Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2008Atmospheric pressure plasmas for crystalline silicon photovoltaics
Hopfe, V.; Sheel, D.W.; Möller, R.
Conference Paper
2007Atmospheric-pressure PECVD coating and plasma chemical etching for continuous processing
Hopfe, V.; Sheel, D.W.
Journal Article
2007Atmospheric-pressure plasmas for wide-area thin-film deposition and etching
Hopfe, V.; Sheel, D.W.
Journal Article
2003In-situ monitoring for CVD processes
Hopfe, V.; Sheel, D.W.; Spee, C.I.M.A.; Tell, R.; Martin, P.; Beil, A.; Pemble, M.; Weiss, R.; Vogt, U.; Grählert, W.
Journal Article
2002In-situ monitoring for CVD processes
Hopfe, V.; Sheel, D.W.; Spee, C.I.M.A.; Tell, R.; Martin, P.; Beil, A.; Pemple, M.; Weiss, R.; Vogt, U.; Grählert, W.
Conference Paper
2002Prozessüberwachung industrieller CVD-Beschichtungsanlagen mittels NIR-DLS- und FTIR-Sensorik
Hopfe, V.; Sheel, D.W.; Grählert, W.; Raisbeck, D.; Rivero, J.M.; Throl, O.
Conference Paper
2001NIR Diode Laser Based Process Control for Industrial CVD Reactors
Hopfe, V.; Sheel, D.W.; Raisbeck, D.; Rivero, J.M.; Graehlert, W.; Throl, O.; Mol, A.M.B. van; Spee, C.I.M.A.
Conference Paper
2001NIR diode laser based process control for industrial CVD reactors
Hopfe, V.; Sheel, D.W.; Raisbeck, D.; Rivero, J.M.; Graehlert, W.; Throl, O.; Mol, A.M.B. van; Spee, C.I.M.A.
Journal Article
1998FTIR monitoring of industrial scale CVD processes
Hopfe, V.; Mosebach, H.; Meyer, M.; Sheel, D.W.; Grählert, W.; Throl, O.; Dresler, B.
Conference Paper