Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Structural and computational assessment of the influence of wet-chemical post-processing of the Al-substituted cubic Li7La3Zr2O12
Kun, Róbert; Langer, Frederieke; Delle Piane, Massimo; Ohno, Saneyuki; Zeier, Wolfgang G.; Gockeln, Michael; Colombi Ciacchi, Lucio; Busse, Matthias; Fekete, István
Journal Article
2011High rate reactive sputter deposition of TiO2 films for photocatalyst and dye-sensitized solar cells
Sato, Y.; Hashimoto, T.; Miyamura, A.; Ohno, S.; Oka, N.; Suzuki, K.; Glöß, D.; Frach, P.; Shigesato, Y.
Journal Article
2006High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems
Ohno, S.; Kawaguchi, Y.; Miyamura, A.; Sato, Y.; Song, P.K.; Yoshikawa, M.; Frach, P.; Shigesato, Y.
Journal Article
2006Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Ohno, S.; Takasawa, N.; Sato, Y.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Journal Article, Conference Paper, Journal Article
2006Silicon nitride thin film with low absorption deposited by high rate reactive pulse magnetron sputtering
Shoji, H.; Fukagawa, T.; Kato, Y.; Bartzsch, H.; Suzuki, K.; Ohno, S.; Takasawa, N.; Sato, Y.; Yoshikawa, M.
Conference Paper
2004Photocatalytic properties of TiO2 films deposited by reactive sputtering in mid-frequency mode with dual cathodes
Ohno, S.; Sato, D.; Kon, M.; Sato, Y.; Yoshikawa, M.; Frach, P.; Shigesato, Y.
Journal Article
2004Ultra high-rate deposition of photocatalytic TiO2 films by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Takasawa, N.; Ohno, S.; Sato, D.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper
2003High Quality Photocatalytic TiO2 Films Deposited by Reactive Sputtering in Mid-Frequency Mode with Dual Cathodes
Ohno, S.; Sato, D.; Kon, M.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper
2003Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
Kon, M.; Song, P.K.; Shigesato, Y.; Frach, P.; Ohno, S.; Suzuki, K.
Journal Article
2003Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films
Ohno, S.; Sato, D.; Kon, M.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper, Journal Article