Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2014Feasibility evaluation of virtual metrology for the example of a trench etch process
Roeder, G.; Winzer, S.; Schellenberger, M.; Jank, S.; Pfitzner, L.
Journal Article
2013Characterization of thin ZnO films by vacuum ultra-violet reflectometry
Gumprecht, T.; Petrik, P.; Roeder, G.; Schellenberger, M.; Pfitzner, L.; Pollakowski, B.; Beckhoff, B.
Conference Paper
2013Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry
Petrik, P.; Gumprecht, T.; Nutsch, A.; Roeder, G.; Lemberger, M.; Juhasz, G.; Polgar, O.; Major, C.; Kozma, P.; Janosov, M.; Fodor, B.; Agocs, E.; Fried, M.
Journal Article, Conference Paper
2013Complementary methodologies for thin film characterization in one tool - A novel instrument for 450 mm wafers
Holfelder, I.; Beckhoff, B.; Fliegauf, R.; Honicke, P.; Nutsch, A.; Petrik, P.; Roeder, G.; Weser, J.
Journal Article
2013Practical aspects of virtual metrology and predictive maintenance model development and optimization
Schöpka, U.; Roeder, G.; Mattes, A.; Schellenberger, M.; Pfeffer, M.; Pfitzner, L.; Scheibelhofer, P.
Conference Paper
2013Virtual metrology for prediction of etch depth in a trench etch process
Roeder, G.; Schellenberger, M.; Pfitzner, L.; Winzer, S.; Jank, S.
Conference Paper
2012Framework for integration of virtual metrology and predictive maintenance
Roeder, G.; Mattes, A.; Pfeffer, M.; Schellenberger, M.; Pfitzner, L.; Knapp, A.; Mühlberger, H.; Kyek, A.; Lenz, B.; Frisch, M.; Bichlmeier, J.; Leditzky, G.; Lind, E.; Zoia, S.; Fazio, G.
Conference Paper
2012IMPROVE - a joint European effort to boost efficiency in semiconductor manufacturing
Schellenberger, Martin; Koitzsch, Matthias; Roeder, Georg; Pfeffer, Markus; Schöpka, Ulrich; Mattes, Andreas; Pfitzner, Lothar
Presentation
2012Measurement strategy for dielectric ultra-thin film characterization by vacuum ultra-violet reflectometry
Gumprecht, T.; Roeder, G.; Schellenberger, M.; Pfitzner, L.
Conference Paper
2012Simulation of 3D inclined/rotated UV lithography and its application to microneedles
Liu, S.; Roeder, G.; Aygun, G.; Motzek, K.; Evanschitzky, P.; Erdmann, A.
Journal Article
2011Determination of the dill parameters of thick positive resist for use in modeling applications
Roeder, G.; Liu, S.; Aygun, G.; Evanschitzky, P.; Erdmann, A.; Schellenberger, M.; Pfitzner, L.
Conference Paper, Journal Article
2011Developing a framework for virtual metrology and predictive maintenance
Schellenberger, Martin; Roeder, Georg; Mattes, Andreas; Pfeffer, Markus; Pfitzner, Lothar; Knapp, Alexander; Mühlberger, Heribert; Bichlmeier, Josef; Valeanu, Christian; Kyek, Andreas; Lenz, Benjamin; Frisch, Markus; Leditzky, Günther
Journal Article
2011Electrical and structural properties of ultrathin SiON films on Si prepared by plasma nitridation
Hourdakis, E.; Nassiopoulou, A.G.; Parisini, A.; Reading, M.A.; Berg, J.A. van den; Sygellou, L.; Ladas, S.; Petrik, P.; Nutsch, A.; Wolf, M.; Roeder, G.
Journal Article
2011An X-ray photoelectron spectroscopy study of ultra-thin oxynitride films
Ladas, S.; Sygellou, L.; Kennou, S.; Wolf, M.; Roeder, G.; Nutsch, A.; Rambach, M.; Lerch, W.
Journal Article
2010Advanced process control - lessons learned from semiconductor manufacturing
Schellenberger, M.; Roeder, G.; Öchsner, R.; Schöpka, U.; Kasko, I.
Journal Article
2010Impact of temperature increments on tunneling barrier height and effective electron mass for plasma nitrided thin SiO2 layer on a large wafer area
Aygun, G.; Roeder, G.; Erlbacher, T.; Wolf, M.; Schellenberger, M.; Pfitzner, L.
