Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Development of Rutile Titanium Oxide Thin Films as Battery Material Component Using Atomic Layer Deposition
Kia, A.M.; Bönhardt, S.; Zybell, S.; Kühnel, K.; Haufe, N.; Weinreich, W.
Journal Article
2019Electrocaloric temperature change in ferroelectric Si-doped hafnium oxide (HfO2) thin films
Mart, C.; Kämpfe, T.; Pätzold, B.; Rudolph, M.; Czernohorsky, M.; Müller, J.; Weinreich, W.
Presentation
2019Ferroelectric and pyroelectric properties of polycrystalline La-doped HfO2 thin films
Mart, Clemens; Kühnel, Kati; Kämpfe, Thomas; Zybell, Sabine; Weinreich, Wenke
Journal Article
2019Formation of highly conformal spinel lithium titanate thin films based on a novel three-step atomic layer deposition process
Bönhardt, S.; Kühnel, K.; Kia, A.M.; Weinreich, W.
Journal Article
2019High-density energy storage in Si-doped hafnium oxide thin films on area-enhanced substrates
Kühnel, Kati; Czernohorsky, M.; Riedel, Steffen; Mart, Clemens; Weinreich, Wenke
Journal Article
2019Pyroelectric Energy Conversion in Doped Hafnium Oxide (HfO2) Thin Films on Area-Enhanced Substrates
Hanrahan, B.; Mart, C.; Kämpfe, T.; Czernohorsky, M.; Weinreich, W.; Smith, A.
Journal Article
20183D Analysis of Thin Layers by ToF-SIMS
Mohammadian Kia, Alireza; Esmaeili, Sajjad; Mart, Clemens; Utriainen, Mikko; Haufe, Nora; Puurunen, Riikka L.; Weinreich, Wenke
Poster
2018CMOS compatible pyroelectric applications enabled by doped HfO2 films on deep-trench structures
Mart, Clemens; Weinreich, Wenke; Czernohorsky, Malte; Riedel, Stefan; Zybell, Sabine; Kühnel, Kati
Conference Paper
2018Frequency domain analysis of pyroelectric response in silicon-doped hafnium oxide (HfO2) thin films
Mart, Clemens; Czernohorsky, Malte; Zybell, Sabine; Kämpfe, Thomas; Weinreich, Wenke
Journal Article
2018Layer thickness scaling and wake-up effect of pyroelectric response in Si-doped HfO2
Mart, Clemens; Kämpfe, Thomas; Zybell, Sabine; Weinreich, Wenke
Journal Article
2018Lithium Detection and Tracking for Solid State Battery Test Stacks
Mohammadian Kia, Alireza; Haufe, Nora; Zybell, Sabine; Bönhardt, Sascha; Kühnel, Kati; Speulmanns, Jan K.; Weinreich, Wenke
Poster
2018Reliable high-density energy storage in Si-doped HfO2 thin films on 3D-structures
Kühnel, Kati; Riedel, Stefan; Mart, Clemens; Weinreich, Wenke
Presentation
2018Ultrathin Lithium Ion Diffusion Barrier for On-Chip 3D All-Solid-State Batteries
Speulmanns, Jan; Zybell, Sabine; Mohammadian Kia, Alireza; Bönhardt, Sascha; Weinreich, Wenke; Liske, Romy
Poster
2018Wake-up effect of pyroelectric response in doped HfO2
Mart, Clemens; Kämpfe, Thomas; Zybell, Sabine; Weinreich, Wenke
Abstract
2017Capacitance maximization of ultra-thin Si-capacitors by atomic layer deposition of anti-ferroelectric HfO2 in high aspect ratio structures
Riedel, Stefan; Weinreich, Wenke; Mart, Clemens; Müller, Johannes
Presentation
2017Development of metal oxide processes for highly conformal thin layers by plasma enhanced atomic layer deposition
Kia, Alireza Mohammadian
: Hiller, Karla (Betreuer); Weinreich, Wenke (Betreuer)
Master Thesis
2017Enhanced reliability and capacitance stability of ZrO2-based decoupling capacitors by interface doping with Al2O3
Mart, C.; Zybell, S.; Riedel, S.; Czernohorsky, M.; Seidel, K.; Weinreich, W.
