Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2016FlexMoT - a flexible and adaptable environmental monitoring platform for offshore applications
Ruth, Thomas; Audersch, Stefan; Lukas, Uwe von; Schriever, Gerd; Nuppenau, Volker; Appel, Frank; Kühn, Manfred
Conference Paper
2016FlexMoT - Flexible Umweltmonitoring-Plattform für Notfall- und Langzeiteinsätze im Offshore-Bereich
Lunge, Matthias; Frank, Carsten; Esser, Elke; Fietzek, Peer; Ruth, Thomas; Audersch, Stefan; Lukas, Uwe von; Nuppenau, Volker; Kühn, Manfred; Appel, Frank; Schriever, Gerd; Rudorf, Uwe; Flögel, Sascha; Pfannkuche, Olaf
Conference Paper
2008Performance and lifetime of EUV source collectors measured with a full size EUV collector reflectometer
Hinze, U.; Chichkov, B.N.; Feigl, T.; Zeitner, U.D.; Damm, C.; Bolshukhin, D.; Kleinschmidt, J.; Schriever, G.; Schürmann, M.C.
Conference Paper
2007Status report on EUV source development and EUV source applications in EUVL
Bakshi, V.; Lebert, R.; Jägle, B.; Wies, C.; Stamm, U.; Kleinschmidt, J.; Schriever, G.; Ziener, C.; Corthout, M.; Pankert, J.; Bergmann, K.; Neff, W.; Egbert, A.; Gustafson, D.
Conference Paper
2005Progress on EUV-source development, tool integration and applications
Lebert, R.; Jaegle, B.; Wies, C.; Stamm, U.; Kleinschmidt, J.; Gaebel, K.; Schriever, G.; Pankert, J.; Bergmann, K.; Neff, W.; Egbert, A.
Conference Paper
2003Anordnung und Verfahren zur Reflektometrie
Lebert, R.; Schriever, G.; Bergmann, K.; Rosier, O.
Patent
2002Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Roentgenstrahlung aus einer Gasentladung
Lebert, R.; Bergmann, K.; Schriever, G.; Neff, W.
Patent
2000Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: A comparison of different concepts
Schriever, G.; Rahe, M.; Neff, W.; Bergmann, K.; Lebert, R.; Lauth, H.; Basting, D.
Conference Paper
2000Extreme-ultraviolet source development: a comparison of different concepts
Schriever, G.; Rahe, M.; Rebhan, M.; Basting, D.; Walecki, W.J.; Lauth, H.; Lebert, R.; Bergmann, K.; Hoffmann, D.; Rosier, O.; Neff, W.; Poprawe, R.; Sauerbrey, R.; Schroerer, H.; Düsterer, S.; Ziener, C.; Nickles, P.; Stiehl, H.; Will, I.; Sandner, W.; Schahl, G.; Rudolph, D.
Conference Paper
1999Comparison of laser produced and gas discharge based EUV sources for different applications
Lebert, R.; Bergmann, K.; Schriever, G.; Neff, W.
Conference Paper
1999Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target
Schriever, G.; Bergmann, K.; Lebert, R.
Journal Article
1999A gas discharged based radiation source for EUV-lithography
Lebert, R.; Bergmann, K.; Schriever, G.; Neff, W.
Conference Paper
1999Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma
Bergmann, K.; Schriever, G.; Rosier, O.; Müller, M.; Neff, W.; Lebert, R.
Journal Article
1998Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy
Schriever, G.; Mager, S.; Naweed, A.; Engel, A.; Bergmann, K.; Lebert, R.
Journal Article
1998Narrowband laser produced extreme ultraviolet sources adapted to silicon/molybdenum multilayer optics
Schriever, G.; Bergmann, K.; Lebert, R.
Journal Article
1998Soft x-ray emission of laser-produced plasmas using a low-debris cryogenic nitrogen target
Lebert, R.; Schriever, G.; Wilhein, T.; Niemann, B.
Journal Article
1998Target fuer die Erzeugung gepulster Roentgen- und Extrem-UV-Strahlung (EUV), Verfahren zur Erzeugung eines solchen Targets sowie seine Verwendung
Lebert, R.; Neff, W.; Mager, S.; Schriever, G.
Patent
1997Calibration of charge coupled devices and a pinhole transmission grating to be used as elements of a soft x-ray spectrograph
Schriever, G.; Lebert, R.; Naweed, A.; Mager, S.; Neff, W.; Kraft, S.; Scholze, F.; Ulm, G.
Journal Article