Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2020Impact of Ferroelectric Wakeup on Reliability of Laminate based Si-doped Hafnium Oxide (HSO) FeFET Memory Cells
Ali, T.; Kühnel, K.; Czernohorsky, M.; Rudolph, M.; Pätzold, B.; Olivo, R.; Lehninger, D.; Mertens, K.; Müller, F.; Lederer, M.; Hoffmann, R.; Mart, C.; Kalkani, M.N.; Steinke, P.; Kämpfe, T.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Conference Paper
2020A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: Pyroelectricity and Reliability
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lehninger, D.; Olivo, R.; Lederer, M.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M.
Journal Article
2020A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: A Temperature-Modulated Operation
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lederer, M.; Olivo, R.; Lehninger, D.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M.
Journal Article
2019Electrocaloric temperature change in ferroelectric Si-doped hafnium oxide (HfO2) thin films
Mart, C.; Kämpfe, T.; Pätzold, B.; Rudolph, M.; Czernohorsky, M.; Müller, J.; Weinreich, W.
Presentation
2019Electrocaloric temperature change in ferroelectric Si-doped hafnium oxide (HfO2) thin films
Mart, Clemens; Kämpfe, Thomas; Müller, Johannes; Pätzold, Björn; Rudolph, Matthias; Czernohorsky, Malte; Weinreich, Wenke
Presentation
2019Principles and Challenges for Binary Oxide Based Ferroelectric Memory FeFET
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Eng, L.M.; Seidel, K.
Conference Paper
2019Principles and Challenges for Binary Oxide Based Ferroelectric Memory FeFET
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Eng, L.M.; Seidel, K.
Poster
2019Theory and Experiment of Antiferroelectric (AFE) Si-Doped Hafnium Oxide (HSO) Enhanced Floating-Gate Memory
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Zimmermann, K.; Biedermann, K.; Eng, L.M.; Seidel, K.; Müller, J.
Journal Article
2018Aspects of high aspect ratio silicon etching - capacitor application
Rudolph, Matthias; Pätzold, Björn; Czernohorsky, Malte
Presentation
2018High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty
Ali, T.; Polakowski, P.; Riedel, S.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Seidel, K.; Löhr, D.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Calvo, J.; Zimmermann, K.; Müller, J.
Journal Article
2018Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET
Ali, T.; Polakowski, P.; Riedel, S.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Seidel, K.; Löhr, D.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Thrun, X.; Hanisch, N.; Steinke, P.; Calvo, J.; Müller, J.
Journal Article
2018Tuning parameters and their impact on ferroelectric hafnium oxide
Polakowski, Patrick; Büttner, Teresa; Ali, Tarek Nadi Ismail; Riedel, Stefan; Kämpfe, Thomas; Seidel, Konrad; Müller, Johannes; Pätzold, Björn
Presentation
2016Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Kühnel, Kati; Riedel, Stefan; Weinreich, Wenke; Thrun, Xaver; Czernohorsky, Malte; Pätzold, Björn; Rudolph, Matthias
Presentation
2016Reaktives Ionenätzen zur Mehrfachstrukturierung und Elektrodentrennung für Kondensatoranwendungen in der Halbleiterindustrie
Pätzold, Björn
: Hohle, Christoph; Rudolph, Matthias; Rennekamp, Reinhold
Master Thesis