Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2013Bimodal CAFM TDDB distributions in polycrystalline HfO2 gate stacks: The role of the interfacial layer and grain boundaries
Iglesias, V.; Martin-Martinez, J.; Porti, M.; Rodriguez, R.; Nafria, M.; Aymerich, X.; Erlbacher, T.; Rommel, M.; Murakami, K.; Bauer, A.J.; Frey, L.; Bersuker, G.
Journal Article
2012Effect of HfO2 polycrystallinity on distribution of the CAFM-induced TDDB in high-k gate stacks
Iglesias, V.; Erlbacher, T.; Rommel, M.; Murakami, K.; Bauer, A.J.; Frey, L.; Porti, M.; Martin-Martinez, J.; Rodriguez, R.; Nafria, M.; Aymerich, X.; Bersuker, G.
Poster
2011Conductivity and charge trapping after electrical stress in amorphous and polycrystalline Al2O3-based devices studied with AFM-related techniques
Lanza, M.; Porti, M.; Nafria, M.; Aymerich, X.; Benstetter, G.; Lodermeier, E.; Ranzinger, H.; Jaschke, G.; Teichert, S.; Wilde, L.; Michalowski, P.P.
Journal Article
2009Crystallization and silicon diffusion nanoscale effects on the electrical properties of Al2O3 based devices
Lanza, M.; Porti, M.; Nafria, M.; Aymerich, X.; Benstetter, G.; Lodermeier, E.; Ranzinger, H.; Jaschke, G.; Teichert, S.; Wilde, L.; Michalowski, P.
Conference Paper, Journal Article