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2012 | Large area PECVD process using dual rotatable magnetrons Fahland, M.; Neidhardt, J.; Thielsch, R.; Wahl, A.; Kleinhempel, R.; Blüthner, R.; Preussner, T. | Conference Paper |
2012 | Verfahren zur Modifizierung einer Oberfläche eines Substrats durch Ionenbeschuss Schulz, Ulrike; Schönberger, Waldemar; Munzert, Peter; Thielsch, Roland; Fahland, Matthias; Kleinhempel, Ronny | Patent |
2011 | Large-area fabrication of stochastic nano-structures on polymer webs by ion- and plasma treatment Schönberger, W.; Gerlach, G.; Fahland, M.; Munzert, P.; Schulz, U.; Thielsch, R.; Kleinhempel, R. | Journal Article, Conference Paper |
2006 | Correlation of optical, electrical and structural properties of metal oxide - silver multilayer stacks deposited onto polymer film by magnetron sputtering Thielsch, R.; Boehme, T.; Wahl, A.; Fahland, M.; Voigt, T.; Zysitzki, O. | Conference Paper |
2005 | Lanthanide tri-fluorides: A survey of the optical, mechanical and structural properties of thin films with emphasis of their use in the DUV - VUV - spectral range Uhlig, H.; Thielsch, R.; Heber, J.; Kaiser, N. | Conference Paper |
2005 | Optical, structural, and mechanical properties of gadolinium trifluoride thin films grown on amorphous substrates Thielsch, R.; Heber, J.; Uhlig, H.; Kaiser, N. | Conference Paper |
2005 | Verfahren zur Herstellung einer dielektrischen Reflexionsmaske Rubahn, K.; Ihlemann, J.; Thielsch, R. | Patent |
2004 | Development of mechanical stress in fluoride multilayers for UV applications Thielsch, R.; Heber, J.; Uhlig, H.; Kaiser, N. | Conference Paper |
2004 | Oxidation behaviour of thin silver films deposited on plastic web characterized by spectroscopic ellipsometry (SE) Sahm, H.; Charton, C.; Thielsch, R. | Conference Paper, Journal Article |
2004 | Reflektierendes Element fuer freie Elektronen Laserstrahlung, Verfahren zu seiner Herstellung uns seine Verwendung Gatto, A.; Kaiser, N.; Thielsch, R. | Patent |
2003 | Deep UV laser induced fluorescence in fluoride thin films Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N. | Journal Article |
2003 | Luminescence of UV thin films Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N.; Lewis, K.L.; Soileau, M.J.; Stolz, C.J. | Conference Paper |
2002 | 193 nm laser induced fluorescence in fluoride thin films Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N. | Journal Article |
2002 | 193 nm laser induced luminescence in oxide thin films Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N. | Journal Article |
2002 | A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition Thielsch, R.; Gatto, A.; Heber, J.; Kaiser, N. | Journal Article |
2002 | Deep UV laser induced luminescence in oxide thin films Heber, J.; Muhlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N. | Journal Article |
2002 | High-performance deep-ultraviolet optics for free-electron lasers Gatto, A.; Thielsch, R.; Heber, J.; Kaiser, N.; Ristau, D.; Günster, S.; Kohlhaas, J.; Marsi, M.; Trovo, M.; Walker, R.; Garzella, D.; Couprie, M.E.; Torchio, P.; Alvisi, M.; Amra, C. | Journal Article |
2002 | Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region Thielsch, R.; Gatto, A.; Kaiser, N. | Journal Article |
2001 | Absorption limited performance of SiO2/Al2O3 multi-layer coatings at 193nm - a systematic study Thielsch, R.; Heber, J.; Kaiser, N.; Apel, O.; Mann, K.; Ristau, D.; Blaschke, H.; Arens, W. | Conference Paper |
2001 | Achromatic damage investigations on mirrors for UV-free electron lasers Gatto, A.; Kaiser, N.; Thielsch, R.; Garzella, D.; Hirsch, M.; Nutarelli, D.; Ninno, G. de; Renault, E.; Couprie, M.E.; Torchio, P.; Alvisi, M.; Albrand, G.; Amra,C.; Marsi, M.; Trovo, M.; Walker, R.; Grewe, M.; Roger, J.P.; Boccara, C | Conference Paper |
2001 | High-performance DUV optics for Free Electron Lasers Gatto, A.; Thielsch, R.; Heber, J.; Kaiser, N.; Ristau, D.; Günster, S.; Kohlhaas, J.; Marsi, M.; Trovo, M.; Walker, R.; Garzella, D.; Couprie, M.E.; Torchio, P.; Alvisi, M.; Amra, C. | Conference Paper |
2001 | Mechanical stress and thermal-elastic properties of oxide coatings for use in the DUV spectral region Thielsch, R.; Gatto, A.; Kaiser, N. | Conference Paper |
2000 | Comparative study of the UV-optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion assisted deposition and plasma-ion-assisted deposition Thielsch, R.; Gatto, A.; Heber, J.; Martin, S.; Kaiser, N. | Conference Paper |
