Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2012Large area PECVD process using dual rotatable magnetrons
Fahland, M.; Neidhardt, J.; Thielsch, R.; Wahl, A.; Kleinhempel, R.; Blüthner, R.; Preussner, T.
Conference Paper
2012Verfahren zur Modifizierung einer Oberfläche eines Substrats durch Ionenbeschuss
Schulz, Ulrike; Schönberger, Waldemar; Munzert, Peter; Thielsch, Roland; Fahland, Matthias; Kleinhempel, Ronny
Patent
2011Large-area fabrication of stochastic nano-structures on polymer webs by ion- and plasma treatment
Schönberger, W.; Gerlach, G.; Fahland, M.; Munzert, P.; Schulz, U.; Thielsch, R.; Kleinhempel, R.
Journal Article, Conference Paper
2006Correlation of optical, electrical and structural properties of metal oxide - silver multilayer stacks deposited onto polymer film by magnetron sputtering
Thielsch, R.; Boehme, T.; Wahl, A.; Fahland, M.; Voigt, T.; Zysitzki, O.
Conference Paper
2005Lanthanide tri-fluorides: A survey of the optical, mechanical and structural properties of thin films with emphasis of their use in the DUV - VUV - spectral range
Uhlig, H.; Thielsch, R.; Heber, J.; Kaiser, N.
Conference Paper
2005Optical, structural, and mechanical properties of gadolinium trifluoride thin films grown on amorphous substrates
Thielsch, R.; Heber, J.; Uhlig, H.; Kaiser, N.
Conference Paper
2005Verfahren zur Herstellung einer dielektrischen Reflexionsmaske
Rubahn, K.; Ihlemann, J.; Thielsch, R.
Patent
2004Development of mechanical stress in fluoride multilayers for UV applications
Thielsch, R.; Heber, J.; Uhlig, H.; Kaiser, N.
Conference Paper
2004Oxidation behaviour of thin silver films deposited on plastic web characterized by spectroscopic ellipsometry (SE)
Sahm, H.; Charton, C.; Thielsch, R.
Conference Paper, Journal Article
2004Reflektierendes Element fuer freie Elektronen Laserstrahlung, Verfahren zu seiner Herstellung uns seine Verwendung
Gatto, A.; Kaiser, N.; Thielsch, R.
Patent
2003Deep UV laser induced fluorescence in fluoride thin films
Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N.
Journal Article
2003Luminescence of UV thin films
Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N.; Lewis, K.L.; Soileau, M.J.; Stolz, C.J.
Conference Paper
2002193 nm laser induced fluorescence in fluoride thin films
Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N.
Journal Article
2002193 nm laser induced luminescence in oxide thin films
Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N.
Journal Article
2002A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition
Thielsch, R.; Gatto, A.; Heber, J.; Kaiser, N.
Journal Article
2002Deep UV laser induced luminescence in oxide thin films
Heber, J.; Muhlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N.
Journal Article
2002High-performance deep-ultraviolet optics for free-electron lasers
Gatto, A.; Thielsch, R.; Heber, J.; Kaiser, N.; Ristau, D.; Günster, S.; Kohlhaas, J.; Marsi, M.; Trovo, M.; Walker, R.; Garzella, D.; Couprie, M.E.; Torchio, P.; Alvisi, M.; Amra, C.
Journal Article
2002Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region
Thielsch, R.; Gatto, A.; Kaiser, N.
Journal Article
2001Absorption limited performance of SiO2/Al2O3 multi-layer coatings at 193nm - a systematic study
Thielsch, R.; Heber, J.; Kaiser, N.; Apel, O.; Mann, K.; Ristau, D.; Blaschke, H.; Arens, W.
Conference Paper
2001Achromatic damage investigations on mirrors for UV-free electron lasers
Gatto, A.; Kaiser, N.; Thielsch, R.; Garzella, D.; Hirsch, M.; Nutarelli, D.; Ninno, G. de; Renault, E.; Couprie, M.E.; Torchio, P.; Alvisi, M.; Albrand, G.; Amra,C.; Marsi, M.; Trovo, M.; Walker, R.; Grewe, M.; Roger, J.P.; Boccara, C
Conference Paper
2001High-performance DUV optics for Free Electron Lasers
Gatto, A.; Thielsch, R.; Heber, J.; Kaiser, N.; Ristau, D.; Günster, S.; Kohlhaas, J.; Marsi, M.; Trovo, M.; Walker, R.; Garzella, D.; Couprie, M.E.; Torchio, P.; Alvisi, M.; Amra, C.
Conference Paper
2001Mechanical stress and thermal-elastic properties of oxide coatings for use in the DUV spectral region
Thielsch, R.; Gatto, A.; Kaiser, N.
Conference Paper
2000Comparative study of the UV-optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion assisted deposition and plasma-ion-assisted deposition
Thielsch, R.; Gatto, A.; Heber, J.; Martin, S.; Kaiser, N.
