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| 2004 | Analysis of wafer process duration for ab initio calculation of capacity, throughput and bottleneck equipments in a wafer fab
Etzel, H.; Oertel, H.; Dudde, R.; Staudt, P. | Conference Paper |
| 2002 | On the use of Si-based nanohole arrays as near-field biochips
Eberle, H.-G.; Dressler, C.; Oertel, H.; Beuthan, J.; Müller, G. | Journal Article |
| 1996 | Arbeiten zur Röntgentiefenlithographie
Scheunemann, H.U.; Oertel, H.K.; Huber, H.L. | Book Article |
| 1994 | Adhesion problems in deep-etch X-ray lithography caused by fluorescence radiation from the plating-base
Pantenburg, F.J.; El-Kholi, A.; Mohr, J.; Schulz, J.; Oertel, H.K.; Chlebek, J.; Huber, H.-L. | Journal Article |
| 1993 | Nanostructure patterning with SOR X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.K.; Reimer, K. | Conference Paper |
| 1993 | Process latitude for sub- 200 mm SOR X-ray lithography
Oertel, H. | Conference Paper |
| 1993 | Process latitude for sub-200 nanometer synchroton orbital radiation X-ray lithography
Oertel, H.K.; Chlebek, J.; Weiß, M. | Journal Article, Conference Paper |
| 1992 | Simulation of resist development on wafer topography in x-ray lithography
Weiß, M.; Oertel, H.K.; Krauser, J. | Conference Paper |
| 1991 | Investigation of the process latitude for sub-half-micron pattern replication in x-ray lithography
Oertel, H.K.; Huber, H.-L.; Weiß, M. | Conference Paper |
| 1991 | Modelling of illumination effects on resist profiles in X-ray lithography
Oertel, H.; Weiß, M.; Huber, H.-L.; Vladimirsky, Y.; Maldonado, J.R. | Conference Paper |
| 1991 | Status of the compact synchrotron radiation source cosy and first exposure experiments
Schmidt, M.; Oertel, D.W.; Hartrott, M.v.; Weihreter, E.; Oertel, H.K.; Huber, H.-L. | Conference Paper |
| 1990 | Percolation theory and resist development in X-ray lithography
Oertel, H.; Weiß, M.; Dammel, R.; Theis, J. | Conference Paper |
| 1990 | Percolation theory and resist development in XRL
Oertel, H.K.; Dammel, R.; Theis, J.; Weiß, M. | Conference Paper |
| 1989 | Computer-aided resist modelling with extended xmas in X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.; Dammel, R.; Lingnau, J.; Theis, J.; Weiß, M. | Journal Article |
| 1989 | Negative-tone high-resolution photocatalytic resist for X-ray lithography
Huber, H.-L.; Oertel, H.; Trube, J.; Dammel, R.; Dössel, K.F.; Lingnau, J.; Theis, J. | Journal Article |
| 1987 | Defects in x-ray masks - Detection and printability
Betz, H.; Oertel, H.; Kluwe, A.; Mueller, K.-H. | Journal Article |
| 1987 | Influence of phase shift on pattern transfer in X-rax lithography
Oertel, H.; Huber, H.-L.; Weiß, M. | Journal Article |
| 1987 | Photocatalytic novolak - based positive resist for X-ray lithography - kinetics and simulation
Huber, H.-L.; Oertel, H.; Dössel, K.F.; Dammel, R.; Lingnau, J.; Theis, J. | Journal Article |
| 1987 | Radiation damage effects in boron nitride mask membranes subjected to x-ray exposures
Betz, H.; Huber, H.-L.; Oertel, H.; Johnson, W.A.; Levy, R.A.; Resnick, D.J.; Saunders, T.E.; Yanof, A.W. | Journal Article |
| 1986 | Highly-sensitive novolak-based positive x-ray resist
Huber, H.-L.; Oertel, H.; Doessel, K.-F. | Conference Paper |
| 1986 | Resolution limits in x-ray lithography calculated by means of x-ray lithography simulator XMAS
Betz, H.; Heinrich, K.; Heuberger, A.; Huber, H.-L.; Oertel, H. | Journal Article |
| 1985 | Application of the simulator "XMAS" on specific problems in sub-half micron lithography
Oertel, H.; Betz, H.; Heuberger, A. | Conference Paper |