2000 | Comparison of the optical properties and UV radiation resistance of HfO2 single layers deposited by reactive evaporation, IAD, and PIAD Thielsch, R.; Feigl, T.; Kaiser, N.; Martin, S.; Scaglione, S.; Sarto, F.; Alvisi, M.; Rizzo, A. | Conference Paper |
2000 | Critical issues on the assessment of laser induced damage thresholds of fluoride multilayer coatings at 193 nm Thielsch, R.; Heber, J.; Kaiser, N.; Martin, S.; Welsch, E. | Conference Paper |
2000 | Magnetron sputtered EUV mirrors with high thermal stability Feigl, T.; Yulin, S.; Kaiser, N.; Thielsch, R. | Conference Paper |
2000 | Nonlinear absorption phenomena in oxide coatings for 193 nm Apel, O.; Mann, K.; Heber, J.; Thielsch, R. | Conference Paper |
2000 | Pulsed top-hat beam thermal lens: a simple and sensitive tool for in situ measurement on ultraviolet dielectric components Li, B.C.; Martin, S.; Welsch, E.; Thielsch, R.; Heber, J.; Kaiser, N. | Conference Paper |
2000 | Towards resistant UV mirrors at 200 nm for free electron lasers: Manufacture, characterizations, and degradation tests Gatto, A.; Thielsch, R.; Kaiser, N.; Hirsch, M.; Garzella, D.; Nutarelli, D.; Ninno, G. de; Renault, E.; Couprie, M.E.; Torchio, P.; Alvisi, M.; Albrand, G.; Amra, C.; Marsi, M.; Trovo, M. | Conference Paper |
1999 | ArF radiation resistance of optical coatings on CaF2 in relation to the surface finish of the substrate Thielsch, R.; Heber, J.; Duparre, A.; Kaiser, N.; Mann, K.R.; Eva, E. | Conference Paper |
1999 | Changes in optical interference coatings exposed to 193-nm excimer laser radiation Heber, J.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Leinhos, U.; Görtler, A. | Conference Paper |
1999 | Current status of radiation resistance of dielectric mirrors in the DUV Bernitzki, H.; Lauth, H.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Mann, K.R. | Conference Paper |
1999 | Influence of thermal substrate properties on the damage threshold of UV coatings Blaschke, H.; Martin, S.; Morak, A.; Königsdörfer, C.; Roth, M.; Bincheng, L.; Welsch, E.; Thielsch, R.; Kaiser, N. | Conference Paper |
1999 | Interference phenomena at trasparent layers in glow discharge optical emission spectrometry Hoffmann, V.; Kurt, R.; Kämmer, K.; Thielsch, R.; Wirth, T.; Beck, U. | Journal Article |
1999 | Interferenzschichtoptik für den ultravioletten Spektralbereich Ullmann, J.; Lauth, H.; Bernitzki, H.; Ristau, D.; Arens, W.; Thielsch, R.; Kaiser, N. | Journal Article |
1999 | Laser damage of optical coatings from UV to deep UV at 193 nm Dijon, J.; Quesnel, E.; Pelle, C.; Thielsch, R. | Conference Paper |
1999 | Laser resistivity and causes of damage in coating materials for 193 nm by photothermal methods Blaschke, H.; Thielsch, R.; Heber, J.; Kaiser, N.; Martin, S.; Welsch, E. | Conference Paper |
1999 | Mechanical stress in fluoride coatings Ullmann, J.; Keck, H.G.; Thielsch, R.; Uhlig, H.; Kaiser, N. | Conference Paper |
1999 | Metal-insulator transition in amorphous Si(1-x)Ni(x): Evidence for Mott's minimum metallic conductivity Möbius, A.; Frenzel, C.; Thielsch, R. | Journal Article |
1999 | The metal-insulator transition in amorphous Si1-cNic: so, was Mott right after all Möbius, A.; Frenzel, C.; Thielsch, R. | Conference Paper |
1999 | Microstructure and radiation interactions of optical interference coatings for 193 nm applications Heber, J.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Leinhos, U.; Görtler, A. | Conference Paper |
1999 | Structural and mechanical properties of evaporated pure and mixed MgF2-BaF2 thin films Thielsch, R.; Pommies, M.; Heber, J.; Kaiser, N.; Ullmann, J. | Conference Paper |
1999 | XPS studies and factoranalysis of PbS nanocrystal-doped SiO2 thin films Thielsch, R.; Reiche, R.; Oswald, S.; Wetzig, K. | Journal Article |
1998 | Optical, structural and mechanical properties of lanthanide trifluoride thin film materials for use in the DUV-spectral region Thielsch, R.; Heber, J.; Jakobs, S.; Kaiser, N.; Duparre, A.; Ullmann, J. | Conference Paper |
1998 | Quantum-size effects of PbS nanocrystallites in evaporated composite films Thielsch, R.; Böhme, T.; Reiche, R.; Schäfer, D.; Bauer, H.-D.; Böttcher, H. | Journal Article |
1998 | Stability of optical interference coatings exposed to low-fluence 193 nm ArF radiation Heber, J.; Thielsch, R.; Blaschke, H. | Conference Paper |
1997 | Properties of SiO2 and Al2O3 films for use in UV-optical coatings Thielsch, R.; Duparre, A.; Schulz, U.; Kaiser, N. | Conference Paper |