Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2006High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems
Ohno, S.; Kawaguchi, Y.; Miyamura, A.; Sato, Y.; Song, P.K.; Yoshikawa, M.; Frach, P.; Shigesato, Y.
Journal Article
2004Ultra high-rate deposition of photocatalytic TiO2 films by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Takasawa, N.; Ohno, S.; Sato, D.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper
2003High Quality Photocatalytic TiO2 Films Deposited by Reactive Sputtering in Mid-Frequency Mode with Dual Cathodes
Ohno, S.; Sato, D.; Kon, M.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper
2003Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
Kon, M.; Song, P.K.; Shigesato, Y.; Frach, P.; Ohno, S.; Suzuki, K.
Journal Article
2003Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films
Ohno, S.; Sato, D.; Kon, M.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper, Journal Article
2002Al-doped ZnO films deposited by reactive magnetron sputtering in r.f. mode with a single cathode and m.f. mode with dual cathodes
Kon, M.; Shigesato, Y.; Song, P.K.; Frach, P.; Kojima, H.; Suzuki, K.
Journal Article
2000Al-doped ZnO films deposited by reactive magnetron sputtering in r.f. mode with a single cathode and m.f. mode with dual cathodes
Kon, M.; Shigesato, Y.; Song, P.K.; Frach, P.; Kojima, H.; Suzuki, K.
Conference Paper
2000ITO films deposited by dual magnetron sputtering (DMS) system using oxide targets
Shin, N.; Kon, M.; Song, P.K.; Shigesato, Y.; Frach, P.; Kojima, H.; Suzuki, K.; Utsumi, K.
Conference Paper