Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2015Mask Aligner Lithography for TSV-Structures using a Double-Sided (structured) Photomask
Weichelt, Tina; Stuerzebecher, Lorenz; Zeitner, Uwe Detlef
Conference Paper
2015Optimized lithography process for through-silicon vias-fabrication using a double-sided (structured) photomask for mask aligner lithography
Weichelt, Tina; Stürzebecher, Lorenz; Zeitner, Uwe D.
Journal Article
2012AMALITH: Advanced mask aligner lithography
Bramati, Arianna; Weichelt, Tina; Stürzebecher, Lorenz; Meliorisz, Balint; Vogler, Uwe; Voelkel, Reinhard
Conference Paper