 3D-structures
Kühnel, Kati; Riedel, Stefan; Mart, Clemens; Weinreich, Wenke
Presentation
2018Ultrathin Lithium Ion Diffusion Barrier for On-Chip 3D All-Solid-State Batteries
Speulmanns, Jan; Zybell, Sabine; Mohammadian Kia, Alireza; Bönhardt, Sascha; Weinreich, Wenke; Liske, Romy
Poster
2017Capacitance maximization of ultra-thin Si-capacitors by atomic layer deposition of anti-ferroelectric HfO2 in high aspect ratio structures
Riedel, Stefan; Weinreich, Wenke; Mart, Clemens; Müller, Johannes
Presentation
2017Development of metal oxide processes for highly conformal thin layers by plasma enhanced atomic layer deposition
Kia, Alireza Mohammadian
: Hiller, Karla (Betreuer); Weinreich, Wenke (Betreuer)
Master Thesis
2017Erhöhung der Zuverlässigkeit von High-k Dielektrika für integrierte hochkapazitive Kondensatoren
Mart, Clemens
: Weber, Jörg (Gutachter); Lakner, Hubert (Gutachter); Weinreich, Wenke (Betreuer)
Master Thesis
2017Nano-powerplant for on-chip autonomous systems
Weinreich, Wenke
Presentation
2016Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Kühnel, Kati; Riedel, Stefan; Weinreich, Wenke; Thrun, Xaver; Czernohorsky, Malte; Pätzold, Björn; Rudolph, Matthias
Presentation
2016La-doped ZrO2 based Back End of Line (BEoL) decoupling capacitors
Weinreich, Wenke; Seidel, Konrad; Polakowski, Patrick; Drescher, Maximilian; Gummenscheimer, A.; Nolan, M.G.; Cheng, L.; Triyoso, D.H.
Poster
2014ALD ZrO2 processes for BEoL device applications
Weinreich, Wenke; Seidel, Konrad; Polakowski, Patrick; Riedel, Stefan; Wilde, Lutz; Sundqvist, Jonas; Triyoso, Dina H.; Nolan, Mark G.
Conference Paper
2014Characterization of a chloride-based titanium nitride atomic layer deposition process for back-end-of-line devices
Neuber, Markus
: Weinreich, Wenke (Betreuer)
Master Thesis
2014Ferroelectric deep trench capacitors based on Al:HfO2 for 3D nonvolatile memory applications
Polakowski, Patrick; Riedel, Stefan; Weinreich, Wenke; Rudolf, M.; Sundqvist, Jonas; Seidel, Konrad; Müller, Johannes
Conference Paper
2013Herstellung und Charakterisierung ultradünner ZrO2-basierter Schichten als Isolatoren in Metall-Isolator-Metall Kondensatoren
Weinreich, Wenke
Dissertation
2013High-density capacitors for SiP and SoC applications based on three-dimensional integrated metal-isolator-metal structures
Weinreich, Wenke; Rudolph, Matthias; Koch, Johannes; Paul, Jan; Seidel, Konrad; Riedel, Stefan; Sundqvist, Jonas
Conference Paper
2013Optimized electrode and interface for enhanced reliability of high-k based metal-insulator-metal capacitors
Koch, Johannes; Seidel, Konrad; Weinreich, Wenke; Riedel, Stefan; Chiang, Jung-Chin; Beyer, Volkhard
Journal Article
2013Reliability comparison of pure ZrO2 and Al- doped ZrO2 MIM capacitors
Seidel, K.; Weinreich, Wenke; Polakowski, P.; Triyoso, D.H.; Nolan, M.G.; Yiang, K.Y.; Chu, S.
Conference Paper