Journal Article
2017Erhöhung der Zuverlässigkeit von High-k Dielektrika für integrierte hochkapazitive Kondensatoren
Mart, Clemens
: Weber, Jörg (Gutachter); Lakner, Hubert (Gutachter); Weinreich, Wenke (Betreuer)
Master Thesis
2017Nano-powerplant for on-chip autonomous systems
Weinreich, Wenke
Presentation
2016Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Kühnel, Kati; Riedel, Stefan; Weinreich, Wenke; Thrun, Xaver; Czernohorsky, Malte; Pätzold, Björn; Rudolph, Matthias
Presentation
2016La-doped ZrO2 based Back End of Line (BEoL) decoupling capacitors
Weinreich, Wenke; Seidel, Konrad; Polakowski, Patrick; Drescher, Maximilian; Gummenscheimer, A.; Nolan, M.G.; Cheng, L.; Triyoso, D.H.
Poster
2016La-doped ZrO2 based BEoL decoupling capacitors
Weinreich, W.; Seidel, K.; Polakowski, P.; Drescher, M.; Gummenscheimer, A.; Nolan, M.G.; Cheng, L.; Triyoso, D.H.
Conference Paper
2015Improved electrical behavior of ZrO2-based MIM structures by optimizing the O3 oxidation pulse time
Paskaleva, A.; Weinreich, W.; Bauer, A.J.; Lemberger, M.; Frey, L.
Journal Article
2015Ultra-Thin high density capacitors for advanced packaging solutions
Seidel, K.; Böttcher, M.; Dobritz, S.; Czernohorsky, M.; Riedel, S.; Weinreich, W.
Conference Paper
2014ALD Ta2O5 and Hf-doped Ta2O5 for BEOL compatible MIM
Triyoso, D.H.; Weinreich, W.; Seidel, K.; Nolan, M.G.; Polakowski, P.; Utess, D.; Ohsiek, S.; Dittmar, K.; Weisheit, M.; Liebau, M.; Fox, R.
Conference Paper
2014ALD ZrO2 processes for BEoL device applications
Weinreich, Wenke; Seidel, Konrad; Polakowski, Patrick; Riedel, Stefan; Wilde, Lutz; Sundqvist, Jonas; Triyoso, Dina H.; Nolan, Mark G.
Conference Paper
2014Characterization of a chloride-based titanium nitride atomic layer deposition process for back-end-of-line devices
Neuber, Markus
: Weinreich, Wenke (Betreuer)
Master Thesis
2014Ferroelectric deep trench capacitors based on Al:HfO2 for 3D nonvolatile memory applications
Polakowski, Patrick; Riedel, Stefan; Weinreich, Wenke; Rudolf, M.; Sundqvist, Jonas; Seidel, Konrad; Müller, Johannes
Conference Paper
2014Understanding the materials, electrical and reliability impact of Al-addition to ZrO2 for BEOL compatible MIM capacitors
Triyoso, D.H.; Chu, S.; Seidel, K.; Weinreich, W.; Yiang, K.-Y.; Nolan, M.G.; Brunco, D.P.; Rinderknecht, J.; Utess, D.; Kyono, C.; Miller, R.; Park, J.; Cheng, L.; Liebau, M.; Lomtscher, P.; Fox, R.
Conference Paper
2013Detailed leakage current analysis of metal-insulator-metal capacitors with ZrO2, ZrO2/SiO2/ZrO2, and ZrO2/Al2O3/ZrO2 as dielectric and TiN electrodes
Weinreich, W.; Shariq, A.; Seidel, K.; Sundqvist, J.; Paskaleva, A.; Lemberger, M.; Bauer, A.J.
