Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1996Applications of the 6T wavelength shifter (WLS) at BESSY I
Börner, M.; El-Kholi, A.; Mohr, J.; Köhler, B.; Pantenburg, F.J.; Rogge, B.; Scheunemann, U.
Book Article
1992Complete X-ray lithography processing of an 8-level 0.4 micron CMOS test device
Staudt-Fischbach, P.; Windbracke, W.; Bernt, H.; Zwicker, G.; Friedrich, D.; Hemicker, P.; Lange, P.; Schliwinski, H.-J.; Huber, H.-L.; Scheunemann, U.; Simon, K.
Conference Paper
1989The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.
Conference Paper
1989E-beam application of highly sensitive positive and negative-tone resists for x-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Hessemer, W.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.
Conference Paper
1989High sensitivity positive tone X-ray resist: RAY-PF performance under e-beam exposure
Menschig, A.; Forchel, A.; Dammel, R.; Lingnau, J.; Pongratz, S.; Scheunemann, U.; Theis, J.
Conference Paper