Journal Article
2008Characterization of Ru and RuO2 thin films prepared by pulsed metal organic chemical vapor deposition
Roeder, G.; Manke, C.; Baumann, P.K.; Petersen, S.; Yanev, V.; Gschwandtner, A.; Ruhl, G.; Petrik, P.; Schellenberger, M.; Pfitzner, L.; Ryssel, H.
Conference Paper, Journal Article
2008Entwicklung von Verfahren zur Kontrolle von Plasmaätzprozessen mittels in situ-Ellipsometrie und optischer Emissionsspektroskopie
Roeder, G.
Dissertation
2007Approach for a standardized methodology for multisite processing of 300-mm wafers at R&D sites
Oechsner, R.; Pfeffer, M.; Frickinger, J.; Schellenberger, M.; Roeder, G.; Pfitzner, L.; Ryssel, H.; Fritzsche, M.; Kaushik, V.; Renaud, D.; Danel, A.; Claeys, C.; Bearda, T.; Lering, M.; Graef, M.; Murphy, B.; Walther, H.; Hury, S.
Journal Article
2007Process optimization by means of integrated monitoring tools in the semiconductor industry
Pfitzner, L.H.; Nutsch, A.; Roeder, G.; Schellenberger, M.
Conference Paper
2006Approach for a standardized methodology for mulit-site processing of 300 mm wafers at R&D-sites
Öchsner, R.; Frickinger, J.; Pfeffer, M.; Schellenberger, M.; Roeder, G.; Pfitzner, L.; Ryssel, H.; Fritzsche, M.; Kaushik, V.; Renaud, D.; Danel, A.; Claeys, C.; Bearda, T.; Lering, M.; Graef, M.; Murphy, B.; Walther, H.; Hury, S.
Conference Paper
2006Prospects for the realization of APC in a distributed 300 mm R&D-line
Roeder, G.; Schellenberger, M.; Öchsner, R.; Pfeffer, M.; Frickinger, J.; Pfitzner, L.; Ryssel, H.; Fritzsche, M.
Conference Paper
2006Standardization of integrated ellipsometry for semiconductor manufacturing
Roeder, G.; Schellenberger, M.; Pfitzner, L.; Ryssel, H.; Richter, U.; Stehle, J.L.; Piel, J.-P.
Conference Paper
2006Trends in European R&D - Advanced process control down to atomic scale for micro- and nanotcchnologies
Pfitzner, L.; Schellenberger, M.; Oechsner, R.; Roeder, G.; Pfeffer, M.
Conference Paper
2005Unit process aspects for APC-software implementation
Roeder, G.; Schellenberger, M.; Pfitzner, L.; Ryssel, H.; Spitzlsperger, G.
Conference Paper
2004Entwicklungen in der Plasmaätztechnologie
Roeder, G.; Spindler, O.
Journal Article
2004Measurement data evaluation for in situ single-wavelength ellipsometry during reactive ion etching
Roeder, G.; Schneider, C.; Pfitzner, L.; Ryssel, H.
Presentation
2004Workshop Entwicklungen in der Plasmaätztechnologie
Roeder, G.; Spindler, G.
Journal Article
2003IMA-Workshop Grenoble, France
Roeder, G.; Öchsner, R.; Schneider, C.
Journal Article
2003Workshop Fortschrittliche Prozesskontrollverfahren für neue Prozesse und Materialien der VDE/VDI-GMM-Arbeitsgruppe Abscheidung und Ätzen
Roeder, G.; Spindler, O.
Journal Article
2002EuSIC: The information network grows. Pt.2
Roeder, G.; Schellenberger, M.; Schneider, C.
Journal Article
2000In-production monitoring and control of in situ-chamber clean processes
Roeder, G.; Andrian-Werburg, M. von; Tschaftary, T.; Schneider, C.; Pfitzner, L.; Ryssel, H.; John, P.; Tegeder, V.
Conference Paper
2000Verfahren und Vorrichtung zur Ueberfuehrung eines Fluessigkeitsstromes in einen Gasstrom
Strzyzewski, P.; Roeder, G.; Pfitzner, L.; Ryssel, H.
Patent
1992In situ measurement for resist thickness control and development endpoint detection
Roeder, G.; Ryssel, H.; Temmel, G.
Conference Paper