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| 2020 | IPVF's PV technology vision for 2030
Oberbeck, L.; Alvino, K.; Goraya, B.; Jubault, M. | Journal Article |
| 2009 | Atomic layer deposition of high-permittivity yttrium-doped HfO2 films
Niinistö, J; Kukli, K.; Sajavaara, T.; Ritala, M.; Leskela, M.; Oberbeck, L.; Sundqvist, J.; Schröder, U. | Journal Article |
| 2009 | Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2-x thin films using tunneling atomic force microscopy
Weinreich, W.; Wilde, L.; Kücher, P.; Lemberger, M.; Yanev, V.; Rommel, M.; Bauer, A.J.; Erben, E.; Heitmann, J.; Schröder, U.; Oberbeck, L. | Conference Paper, Journal Article |
| 2009 | Impact of interface variations on J-V and C-V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1-x)AlxO2 films
Weinreich, W.; Reiche, R.; Lemberger, M.; Jegert, G.; Müller, J.; Wilde, L.; Teichert, S.; Heitmann, J.; Erben, E.; Oberbeck, L.; Schröder, U.; Bauer, A.J.; Ryssel, H. | Conference Paper, Journal Article |
| 2009 | Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition
Müller, J.; Böscke, T.S.; Schröder, U.; Reinicke, M.; Oberbeck, L.; Zhou, D.; Weinreich, W.; Kücher, P.; Lemberger, M.; Frey, L. | Conference Paper, Journal Article |
| 2009 | Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers
Weinreich, W.; Ignatova, V.A.; Wilde, L.; Teichert, S.; Lemberger, M.; Bauer, A.J.; Reiche, R.; Erben, E.; Heitmann, J.; Oberbeck, L.; Schröder, U. | Journal Article |
| 2009 | Influence of the amorphous/crystalline phase of Zr1-xAlxO2 high-k layers on the capacitance performance of metal insulator metal stacks
Pakaleva, A.; Lemberger, M.; Bauer, A.J.; Weinreich, W.; Heitmann, J.; Erben, E.; Schröder, U.; Oberbeck, L. | Journal Article |
| 2009 | TiN/ZrO2/Ti/Al metal-insulator-metal capacitors with subnanometer CET using ALD-deposited ZrO2 for DRAM applications
Monaghan, S.; Cherkaoui, K.; O'Connor, E.; Djara, V.; Hurley, P.K.; Oberbeck, L.; Tois, E.; Wilde, L.; Teichert, S. | Journal Article |
| 2008 | Deposition temperature effect on electrical properties and interface of high-k ZrO2 capacitor
Kim, J.-H.; Ignatova, V.A.; Heitmann, J.; Oberbeck, L. | Journal Article |
| 2008 | Physical and electrical characterization of high-k ZrO2 metal-insulator-metal capacitor
Kim, J.-H.; Ignatova, V.; Kücher, P.; Heitmann, J.; Oberbeck, L.; Schröder, U. | Journal Article |
| 2007 | Thermal stability of thin ALD ZrO2 layers as dielectrics in deep trench DRAM devices annealed in N2 and NH3
Weinreich, W.; Lemberger, M.; Erben, E.; Heitmann, J.; Wilde, L.; Ignatova, V.A.; Teichert, S.; Schröder, U.; Oberbeck, L.; Bauer, A.J.; Ryssel, H.; Kücher, P. | Poster |