Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Oxide multilayer thermoelectric generators
Töpfer, Jörg; Reimann, Timmy; Schulz, Thomas; Bochmann, Arne; Capraro, Beate; Barth, Stefan; Vogel, Andy; Teichert, Steffen
Journal Article
2018Sintering behavior, microstructure and thermoelectric properties of calcium cobaltite thick films for transversal thermoelectric multilayer generators
Schulz, Thomas; Reimann, Timmy; Bochmann, Arne; Vogel, Andy; Capraro, Beate; Mieller, Björn; Teichert, Steffen; Töpfer, Jörg
Journal Article
2017Fabrication of a transversal multilayer thermoelectric generator with substituted calcium manganite
Reimann, Timmy; Bochmann, Arne; Vogel, Andy; Capraro, Beate; Teichert, Steffen; Töpfer, Jörg
Journal Article
2011Conductivity and charge trapping after electrical stress in amorphous and polycrystalline Al2O3-based devices studied with AFM-related techniques
Lanza, M.; Porti, M.; Nafria, M.; Aymerich, X.; Benstetter, G.; Lodermeier, E.; Ranzinger, H.; Jaschke, G.; Teichert, S.; Wilde, L.; Michalowski, P.P.
Journal Article
2011Investigation of Boron Redistribution during Silicidation in TiSi(2) using Atom Probe Tomography
Wedderhoff, K.; Ogiewa, M.; Shariq, A.; Teichert, S.
Conference Paper
2011Phase transitions in ferroelectric silicon doped hafnium oxide
Böscke, T.S.; Teichert, S.; Bräuhaus, D.; Müller, J.; Schröder, U.; Böttger, U.; Mikolajick, T.
Journal Article
2011A study of nanoscale TiB2 precipitation during titanium silicidation using atom probe tomography
Wedderhoff, K.; Kleint, C.A.; Shariq, A.; Teichert, S.
Journal Article
2011Synthesis of SrTiO3 by crystallization of SrO/TiO2 superlattices prepared by atomic layer deposition
Riedel, Stefan; Neidhardt, J.; Jansen, S.; Wilde, Lutz; Sundqvist, Jonas; Erben, E.; Teichert, S.; Michaelis, A.
Journal Article
2010Formation of an interface layer between Al1-xSixOy thin films and the Si substrate during rapid thermal annealing
Michalowski, Pawel Piotr; Beyer, Volkhard; Czernohorsky, Malte; Kücher, P.; Teichert, Steffen; Jaschke, Gert; Möller, Wolfhard
Journal Article, Conference Paper
2010Investigation of boron redistribution during silicidation in TiSi2 using atom probe tomography
Wedderhoff, K.; Kleint, C.; Shariq, A.; Teichert, S.
Abstract
2010Investigation of boron redistribution during silicidation in TiSi2 using atom probe tomography
Shariq, A.; Wedderhoff, K.; Kleint, C.; Teichert, S.
Abstract
2010Microstructural characterization of Al doped Zro2 MIM capacitor using atom probe tomography
Shariq, A.; Wedderhoff, K.; Müller, J.; Teichert, S.
Abstract
2010Three-dimensional compositional & structural characterization of semiconducting materials with sub-Nm resoluti
Shariq, A.; Wedderhoff, K.; Kleint, C.; Teichert, S.
Abstract
2009Atom Probe Tomography (APT) on Ti-based Silicide Contact Materials
Wedderhoff, K.; Shariq, A.; Fitz, C.; Teichert, S.
Abstract
2009Characterization of the diffusium process in Al2O3 thin films based on ToF-SIMS measurements
Michalowski, Pawel Piotr; Czernohorsky, Malte; Beyer, Volkhard; Jaschke, Gert; Teichert, Steffen
Abstract
2009Crystallization and silicon diffusion nanoscale effects on the electrical properties of Al2O3 based devices
Lanza, M.; Porti, M.; Nafria, M.; Aymerich, X.; Benstetter, G.; Lodermeier, E.; Ranzinger, H.; Jaschke, G.; Teichert, S.; Wilde, L.; Michalowski, P.
Conference Paper, Journal Article
2009Impact of interface variations on J-V and C-V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1-x)AlxO2 films
Weinreich, W.; Reiche, R.; Lemberger, M.; Jegert, G.; Müller, J.; Wilde, L.; Teichert, S.; Heitmann, J.; Erben, E.; Oberbeck, L.; Schröder, U.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2009Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers
Weinreich, W.; Ignatova, V.A.; Wilde, L.; Teichert, S.; Lemberger, M.; Bauer, A.J.; Reiche, R.; Erben, E.; Heitmann, J.; Oberbeck, L.; Schröder, U.
Journal Article
2009Investigations of field-evaporated end forms in voltage- and laser-pulsed atom probe tomography
Shariq, A.; Mutas, S.; Wedderhoff, K.; Klein, C.; Hortenbach, H.; Teichert, S.; Kücher, P.; Gerstl, S.S.A.
Conference Paper, Journal Article
2009Properties of plasma-enhanced atomic layer deposition-grown tantalum carbonitride thin films
Hossbach, C.; Teichert, S.; Thomas, J.; Wilde, L.; Wojcik, H.; Schmidt, D.; Adolphi, B.; Bertram, M.; Mühle, U.; Albert, M.; Menzel, S.; Hintze, B.; Bartha, J.W.
Journal Article
2009TiN/ZrO2/Ti/Al metal-insulator-metal capacitors with subnanometer CET using ALD-deposited ZrO2 for DRAM applications
Monaghan, S.; Cherkaoui, K.; O'Connor, E.; Djara, V.; Hurley, P.K.; Oberbeck, L.; Tois, E.; Wilde, L.; Teichert, S.
Journal Article
2007Thermal stability of thin ALD ZrO2 layers as dielectrics in deep trench DRAM devices annealed in N2 and NH3
Weinreich, W.; Lemberger, M.; Erben, E.; Heitmann, J.; Wilde, L.; Ignatova, V.A.; Teichert, S.; Schröder, U.; Oberbeck, L.; Bauer, A.J.; Ryssel, H.; Kücher, P.
Poster