Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2011Atomic layer deposition of ruthenium films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and oxygen
Kukli, K.; Kemeli, M.; Puukilainen, E.; Aarik, J.; Aidla, A.; Sjavaara, T.; Laitinen, M.; Tallarida, M.; Sundqvist, J.; Ritala, M.; Leskela, M.
Journal Article
2011Atomic layer deposition of ruthenium films on strontium titanate
Kukli, K.; Kemell, M.; Lu, J.; Hultman, L.; Riedel, S.; Sundqvist, J.; Ritala, M.; Leskela, M.
Journal Article
2009Atomic layer deposition of high-k oxides of the group 4 metals for memory applications
Niinisto, J.; Kukli, K.; Heikkila, M.; Ritala, M.; Leskela, M.
Journal Article
2009Atomic layer deposition of high-permittivity yttrium-doped HfO2 films
Niinistö, J; Kukli, K.; Sajavaara, T.; Ritala, M.; Leskela, M.; Oberbeck, L.; Sundqvist, J.; Schröder, U.
Journal Article
2007Study of a novel ALD process for depositing MgF2 thin films
Pilvi, T.; Hatanpaa, T.; Puukilainen, E.; Arstila, K.; Bischoff, M.; Kaiser, U.; Kaiser, N.; Leskela, M.; Ritala, M.
Journal Article