Journal Article, Conference Paper
2013Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories
Müller, J.; Böscke, T.S.; Müller, S.; Yurchuk, E.; Polakowski, P.; Paul, J.; Martin, D.; Schenk, T.; Khullar, K.; Kersch, A.; Weinreich, W.; Riedel, S.; Seidel, K.; Kumar, A.; Arruda, T.M.; Kalinin, S.V.; Schlösser, T.; Boschke, R.; Bentum, R. van; Schröder, U.; Mikolajick, T.
Conference Paper
2013Herstellung und Charakterisierung ultradünner ZrO2-basierter Schichten als Isolatoren in Metall-Isolator-Metall Kondensatoren
Weinreich, Wenke
Dissertation
2013High-density capacitors for SiP and SoC applications based on three-dimensional integrated metal-isolator-metal structures
Weinreich, Wenke; Rudolph, Matthias; Koch, Johannes; Paul, Jan; Seidel, Konrad; Riedel, Stefan; Sundqvist, Jonas
Conference Paper
2013Mesoscopic analysis of leakage current suppression in ZrO2/Al2O3/ZrO2 nano-laminates
Martin, D.; Grube, M.; Weinreich, W.; Müller, J.; Weber, W.M.; Schröder, U.; Riechert, H.; Mikolajick, T.
Journal Article
2013Optimized electrode and interface for enhanced reliability of high-k based metal-insulator-metal capacitors
Koch, Johannes; Seidel, Konrad; Weinreich, Wenke; Riedel, Stefan; Chiang, Jung-Chin; Beyer, Volkhard
Journal Article
2013Reliability comparison of pure ZrO2 and Al- doped ZrO2 MIM capacitors
Seidel, K.; Weinreich, Wenke; Polakowski, P.; Triyoso, D.H.; Nolan, M.G.; Yiang, K.Y.; Chu, S.
Conference Paper
2013Scaling and optimization of high-density integrated Si-capacitors
Weinreich, W.; Seidel, K.; Rudolph, M.; Koch, J.; Paul, J.; Riedel, S.; Sundqvist, J.; Steidel, K.; Gutsch, M.; Beyer, V.; Hohle, C.
Conference Paper
2013Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping
Weinreich, W.; Wilde, L.; Müller, J.; Sundqvist, J.; Erben, E.; Heitmann, J.; Lemberger, M.; Bauer, A.J.
Journal Article
2013TEMAZ/O-3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal-insulator-metal capacitors
Weinreich, W.; Tauchnitz, T.; Polakowski, P.; Drescher, M.; Riedel, S.; Sundqvist, J.; Seidel, K.; Shirazi, M.; Elliott, S.D.; Ohsiek, S.; Erben, E.; Trui, B.
Journal Article
2012Effect of different PDAs and a PMA on the electrical performance of TiN/ZAZ/TiN MIM capacitors
Weinreich, W.; Seidel, K.; Sundqvist, J.; Czernohorsky, M.; Kucher, P.
Conference Paper
2012Role of defect relaxation for trap-assisted tunneling in high-K thin films
Jegert, G.; Popescu, D.; Lugli, P.; Häufel, M.J.; Weinreich, W.; Kersch, A.
Journal Article
2011Macroscopic and microscopic electrical characterizations of high-k ZrO 2 and ZrO2/Al2O3/ZrO2 metal-insulator-metal structures
Martin, D.; Grube, M.; Weinreich, W.; Müller, J.; Wilde, L.; Erben, E.; Weber, W.M.; Heitmann, J.; Schröder, U.; Mikolajick, T.; Riechert, H.
Journal Article
2011Monte Carlo simulation of leakage currents in TiN/ZrO2/TiN capacitors
Jegert, G.; Kersch, A.; Weinreich, W.; Lugli, P.
Journal Article
2011Ultimate scaling of TiN/ZrO2/TiN capacitors: Leakage currents and limitations due to electrode roughness
Jegert, G.; Kersch, A.; Weinreich, W.; Lugli, P.
