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| 2003 | Beschichtungsanlage
Geisler, M.; Kastner, A.; Szyszka, B.; Pflug, A.; Malkomes, N. | Patent |
| 2003 | Durable "self cleaning" coatings in optical quality
Reihs, K.; Malkomes, N.; Müller, P.; Claessen, R.; Cavaleiro, P.; Stahlschmidt, O.; Renker, S.; Duparre, A. | Conference Paper |
| 2003 | Durable ultra-hydrophobic glass coatings with optical quality
Reihs, K.; Malkomes, N.; Müller, P.; Renker, S.; Stahlschmidt, O.; Claessen, R.; Cavaleiro, P.; Duparre, A. | Conference Paper |
| 2003 | VERFAHREN ZUR REGELUNG VON REAKTIVEN SPUTTERPROZESSEN
Bringmann, U.; Hoeing, T.; Malkomes, N.; Szyszka, B.; Vergoehl, M.; Poeckelmann, R. | Patent |
| 2003 | VERFAHREN ZUR REGELUNG VON SPUTTERPROZESSEN
Szyszka, B.; Malkomes, N. | Patent |
| 2002 | Simulation of reactive magnetron sputtering kinetics in real in-line processing chambers
Pflug, A.; Malkomes, N.; Sittinger, V.; Szyszka, B. | Conference Paper |
| 2002 | Verfahren zur Stabilisierung von Sputterprozessen
Malkomes, N. | Patent |
| 2001 | Dynamic simulation of process control of the reactive sputter process and experimental results
Malkomes, N.; Vergöhl, M. | Journal Article |
| 2001 | Dynamic simulation of process control of the reactive sputter process using two seperate targets and experimental results
Malkomes, N.; Bierhals, A.; Szyszka, B.; Vergöhl, M. | Conference Paper |
| 2001 | In-situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thicknesses attainable with ellipsometry and photometry
Vergöhl, M.; Malkomes, N.; Matthee, T.; Bräuer, G.; Richter, U.; Nickol, F.-W.; Bruch, J. | Conference Paper, Journal Article |
| 2001 | In-situ-Kontrolle und Regelung reaktiver Magnetron-Zerstäubungsprozesse
Malkomes, N. | Dissertation |
| 2001 | Large area deposition of transparent and conductive ZnO:Al layers by reactive mid frequency magnetron sputtering
Szyszka, B.; Höing, T.; Jiang, X.; Bierhals, A.; Malkomes, N.; Vergöhl, M.; Sittinger, V.; Bringmann, U.; Bräuer, G. | Conference Paper |
| 2001 | Nonclassical impedance control of the high rate midfrequency reactive magnetron sputter process using harmonic analysis
Malkomes, N.; Szyszka, B. | Journal Article |
| 2001 | Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering
Malkomes, N.; Vergöhl, M.; Szyszka, B. | Journal Article |
| 2000 | In-situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thicknesses attainable with ellipsometry and photometry
Vergöhl, M.; Malkomes, N.; Matthee, T.; Bräuer, G.; Richter, U.; Nickol, F.-W.; Bruch, J. | Conference Paper |
| 2000 | In-situ spectroscopic ellipsometry and plasma control for large-scale magnetron sputter deposition processes
Vergöhl, M.; Malkomes, N.; Matthée, T.; Bräuer, G. | Conference Paper |
| 2000 | Optimization of the reflectivity of magnetron sputter deposited silver films
Vergöhl, M.; Malkomes, N.; Szyszka, B.; Neumann, F.; Matthee, T.; Bräuer, G. | Conference Paper, Journal Article |
| 2000 | Real-time control of reactive magnetron-sputter deposited optical filters by in situ spectroscopic ellipsometry
Vergöhl, M.; Malkomes, N.; Matthée, T.; Bräuer, G. | Conference Paper, Journal Article |
| 2000 | Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics
Vergöhl, M.; Hunsche, B.; Malkomes, N.; Matthee, T.; Szyszka, B. | Journal Article |
| 2000 | Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics
Vergöhl, M.; Hunsche, B.; Malkomes, N.; Matthee, T.; Szyszka, B. | Journal Article, Conference Paper |
| 1999 | Effizienzsteigerung von Beschichtungsprozessen für optische Funktionsschichten auf Architekturglas durch in-situ Kontrolle und Regelung
Vergöhl, M.; Malkomes, N.; Bräuer, G.; Bruch, J.; Jäger, S.; Richter, U. | Conference Paper |
| 1999 | Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control
Vergöhl, M.; Malkomes, N.; Staedler, T.; Matthee, T.; Richter, U. | Conference Paper |
| 1999 | Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control
Vergöhl, M.; Malkomes, N.; Staedler, T.; Matthee, T.; Richter, U. | Journal Article |
| 1999 | In-situ Ellipsometrie und Plasmadiagnostik zur Effizienzsteigerung der Abscheidung optischer Funktionsschichten durch reaktives Magnetron-Sputtern
Vergöhl, M.; Malkomes, N.; Bräuer, G.; Bruch, J.; Jäger, S.; Richter, U. | Conference Paper |