Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2016Improvement of the homogeneity of high mobility In2O3:H films by sputtering through a mesh electrode studied by Monte Carlo simulation and thin film analysis
Scherg-Kurmes, H.; Hafez, A.; Siemers, M.; Pflug, A.; Schlatmann, R.; Rech, B.; Szyszka, B.
Journal Article
2016Thin-film deposition processes
Pflug, A.; Siemers, M.; Melzig, T.; Keunecke, M.; Schäfer, L.; Bräuer, G.
Book Article
2015Growth condition of amorphous ZTO films from rotatable targets
Sittinger, V.; Pflug, A.; Schulz, C.; Siemers, M.; Melzig, T.; Meyer, B.; Kronenberger, A.; Oberste Berghaus, J.; Bosscher, W. de
Journal Article, Conference Paper
2015Heuristic modeling of the doping efficiency in sputtered TCO layers
Pflug, A.; Siemers, M.; Melzig, T.; Sittinger, V.; Schäfer, L.
Journal Article, Conference Paper
2015Modeling of gas flow and deposition profile in HWCVD processes
Pflug, A.; Höfer, M.; Harig, T.; Armgardt, M.; Britze, C.; Siemers, M.; Melzig, T.; Schäfer, L.
Journal Article, Conference Paper
20142D PIC-MC Simulation of Reactive Dual Magnetron Discharges on Ti02
Melzig, T.; Siemers, M.; Pflug, A.
Conference Paper
20143D PIC-MC simulation of anode effects in dual magnetron discharges
Melzig, T.; Siemers, M.; Pflug, A.; Rank, R.
Journal Article, Conference Paper
2014Model based investigation of Ar+ ion damage in DC magnetron sputtering
Siemers, M.; Pflug, A.; Melzig, T.; Gehrke, K.; Weimar, A.; Szyszka, B.
Journal Article, Conference Paper
2014Numerical optimization of baffles for sputtering optical precision filters
Pflug, A.; Siemers, M.; Melzig, T.; Rademacher, D.; Zickenrott, T.; Vergöhl, M.
Journal Article, Conference Paper
2014PIC-MC simulation of magnetron discharges
Pflug, A.; Siemers, M.; Melzig, T.; Schäfer, L.; Gehrke, K.
Conference Paper
2014Simulation of linear magnetron discharges in 2D and 3D
Pflug, A.; Siemers, M.; Melzig, T.; Schäfer, L.; Bräuer, G.
Journal Article, Conference Paper
2014Simulation von Plasma-Beschichtungsprozessen
Pflug, A.; Siemers, M.; Melzig, T.; Schäfer, L.
Journal Article
2013Numerical shaper optimization for sputtered optical precision filters
Pflug, A.; Siemers, M.; Melzig, T.; Rademacher, D.; Zickenrott, T.; Vergöhl, M.
Journal Article
2013PIC-MC Simulationen zur Untersuchung der Mikroplasmaausbreitung entlang von Hohlraumgrenzflächen unter Atmosphärendruck
Hilbert, T.; Kurrat, M.; Siemers, M.; Pflug, A.
Conference Paper
2013PIC-MC simulations for microplasmapropagation in multiple cavity arrangements at atmospheric pressure conditions
Hilbert, T.; Siemers, M.; Pflug, A.; Kurrat, M.
Conference Paper
2012Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
Kubart, T.; Schmidt, R.M.; Austgen, M.; Nyberg, T.; Pflug, A.; Siemers, M.; Wuttig, M.; Berg, S.
Journal Article
2012Parallel particle-in-cell Monte-Carlo algorithm for simulation of gas discharges under PVM and MPI
Schwanke, C.; Pflug, A.; Siemers, M.; Szyszka, B.
Conference Paper
2012Recent developments in the field of transparent conductive oxide films for spectral selective coatings, electronics and photovoltaics
Szyszka, B.; Dewald, W.; Gurram, S.K.; Pflug, A.; Schulz, C.; Siemers, M.; Sittinger, V.; Ulrich, S.
Journal Article, Conference Paper
2011Particle-in-cell Monte Carlo simulation for process analysis and development
Siemers, M.; Pflug, A.; Schwanke, C.; Szyszka, B.