Journal Article
2010Modeling of leakage currents in high-k dielectrics: Three-dimensional approach via kinetic Monte Carlo
Jegert, G.; Kersch, A.; Weinreich, W.; Schröder, U.; Lugli, P.
Journal Article
2010Reliability of Al2O3-doped ZrO2 high-k dielectrics in three-dimensional stacked metal-insulator-metal capacitors
Zhou, D.; Schroeder, U.; Xu, J.; Weinreich, W.; Heitmann, J.; Jegert, G.; Kerber, M.; Knebel, S.; Erben, E.; Mikolajick, T.
Journal Article
2009Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2-x thin films using tunneling atomic force microscopy
Weinreich, W.; Wilde, L.; Kücher, P.; Lemberger, M.; Yanev, V.; Rommel, M.; Bauer, A.J.; Erben, E.; Heitmann, J.; Schröder, U.; Oberbeck, L.
Conference Paper, Journal Article
2009Detailed correlation of electrical and breakdown characteristics to the structural properties of ALD grown HfO2- and ZrO2-based capacitor dielectrics
Schroeder, U.; Weinreich, W.; Erben, E.; Mueller, J.; Wilde, L.; Heitmann, J.; Agaiby, R.; Zhou, D.; Jegert, G.; Kersch, A.
Conference Paper
2009Impact of interface variations on J-V and C-V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1-x)AlxO2 films
Weinreich, W.; Reiche, R.; Lemberger, M.; Jegert, G.; Müller, J.; Wilde, L.; Teichert, S.; Heitmann, J.; Erben, E.; Oberbeck, L.; Schröder, U.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2009Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition
Müller, J.; Böscke, T.S.; Schröder, U.; Reinicke, M.; Oberbeck, L.; Zhou, D.; Weinreich, W.; Kücher, P.; Lemberger, M.; Frey, L.
Conference Paper, Journal Article
2009Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers
Weinreich, W.; Ignatova, V.A.; Wilde, L.; Teichert, S.; Lemberger, M.; Bauer, A.J.; Reiche, R.; Erben, E.; Heitmann, J.; Oberbeck, L.; Schröder, U.
Journal Article
2009Influence of the amorphous/crystalline phase of Zr1-xAlxO2 high-k layers on the capacitance performance of metal insulator metal stacks
Pakaleva, A.; Lemberger, M.; Bauer, A.J.; Weinreich, W.; Heitmann, J.; Erben, E.; Schröder, U.; Oberbeck, L.
Journal Article
2009Search for future high-k dielectrics, boundary conditions and examples
Bauer, A.J.; Lemberger, M.; Erlbacher, T.; Weinreich, W.
Conference Paper
2008High-k: Latest developments and perspectives
Bauer, A.J.; Lemberger, M.; Erlbacher, T.; Weinreich, W.
Book Article
2008Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics
Yanev, V.; Rommel, M.; Lemberger, M.; Petersen, S.; Amon, B.; Erlbacher, T.; Bauer, A.J.; Ryssel, H.; Paskalev, A.; Weinreich, W.; Fachmann, C.; Heitmann, J.; Schroeder, U.
Journal Article
2007Thermal stability of thin ALD ZrO2 layers as dielectrics in deep trench DRAM devices annealed in N2 and NH3
Weinreich, W.; Lemberger, M.; Erben, E.; Heitmann, J.; Wilde, L.; Ignatova, V.A.; Teichert, S.; Schröder, U.; Oberbeck, L.; Bauer, A.J.; Ryssel, H.; Kücher, P.
Poster
2007Verification of grain boundaries in annealed thin ZrO2 films by electrical AFM technique
Yanev, V.; Paskaleva, A.; Weinreich, W.; Lemberger, M.; Petersen, S.; Rommel, M.; Bauer, A.J.; Ryssel, H.
Poster