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| 2017 | Odor-sensing system to support social participation of people suffering from incontinence
Ortiz Perez, Alvaro; Kallfaß-de Frenes, Vera; Filbert, Alexander; Kneer, Janosch; Bierer, Benedikt; Held, Pirmin; Klein, Philipp; Wöllenstein, Jürgen; Benyoucef, Dirk; Kallfaß, Sigrid; Mescheder, Ulrich; Palzer, Stefan | Journal Article |
| 2008 | Sensorarray zur Luftqualitätsmessung
Wöllenstein, J.; Bauersfeld, M.-L.; Rademacher, S.; Kovacs, A.; Kritwattanakhorn, J.; Müller, B.; Mescheder, U.; Peter, A. | Conference Paper |
| 2007 | MEMS-based air quality sensor
Mescheder, U.; Bauersfeld, M.-L.; Kovacs, A.; Kritwattanakhorn, J.; Müller, B.; Peter, A.; Ament, C.; Rademacher, S.; Wöllenstein, J. | Conference Paper |
| 2007 | Modelbasierte Verfahren zur Bestimmung der Luftgüte
Peter, A.; Ament, C.; Bauersfeld, M.-L.; Rademacher, S.; Wöllenstein, J.; Kritwattanakhorn, J.; Kovacs, A.; Müller, B.; Mescheder, U. | Conference Paper |
| 2007 | Optimization of platinum adhesion in electrochemical etching process for multi-sensor systems
Kritwattanakhorn, J.; Kovacs, A.; Mescheder, U.; Müller, B.; Bauersfeld, M.-L.; Rademacher, S.; Wöllenstein, J. | Journal Article, Conference Paper |
| 2007 | Sensor system for air quality measurement
Kovacs, A.; Müller, B.; Kritwattanakhorn, J.; Mescheder, U.; Peter, A.; Ament, C.; Wöllenstein, J.; Bauersfeld, M.-L.; Rademacher, S. | Conference Paper |
| 2006 | Optimization of platinum adhesion in electrochemical etching process for multi-sensor systems
Kritwattanakhorn, J.; Kovacs, A.; Mescheder, U.; Müller, B.; Bauersfeld, M.-L.; Rademacher, S.; Wöllenstein, J. | Conference Paper |
| 2005 | Sensorarray zur Luftqualitätsmessung
Ament, C.; Bauersfeld, M.-L.; Kovacs, A.; Kritwattanakhorn, J.; Mescheder, U.; Müller, B.; Peter, A.; Rademacher, S.; Wöllenstein, J. | Conference Paper |
| 1991 | Characterization of silicon open stencil masks in an ion projection lithography machine
Mescheder, U.; Buchmann, L.-M.; Torkler, M. | Conference Paper |
| 1990 | Influence of X-ray mask repair on pattern placement accuracy
Schaffer, H.; Weigmann, U.; Petzold, C.; Mescheder, U. | Conference Paper |
| 1989 | State of the art of pattern placement accuracy of silicon X-ray master masks
Pongratz, S.; Mescheder, U.; Ehrlich, C.; Huber, H.-L.; Kohlmann, K.; Windbracke, W. | Conference Paper |
| 1988 | Application of SiC-X-ray masks for fabrication submicron devices
Mackens, U.; Lüthje, H.; Mescheder, U.; Mund, F.; Pongratz, S. | Conference Paper |
| 1988 | Subhalf micron critical dimension control in X-ray lithography mask technology
Mescheder, U.; Mund, F.; Trube, J.; Windbracke, W.; Huber, H.-L.; Pongratz, S. | Conference Paper |
| 1987 | Linewidth metrology for X-rax masks with subhalfmicron feature size
Huber, H.-L.; Mescheder, U.; Mund, F. | Journal Article |
| 1986 | Silicon x-ray masks - pattern placement and overlay accuracy
Betz, H.; Huber, H.-L.; Pongratz, S.; Rohrmoser, W.; Windbracke, W.; Mescheder, U. | Conference Paper |
| 1986 | Stability of SiC-masks for high resolution synchrotron X-ray lithography
Lüthje, H.; Mackens, U.; Mescheder, U.; Matthießen, B. | Journal Article |