Conference Paper
2011Simulation of plasma deposition processes
Pflug, A.; Siemers, M.; Schwanke, C.; Szyszka, B.
Conference Paper
2011Simulation of plasma potential and ion energies in magnetron sputtering
Pflug, A.; Siemers, M.; Schwanke, C.; Febty Kurnia, B.; Sittinger, V.; Szyszka, B.
Journal Article
2011Sputter yield amplification by tungsten doping of Al2O 3 employing reactive serial co-sputtering: Process characteristics and resulting film properties
Austgen, M.; Koehl, D.; Zalden, P.; Kubart, T.; Nyberg, T.; Pflug, A.; Siemers, M.; Berg, S.; Wuttig, M.
Journal Article
2010Modelling of sputtering yield amplification effect in reactive deposition of oxides
Kubart, T.; Nyberg, T.; Pflug, A.; Siemers, M.; Austgen, M.; Koehl, D.; Wuttig, M.; Berg, S.
Journal Article
2010Simulation von Plasma-Beschichtungsprozessen
Pflug, A.; Siemers, M.; Schwanke, C.; Szyszka, B.
Journal Article
2009Design tools and simulations for plasma processing in large area coaters
Pflug, A.; Siemers, M.; Szyszka, B.
Conference Paper
2009Magnetron-Beschichtungsmodul sowie Magnetron-Beschichtungsverfahren
Pflug, A.; Siemers, M.; Sittinger, V.; Szyszka, B.; Ulrich, S.
Patent
2009Particle-in-cell Monte Carlo analysis of propagating plasma waves in DC magnetron discharges
Siemers, M.; Pflug, A.; Szyszka, B.
Conference Paper
2009Verfahren und Vorrichtung zur Plasmabehandlung eines flachen Substrats
Beckmann, R.; Geisler, M.; Zeuner, A.; Fiedler, M.; Grabosch, G.; Pflug, A.; Czarnetzki, U.; Brinkmann, R.; Siemers, M.
Patent
2008Gas flow and plasma simulation for parallel plate PACVD reactors
Pflug, A.; Siemers, M.; Szyszka, B.; Geisler, M.; Beckmann, R.
Conference Paper
2008Particle-in-cell Monte Carlo analysis of anomalous target erosion in magnetron sputtering
Siemers, M.; Pflug, A.; Szyszka, B.
Conference Paper
2007Three dimensional model for anomalous target erosion in magnetron sputtering
Siemers, M.; Pflug, A.; Szyszka, B.
Conference Paper
2006Parallel DSMC gasflow simulation of an in-line coater for reactive sputtering
Pflug, A.; Siemers, M.; Szyszka, B.
Conference Paper
2006Plasma stabilization and structure formation during reactive sputtering of metal oxides
Severin, D.; Wuttig, M.; Kappertz, O.; Nyberg, T.; Pflug, A.; Siemers, M.
Conference Paper
2006Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides
Severin, D.; Kappertz, O.; Kubart, T.; Nyberg, T.; Berg, S.; Pflug, A.; Siemers, M.; Wuttig, M.
Journal Article
2006A second hysteresis effect of reactive magnetron sputtering in compound mode
Pflug, A.; Siemers, M.; Szyszka, B.; Severin, D.
Conference Paper
2006Three dimensional plasma simulations with a parallelized particle-in-cell Monte Carlo approach
Siemers, M.; Pflug, A.; Szyszka, B.
Conference Paper
2005Heuristische Simulation der Plasma-Impedanz beim reaktiven Magnetron-Sputtern
Pflug, A.; Siemers, M.; Szyszka, B.; Kappertz, O.; Nyberg, T.; Berg, S.; Severin, D.; Wuttig, M.
Conference Paper
2005Model prediction and emprical confirmation of rate scaling with peak power for high power pulse magnetron sputtering (HPPMS) deposition of thin Ag films
Christie, D.J.; Pflug, A.; Sittinger, V.; Ruske, F.; Siemers, M.; Szyszka, B.; Geisler, M.
Conference Paper
2005Modeling of the plasma impedance in reactive magnetron sputtering for various target materials
Pflug, A.; Siemers, M.; Szyszka, B.; Kappertz, O.; Nyberg, T.; Berg, S.
Conference Paper