Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017More-than-moore technologies and applications
Pelka, J.; Baldi, L.
Book Article
2017Nanoelectronics for smart cities
Pelka, J.
Book Article
2015Nanoelectronics research gaps and recommendations. Editorial
Galatsis, K.; Gargini, P.; Hiramoto, T.; Beernaert, D.; DeKeersmaecker, R.; Pelka, J.; Pfitzner, L.
Journal Article
2003Mikrosystemtechnik
: Botthof, A.; Pelka, J.
Book
1999MST 2000+
: Ehret, P.; Pelka, J.; Reichl, H.
Book
1995The STORM technology CAD system
Lorenz, J.; Hill, C.; Jaouen, H.; Lombardi, C.; Lyden, C.; Meyer, K. de; Pelka, J.; Poncet, A.; Rudan, M.; Solmi, S.
Journal Article
1993Energy- and angle distributions of argon ions and neutrals at the rf-powered electrode of a parallel-plate reactor
Börnig, K.; Hoppe, W.; Pelka, J.
Conference Paper
1993Simulation of time depending particle transport during dry etch processes
Börnig, K.; Pelka, J.
Conference Paper
1993STORM - A European platform for sub-micron technology simulation and optimization
Jones, S.K.; Lombardi, C.; Poncet, A.; Lorenz, J.; Hill, C.; Jaonen, H.; Lyden, C.; Meyer, K. de; Pelka, J.; Rudem, M.; Soleni, S.
Conference Paper
1992How to etch the optimal silicon trench - profile development and process discussion
Pilz, W.; Grandorff, K.; Pelka, J.; Janes, J.
Conference Paper
1992Passivation effects in novolak based resists during O2-RIE
Jagdhold, U.; Pelka, J.
Conference Paper
1992Verfahren zur abbildenden Laserinterferometrie und Laserinterferometer zur Durchfuehrung des Verfahrens
Mader, H.; Betz, H.; Pelka, J.
Patent
1991Oxygen reactive ion etching of polymers-profile evolution and process mechanisms
Janes, J.; Pelka, J.; Pilz, W.
Conference Paper
1991Simulation of ion-enhanced dry-etch processes
Pelka, J.
Conference Paper
1991Three-dimensional simulation of ion-enhanced dry-etch processes
Pelka, J.
Conference Paper
1990Profile evolution in the multilevel technique
Pilz, W.; Pelka, J.
Conference Paper
1990Simulation of proximity printing
Schwalm, R.; Henke, W.; Pelka, J.; Weiß, M.
Journal Article
1989The influence of ion scattering on dry etch profiles
Pelka, J.; Hoppe, W.; Mewes, D.; Weiß, M.
Conference Paper
1989The problem of scattering in ribe
Pelka, J.; Scheer, H.-C.; Hoffmann, P.; Hoppe, W.; Huth, C.
Journal Article
1989Programs for VLSI process simulation
Pichler, P.; Lorenz, J.; Pelka, J.; Ryssel, H.
Conference Paper
1989Simulation halbleitertechnologischer Prozess-Schritte in der Mikroelektronik
Lorenz, J.; Pelka, J.; Ryssel, H.
Journal Article
1987Prozeßsimulation für die Entwicklung mikroelektronischer Schaltkreise
Lorenz, J.; Pelka, J.
Journal Article
1987Redeposition in ion milling
Müller, K.P.; Pelka, J.
Journal Article
1987Simulation von Trockenaetzprozessen - Erreichter Stand, Probleme, weitere Entwicklungen
Pelka, J.
Book Article
1985COMPOSITE - A complete modelling program of silicon technology
Pelka, J.; Lorenz, J.; Ryssel, H.; Sachs, A.; Seidl, S.; Svoboda, M.
Journal Article
1985Mass spectrometry for controlling etch process of silicon containing layers
Buchmann, L.-M.; Pelka, J.; Mader, H.
Conference Paper