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| 2013 | Lorentzkraft-basierter MEMS-3D-Magnetfeldsensor für die Integration zu einer 1-Chip 9D IMU
Behmüller, M.; Weiss, M.; Claus, M.; Bohse, S.; Schwarzelbach, O.; Schröder, C.; Reimer, K. | Conference Paper |
| 2012 | Packaging technology of multi deflection arrays for multi-shaped beam lithography
Burkhardt, T.; Mohaupt, M.; Hornaff, M.; Zaage, B.; Beckert, E.; Döring, H.-J.; Slodowski, M.; Reimer, K.; Witt, M.; Eberhardt, R.; Tünnermann, A. | Conference Paper |
| 2012 | Precisely assembled multi deflection arrays - key components for multi shaped beam lithography
Mohaupt, Matthias; Beckert, Erik; Burkhardt, Thomas; Hornaff, Marcel; Damm, Christoph; Eberhardt, Ramona; Tünnermann, Andreas; Döring, Hans-Joachim; Reimer, Klaus | Conference Paper |
| 2010 | Combined MEMS inertial sensors for IMU applications
Merz, P.; Reimer, K.; Weiß, M.; Schwarzelbach, O.; Schröder, C.; Giambastiani, A.; Rocchi, A.; Heller, M. | Conference Paper |
| 2009 | Combined MEMS Inertial Sensors for IMU Applications
Merz, P.; Reimer, K.; Weiß, M.; Schwarzelbach, O.; Schröder, C.; Giambastiani, A.; Rocchi, A.; Heller, M. | Conference Paper |
| 2009 | Kombinierte, ausfallsichere Beschleunigungs- und Drehratensensoren für die Automobilindustrie
Kandler, M.; Merz, P.; Foroutan, A.; Reimer, K. | Conference Paper |
| 2009 | A novel multi pressure wafer level packaging technology
Merz, P.; Reinert, W.; Schwarzelbach, O.; Reimer, K. | Conference Paper |
| 2008 | Verfahren zur Bestimmung der Justagegenauigkeit beim Waferbonden
Merz, P.; Reimer, K.; Lorenz, F. | Patent |
| 2007 | Impact of Si DRIE on vibratory MEMS gyroscope performance
Merz, P.; Pilz, W.; Senger, F.; Reimer, K.; Grouchko, M.; Pandhumpsoporn, T.; Bosch, W.; Cofer, A.; Lassig, S. | Conference Paper |
| 2007 | Verfahren zur Herstellung eines mikromechanischen Bauelements mit einer partiellen Schutzschicht
Merz, P.; Reimer, K.; Senger, F. | Patent |
| 2006 | Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator
Eder-Kapl, S.; Haugeneder, E.; Langfischer, H.; Reimer, K.; Eichholz, J.; Witt, M.; Doering, H.-J.; Heinitz, J.; Brandstätter, C. | Conference Paper, Journal Article |
| 2005 | Demonstrators: A vital step forward for projection mask-less lithography (PML2)
Brandstätter, C.; Haugeneder, E.; Döring, H.-J.; Elster, T.; Heinitz, J.; Fortagne, O.; Eder-Kapl, S.; Lammer, G.; Jochl, P.; Löschner, H.; Reimer, K.; Saniter, J.; Talmi, M.; Eberhardt, R.; Krönert, K. | Conference Paper |
| 2005 | Development of microsystem technologies for a monolithically integrated programmable aperture plates system used in maskless 45nm e-beam lithography tools
Witt, M.; Eichholz, J.; Ratzmann, L.; Kähler, D.; Brünger, W.; Reimer, K.; Döring, H.-J.; Haugeneder, E. | Conference Paper |
| 2005 | Mask manufacture for projection mask-less lithography (PML2)
Reimer, K.; Witt, M.; Kähler, D.; Eichholz, J.; Ratzmann, L.; Brünger, W.; Döring, H.-J.; Haugeneder, E.; Eder-Kapl, S.; Nowak, R. | Conference Paper |
| 2005 | Proof-of-concept tool development for projection mask-less lithography (PML2)
Döring, H.-J.; Elster, T.; Heinitz, J.; Fortagne, O.; Brandstätter, C.; Haugeneder, E.; Eder-Kapl, S.; Lammer, G.; Löschner, H.; Reimer, K.; Eichholz, J.; Saniter, J. | Conference Paper |
| 2005 | PSM-X2: Polysilicon surface micromachining process platform for vacuum-packaged sensors
Merz, P.; Reinert, W.; Reimer, K.; Wagner, B. | Conference Paper |
| 2004 | Lagestabile Positionierung aktiv beweglicher Einzeller
Lucas, K.; Fuhr, G.; Mueller, T.; Reimer, K.; Wagner, B. | Patent |
| 2003 | 3-dimensional micro-structuring for optical applications
Quenzer, H.J.; Reimer, K.; Merz, P. | Journal Article |
| 2003 | Three-dimensional micro-structuring for optical applications
Quenzer, H.J.; Reimer, K.; Merz, P. | Conference Paper |
| 1999 | 16-k infrared micromirror arrays with large-beam deflection and 10-mm pixel size
Reimer, K.; Engelke, R.; Witt, M.; Wagner, A. | Conference Paper |
| 1999 | OPTIMIERTER RANDABSCHLUSS VON HALBLEITER-BAUELEMENTEN
Sittig, R.; Nagel, D.; Dudde, R.; Wagner, B.; Reimer, K. | Patent |
| 1999 | Progress in gray-tone lithography and replication techniques for different materials
Reimer, K.; Engelke, R.; Hofmann, U.; Merz, P.; Kohlmann van Platen, K.T.; Wagner, B. | Conference Paper |
