Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1989Computer-aided resist modelling with extended xmas in X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.; Dammel, R.; Lingnau, J.; Theis, J.; Weiß, M.
Journal Article
1989The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.
Conference Paper
1989E-beam application of highly sensitive positive and negative-tone resists for x-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Hessemer, W.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.
Conference Paper
1989High sensitivity positive tone X-ray resist: RAY-PF performance under e-beam exposure
Menschig, A.; Forchel, A.; Dammel, R.; Lingnau, J.; Pongratz, S.; Scheunemann, U.; Theis, J.
Conference Paper
1989Negative-tone high-resolution photocatalytic resist for X-ray lithography
Huber, H.-L.; Oertel, H.; Trube, J.; Dammel, R.; Dössel, K.F.; Lingnau, J.; Theis, J.
Journal Article
1987Photocatalytic novolak - based positive resist for X-ray lithography - kinetics and simulation
Huber, H.-L.; Oertel, H.; Dössel, K.F.; Dammel, R.; Lingnau, J.; Theis, J.
Journal Article