Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Enhanced contamination control methods in advanced wafer processing
Pfeffer, M.; Richter, H.; Altmann, R.; Leibold, A.; Bauer, A.
Conference Paper
2016Contamination control for wafer container used within 300 mm manufacturing for power microelectronics
Schneider, G.; Nguyen, T.Q.; Taubert, M.; Bounouar, J.; Le-Guet, C.; Leibold, A.; Richter, H.; Pfeffer, M.
Conference Paper
2016Particle free handling of substrates
Samadi, H.; Pfeffer, M.; Altmann, R.; Leibold, A.; Gumprecht, T.; Bauer, A.
Journal Article
2015Advanced contamination control methods for yield enhancement. YE: Yield Enhancement/Learning
Richter, H.; Leibold, A.; Altmann, R.; Doffek, B.; Koebl, J.; Pfeffer, M.; Bauer, A.; Schneider, G.; Cheung, D.
Conference Paper
2015Particle free handling of substrates
Samadi, H.; Pfeffer, M.; Altmann, R.; Leibold, A.; Gumprecht, T.; Bauer, A.
Conference Paper
2012Assessment of a FOUP conditioning equipment for advanced semiconductor application
Otto, M.; Rioufrays, S.; Favre, A.; Leibold, A.; Altmann, R.; Gennaro, S.; Dell'Anna, R.; Canteri, R.; Pfitzner, L.
Conference Paper
2012Reference samples for ultra trace analysis of organic compounds on substrate surfaces
Nutsch, A.; Beckhoff, B.; Borionetti, G.; Codegoni, D.; Grasso, S.; Hoenicke, P.; Leibold, A.; Müller, M.; Otto, M.; Pfitzner, L.; Polignano, M.-L.
Conference Paper
2011Analysis of contaminated oxide-silicon interfaces
Polignano, M.L.; Codegoni, D.; Castellano, L.; Greco, S.; Borionetti, G.; Bonoli, F.; Nutsch, A.; Altmann, R.; Leibold, A.; Otto, M.; Monge, P.; Riva, C.
Conference Paper
2011The impact of organic contamination on the oxide-silicon interface
Codegoni, D.; Polignano, M.L.; Castellano, L.; Borionetti, G.; Bonoli, F.; Nutsch, A.; Leibold, A.; Otto, M.
Conference Paper
2009Characterization of Organic Contamination during Semiconductor Manufacturing Processing Employing Near Edge X-Ray Absorption Fine Structure Spectroscopy
Mueller, M.; Beckhoff, B.; Bedana, P.; Borionetti, G.; Corradi, A.; Frey, L.; Guerinoni, G.; Leibold, A.; Otto, M.; Nutsch, A.; Müller, M.; Beckhoff, B.; Bedana, P.; Borionetti, G.; Corradi, A.; Frey, L.; Guerinoni, G.; Leibold, A.; Otto, M.; Nutsch, A.
Abstract
2009Characterization of organic contamination in semiconductor manufacturing processes
Nutsch, A.; Beckhoff, B.; Bedana, G.; Borionetti, G.; Codegoni, D.; Grasso, S.; Guerinoni, G.; Leibold, A.; Müller, M.; Otto, M.; Pfitzner, L.; Polignano, M.; Simone, D. de; Frey, L.
Conference Paper
2009Complementary metrology within a European joint laboratory
Nutsch, A.; Beckhoff, B.; Altmann, R.; Berg, J.A. van den; Giubertoni, D.; Hoenicke, P.; Bersani, M.; Leibold, A.; Meirer, F.; Müller, M.; Pepponi, G.; Otto, M.; Petrik, P.; Reading, M.; Pfitzner, L.; Ryssel, H.
Conference Paper
2009Detection of Acidic Substances of H-X Type in Clean Room Air
Kames, J.; Leibold, A.; Nutsch, A.; Otto, M.
Conference Paper
2009Monitoring system for airborne molecular contamination (AMC) in semiconductor manufacturing areas and micro-environments
Otto, M.; Leibold, A.; Wulf, L.; Hurlebaus, M.; Pfitzner, L.
Conference Paper