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| 2012 | Advanced anti-reflection and passivation layer systems produced by high-power plasma in the new manz PECVD system
Schwarz, F.; Beckmann, R.; Kohn, N.; Nölker, S.; Kastl, S.; Hofmann, M.; Ferré, R.; Pernau, T.; Wanka, H.; Rentsch, J. | Conference Paper |
| 2008 | Plasma enhanced CVD and plasma chemical etching at atmospheric pressure for continuous processing of crystallien silicon solar wafers
Lopez, E.; Dresler, B.; Mäder, G.; Dani, I.; Hopfe, V.; Kaskel, S.; Heintze, M.; Möller, R.; Wanka, H.; Kirschmann, M.; Frenck, J.; Poruba, A.; Barinka, R.; Dahl, R.; Nussbaumer, H. | Conference Paper |
| 2007 | In-line plasma etching at atmospheric pressue for edge isolation in crystalline Si solar cells
Heintze, M.; Hauser, A.; Möller, R.; Wanka, H.; Lopez, E.; Dani, I.; Hopfe, V.; Müller, J.W.; Huwe, A. | Conference Paper |
| 2007 | New developments in plasma enhanced chemical etching at atmospheric pressure for crystalline silicon wafer processing
Lopez, E.; Beese, H.; Mäder, G.; Dani, I.; Hopfe, V.; Heintze, M.; Moeller, R.; Wanka, H.; Kirschmann, M.; Frenck, J.A. et al. | Conference Paper |
| 2007 | Verfahren zur Entfernung einer dotierten Oberflaechenschicht an Rueckseiten von kristallinen Silizium-Solarwafern
Hopfe, V.; Dani, I.; Rosina, M.; Heintze, M.; Moeller, R.; Wanka, H.; Lopez, E. | Patent |
| 2006 | Atmospheric pressure PECVD and atmospheric plasma chemical etching for continuous processing of crystalline silicon solar wafers
Hopfe, V.; Dani, I.; Lopez, E.; Rosina, M.; Mäder, G.; Möller, R.; Wanka, H.; Heintze, M. | Conference Paper |
| 2006 | Dotiergermisch fuer die Dotierung von Halbleitern
Biro, D.; Voyer, C.; Wanka, H.; Koriath, J. | Patent |
| 2006 | Plasma enhanced chemical etching at atmospheric pressure for silicon wafer processing
Lopez, E.; Dani, I.; Hopfe, V.; Wanka, H.; Heintze, M.; Möller, R.; Hauser, A. | Conference Paper |
| 2006 | Plasma etching at atmospheric pressure for rear emitter removal in crystalline Si solar cells
Lopez, E.; Dani, I.; Hopfe, V.; Heintze, M.; Hauser, A.; Möller, R.; Wanka, H. | Conference Paper |
| 2005 | Progress in the use of sprayed phosphoric acid as an inexpensive dopant source for industrial solar cells
Voyer, C.; Biro, D.; Wagner, K.; Benick, J.; Preu, R.; Koriath, J.; Heintze, M.; Wanka, H.N. | Conference Paper |
| 2004 | Evaluation of dopant sources and deposition methods suitable for in-line diffusion in the PV industry
Voyer, C.; Biro, D.; Emanuel, G.; Preu, R.; Koriath, J.; Wanka, H. | Conference Paper |