| 1998 | Free 3D shaping with grey-tone lithography and multidose e-beam writing
Kalus, M.; Frey, M.; Buchmann, L.-M.; Reimer, K.; Wagner, B. | Conference Paper |
| 1998 | Mikroreliefoberflächen. Herstellung mit Grauton-Lithographie
Hofmann, U.; Wagner, B.; Reimer, K.; Quenzer, H.J. | Journal Article |
| 1998 | One-level gray-tone design. Mask data preparation and pattern transfer
Reimer, K.; Henke, W.; Hofmann, U.; Merz, P.; Wagner, B. | Book Article |
| 1997 | 3D structures using gray tone lithography
Reimer, K.; Wagner, B.; Kalus, M.; Frey, M.; Buchmann, L. | Conference Paper |
| 1997 | Erzeugung von Mikrorelief-Oberflächen mit Grauton-Lithographie
Wagner, B.; Reimer, K.; Hofmann, U.; Quenzer, H.J.; Jürss, M.; Pilz, W. | Conference Paper |
| 1997 | Fabrication of microrelief surfaces using a one-step lithography process
Reimer, K.; Hofmann, U.; Jürss, M.; Pilz, W.; Quenzer, H.J.; Wagner, B. | Conference Paper |
| 1997 | Infrared micromirror array with large pixel size and large deflection angle
Wagner, B.; Reimer, K.; Maciossek, A.; Hofmann, U. | Conference Paper |
| 1997 | Micro-optic fabrication using one-level gray-tone lithography
Reimer, K.; Quenzer, H.J.; Jürss, M.; Wagner, B. | Conference Paper |
| 1996 | Adhesion-inhibited surfaces
Schnelle, T.; Müller, T.; Voigt, A.; Reimer, K.; Wagner, B.; Fuhr, G. | Journal Article |
| 1996 | Growth of anchorage-dependent mammalian cells on microstructures and microperforated silicon membranes
Richter, E.; Fuhr, G.; Müller, T.; Shirley, S.; Rogaschewski, S.; Reimer, K.; Dell, C. | Journal Article |
| 1996 | One-level gray-tone design. Mask data preparation and pattern transfer
Reimer, K.; Henke, W.; Quenzer, H.J.; Pilz, W.; Wagner, B. | Conference Paper |
| 1996 | One-level gray-tone lithography - mask data preparation and pattern transfer
Reimer, K.; Quenzer, H.J.; Demmeler, R.; Wagner, B. | Conference Paper |
| 1996 | One-level gray-tone lithography for micro optical components
Reimer, K.; Henke, W.; Quenzer, H.J.; Demmeler, R.; Wagner, B. | Conference Paper |
| 1995 | Fabrication of relief-topographic surfaces with one-step UV-lithographic
Quenzer, H.J.; Henke, W.; Hoppe, W.; Pilz, W.; Reimer, K.; Wagner, B. | Journal Article |
| 1995 | Minireticle für die Elektronenstrahllithographie
Reimer, K.; Wenk, B.; Buchmann, L.; Schnakenberg, U.; Elsner, H. | Conference Paper |
| 1994 | Direct write pattern placement accuracy for E-beam nanolithography
Reimer, K.; Ehrlich, C.; Köhler, C.; Brünger, W.H. | Conference Paper |
| 1994 | Fabrication of electrode arrays in the quarter micron regime for biotechnical applications
Reimer, K.; Hintsche, R.; Köhler, C.; Lisec, T.; Schnakenberg, U.; Wagner, B.; Fuhr, G. | Conference Paper |
| 1993 | Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks
Köhler, C.; Brünger, W.H.; Ehrlich, C.; Huber, H.-L.; Reimer, K. | Journal Article |
| 1993 | Direct write pattern placement accuracy for E-beam nanolithography
Reimer, K. | Conference Paper |
| 1993 | Nanostructure patterning with SOR X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.K.; Reimer, K. | Conference Paper |
| 1992 | E-beam written optically transparent x-ray masks - four levels for an industrial VLSI chip with megabit design rules
Jacobs, E.P.; Köhler, C.; Kohlmann, K.T.; Petschner, M.; Reimer, K.; Breithaupt, B.; Demmeler, R.; Ehrlich, C. | Conference Paper |
| 1989 | The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J. | Conference Paper |
| 1989 | E-beam application of highly sensitive positive and negative-tone resists for x-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Hessemer, W.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J. | Conference Paper |
| 1989 | One-layer technique for absorber structuring of E-beam written master masks for X-ray lithography
Ehrlich, C.; Goepel, U.; Demmeler, R.; Pongratz, S.; Reimer, K.; Dammel, R.; Lignau, J.; Theis, J. | Conference Paper |
| 1989 | Proximity correction for e-beam pattering on X-ray mask blanks
Reimer, K.; Pongratz, S. | Conference Paper |
| 1989 | Proximity correction for e-beam patterning on X-ray mask blanks
Reimer, K.; Pongratz, S. | Journal Article |
| 1987 | High resolution e-beam lithography for X-ray mask making
Demmeler, R.; Ehrlich, C.; Pongratz, S.; Reimer, K. | Journal Article |