Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Studying dopant diffusion from Poly-Si passivating contacts
Feldmann, F.; Schön, J.; Niess, J.; Lerch, W.; Hermle, M.
Journal Article
2017High-K metal gate stacks with ultra-thin interfacial layers formed by low temperature microwave-based plasma oxidation
Czernohorsky, M.; Seidel, K.; Kühnel, K.; Niess, J.; Sacher, N.; Kegel, W.; Lerch, W.
Journal Article
2016Equipment simulation for studying the growth rate and its uniformity of oxide layers deposited by plasma-enhanced oxidation
Baer, Eberhard; Niess, Juergen
Conference Paper
2016Low-temperature microwave-based plasma oxidation of Ge and oxidation of silicon followed by plasma nitridation
Lerch, W.; Schick, T.; Sacher, N.; Kegel, W.; Niess, J.; Czernohorsky, M.; Riedel, S.
Conference Paper
2008Advanced activation trends for boron and arsenic by combinations of single, multiple flash anneals and spike rapid thermal annealing
Lerch, W.; Paul, S.; Niess, J.; McCoy, S.; Gelpey, J.; Cristiano, F.; Severac, F.; Fazzini, P.; Martinez-Limia, A.; Pichler, P.; Kheyrandish, H.; Bolze, D.
Conference Paper
2007Advanced activation and deactivation of arsenic-implanted ultra-shallow junctions using flash and spike + flash annealing
Lerch, W.; Paul, S.; Niess, J.; McCoy, S.; Gelpey, J.; Bolze, D.; Cristiano, F.; Severac, F.; Fazzini, P.F.; Martinez, A.; Pichler, P.
Conference Paper
2007Experimental and theoretical results of dopant activation by a combination of spike and flash annealing
Lerch, W.; Paul, S.; Niess, J.; Chan, J.; McCoy, S.; Gelpey, J.; Cristiano, F.; Severac, F.; Fazzini, P.F.; Bolze, D.; Pichler, P.; Martinez, A.; Mineji, A.; Shishiguchi, S.
Conference Paper
2006Pattern Effects with the Mask Off
Nenyei, Z.; Niess, J.; Lerch, W.; Dietl, W.; Timans, P.J.; Pichler, P.
Conference Paper
2006Process-induced diffusion phenomena in advanced CMOS technologies
Pichler, P.; Burenkov, A.; Lerch, W.; Lorenz, J.; Paul, S.; Niess, J.; Nényei, Z.; Gelpey, J.; McCoy, S.; Windl, W.; Giles, L.F.
Conference Paper
2005Advanced activation of ultra-shallow junctions using flash-assisted RTP
Lerch, W.; Paul, S.; Niess, J.; McCoy, S.; Selinger, T.; Gelpey, J.; Cristiano, F.; Severac, F.; Gavelle, M.; Boninelli, S.; Pichler, P.; Bolze, D.
Conference Paper