Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2007Memetic algorithms: Parametric optimization for microlithography
Dürr, C.; Fühner, T.; Tollkühn, B.; Erdmann, A.; Kokai, G.
Book Article
2006Benchmark of a lithography simulation tool for next generation applications
Tollkühn, B.; Uhle, M.; Fuhrmann, J.; Gärtner, K.; Heubner, A.; Erdmann, A.
Conference Paper, Journal Article
2006Neue Methoden zur automatischen Kalibrierung von Modellparametern für die Simulation optischer Lithographieprozesse
Tollkühn, B.
Dissertation
2005Aerial image analysis for defective masks in optical lithography
Graf, T.; Erdmann, A.; Evanschitzky, P.; Tollkühn, B.; Eggers, K.; Ziebold, R.; Teuber, S.; Höllein, I.
Conference Paper
2005Correlation analysis: A fast and reliable method for a better understanding of simulation models in optical lithography
Tollkühn, B.; Heubner, A.; Elian, K.; Ruppenstein, B.; Erdmann, A.
Conference Paper
2005Simplified resist models for efficient simulation of contact holes and line ends
Tollkühn, B.; Erdmann, A.; Semmler, A.; Nölscher, C.
Conference Paper
2004Do we need complex resist models for predictive simulation of lithographic process performance?
Tollkühn, B.; Erdmann, A.; Lammers, J.; Nolscher, C.; Semmler, A.
Conference Paper
2004Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems
Fühner, T.; Erdmann, A.; Farkas, R.; Tollkühn, B.; Kokai, G.
Conference Paper
2004Methodology and practical application of an ArF resist model calibration
Ziebold, R.; Küchler, B.; Nölscher, C.; Rößiger, M.; Elian, K.; Tollkühn, B.
Conference Paper
2004Towards automatic mask and source optimization for optical lithography
Erdmann, A.; Fühner, T.; Schnattinger, T.; Tollkühn, B.
Conference Paper
2003Mask and source optimization for lithographic imaging systems
Erdmann, A.; Farkas, R.; Fühner, T.; Tollkühn, B.; Kokai, G.
Conference Paper
2003New models for the simulation of post-exposure bake of chemically amplified resist
Matiut, D.; Erdmann, A.; Tollkühn, B.; Semmler, A.
Conference Paper
2003Will Darwin's law help us to improve our resist models?
Tollkühn, B.; Fühner, T.; Matiut, D.; Erdmann, A.; Semmler, A.; Kuchler, B.; Kokai, B.
Conference Paper
2002New methods to calibrate simulation parameters for chemically amplified resists
Tollkuehn, B.; Erdmann, A.; Kivel, N.; Robertson, S.A.; Kang, D.; Hansen, S.G.; Fumar, P.A.; Tsann, B.C.; Hoppe, W.
Conference Paper
2001Automatic resist parameter calibration procedure for lithography simulation
Tollkuehn, B.; Hoepfl, M.; Erdmann, A.; Majoni, S.; Jess, M.
Conference Paper
2001Comparison of simulation approaches for chemically amplified resists
Erdmann, A.; Henke, W.; Robertson, S.; Richter, E.; Tollkühn, B.; Hoppe, W.
Conference Paper

 

<