
Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. | | |
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1996 | Arbeiten zur Röntgentiefenlithographie Scheunemann, H.U.; Oertel, H.K.; Huber, H.L. | Book Article |
1994 | Adhesion problems in deep-etch X-ray lithography caused by fluorescence radiation from the plating-base Pantenburg, F.J.; El-Kholi, A.; Mohr, J.; Schulz, J.; Oertel, H.K.; Chlebek, J.; Huber, H.-L. | Journal Article |
1993 | Nanostructure patterning with SOR X-ray lithography Chlebek, J.; Huber, H.-L.; Oertel, H.K.; Reimer, K. | Conference Paper |
1993 | Process latitude for sub-200 nanometer synchroton orbital radiation X-ray lithography Oertel, H.K.; Chlebek, J.; Weiß, M. | Journal Article, Conference Paper |
1992 | Simulation of resist development on wafer topography in x-ray lithography Weiß, M.; Oertel, H.K.; Krauser, J. | Conference Paper |
1991 | Investigation of the process latitude for sub-half-micron pattern replication in x-ray lithography Oertel, H.K.; Huber, H.-L.; Weiß, M. | Conference Paper |
1991 | Status of the compact synchrotron radiation source cosy and first exposure experiments Schmidt, M.; Oertel, D.W.; Hartrott, M.v.; Weihreter, E.; Oertel, H.K.; Huber, H.-L. | Conference Paper |
1990 | Percolation theory and resist development in XRL Oertel, H.K.; Dammel, R.; Theis, J.; Weiß, M. | Conference Paper |