Conference Paper
2000Comparison of the optical properties and UV radiation resistance of HfO2 single layers deposited by reactive evaporation, IAD, and PIAD
Thielsch, R.; Feigl, T.; Kaiser, N.; Martin, S.; Scaglione, S.; Sarto, F.; Alvisi, M.; Rizzo, A.
Conference Paper
2000Critical issues on the assessment of laser induced damage thresholds of fluoride multilayer coatings at 193 nm
Thielsch, R.; Heber, J.; Kaiser, N.; Martin, S.; Welsch, E.
Conference Paper
2000Magnetron sputtered EUV mirrors with high thermal stability
Feigl, T.; Yulin, S.; Kaiser, N.; Thielsch, R.
Conference Paper
2000Nonlinear absorption phenomena in oxide coatings for 193 nm
Apel, O.; Mann, K.; Heber, J.; Thielsch, R.
Conference Paper
2000Pulsed top-hat beam thermal lens: a simple and sensitive tool for in situ measurement on ultraviolet dielectric components
Li, B.C.; Martin, S.; Welsch, E.; Thielsch, R.; Heber, J.; Kaiser, N.
Conference Paper
2000Towards resistant UV mirrors at 200 nm for free electron lasers: Manufacture, characterizations, and degradation tests
Gatto, A.; Thielsch, R.; Kaiser, N.; Hirsch, M.; Garzella, D.; Nutarelli, D.; Ninno, G. de; Renault, E.; Couprie, M.E.; Torchio, P.; Alvisi, M.; Albrand, G.; Amra, C.; Marsi, M.; Trovo, M.
Conference Paper
1999ArF radiation resistance of optical coatings on CaF2 in relation to the surface finish of the substrate
Thielsch, R.; Heber, J.; Duparre, A.; Kaiser, N.; Mann, K.R.; Eva, E.
Conference Paper
1999Changes in optical interference coatings exposed to 193-nm excimer laser radiation
Heber, J.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Leinhos, U.; Görtler, A.
Conference Paper
1999Current status of radiation resistance of dielectric mirrors in the DUV
Bernitzki, H.; Lauth, H.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Mann, K.R.
Conference Paper
1999Influence of thermal substrate properties on the damage threshold of UV coatings
Blaschke, H.; Martin, S.; Morak, A.; Königsdörfer, C.; Roth, M.; Bincheng, L.; Welsch, E.; Thielsch, R.; Kaiser, N.
Conference Paper
1999Interference phenomena at trasparent layers in glow discharge optical emission spectrometry
Hoffmann, V.; Kurt, R.; Kämmer, K.; Thielsch, R.; Wirth, T.; Beck, U.
Journal Article
1999Interferenzschichtoptik für den ultravioletten Spektralbereich
Ullmann, J.; Lauth, H.; Bernitzki, H.; Ristau, D.; Arens, W.; Thielsch, R.; Kaiser, N.
Journal Article
1999Laser damage of optical coatings from UV to deep UV at 193 nm
Dijon, J.; Quesnel, E.; Pelle, C.; Thielsch, R.
Conference Paper
1999Laser resistivity and causes of damage in coating materials for 193 nm by photothermal methods
Blaschke, H.; Thielsch, R.; Heber, J.; Kaiser, N.; Martin, S.; Welsch, E.
Conference Paper
1999Mechanical stress in fluoride coatings
Ullmann, J.; Keck, H.G.; Thielsch, R.; Uhlig, H.; Kaiser, N.
Conference Paper
1999Metal-insulator transition in amorphous Si(1-x)Ni(x): Evidence for Mott's minimum metallic conductivity
Möbius, A.; Frenzel, C.; Thielsch, R.
Journal Article
1999The metal-insulator transition in amorphous Si1-cNic: so, was Mott right after all
Möbius, A.; Frenzel, C.; Thielsch, R.
Conference Paper
1999Microstructure and radiation interactions of optical interference coatings for 193 nm applications
Heber, J.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Leinhos, U.; Görtler, A.
Conference Paper
1999Structural and mechanical properties of evaporated pure and mixed MgF2-BaF2 thin films
Thielsch, R.; Pommies, M.; Heber, J.; Kaiser, N.; Ullmann, J.
Conference Paper
1999XPS studies and factoranalysis of PbS nanocrystal-doped SiO2 thin films
Thielsch, R.; Reiche, R.; Oswald, S.; Wetzig, K.
Journal Article
1998Optical, structural and mechanical properties of lanthanide trifluoride thin film materials for use in the DUV-spectral region
Thielsch, R.; Heber, J.; Jakobs, S.; Kaiser, N.; Duparre, A.; Ullmann, J.
Conference Paper
1998Quantum-size effects of PbS nanocrystallites in evaporated composite films
Thielsch, R.; Böhme, T.; Reiche, R.; Schäfer, D.; Bauer, H.-D.; Böttcher, H.
Journal Article
1998Stability of optical interference coatings exposed to low-fluence 193 nm ArF radiation
Heber, J.; Thielsch, R.; Blaschke, H.
Conference Paper
1997Properties of SiO2 and Al2O3 films for use in UV-optical coatings
Thielsch, R.; Duparre, A.; Schulz, U.; Kaiser, N.
Conference Paper