Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2020Back-End-of-Line Compatible Low-Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation
Lehninger, D.; Olivo, R.; Ali, T.; Lederer, M.; Kämpfe, T.; Mart, C.; Biedermann, K.; Kühnel, K.; Roy, L.; Kalkani, M.; Seidel, K.
Journal Article
2020Effect of Substrate Implant Tuning on the Performance of MFIS Silicon Doped Hafnium Oxide (HSO) FeFET Memory
Ali, T.; Kühnel, K.; Mertens, K.; Czernohorsky, M.; Rudolph, M.; Duhan, P.; Lehninger, D.; Hoffmann, R.; Steinke, P.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Conference Paper
2020Impact of Ferroelectric Wakeup on Reliability of Laminate based Si-doped Hafnium Oxide (HSO) FeFET Memory Cells
Ali, T.; Kühnel, K.; Czernohorsky, M.; Rudolph, M.; Pätzold, B.; Olivo, R.; Lehninger, D.; Mertens, K.; Müller, F.; Lederer, M.; Hoffmann, R.; Mart, C.; Kalkani, M.N.; Steinke, P.; Kämpfe, T.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Conference Paper
2020A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: Pyroelectricity and Reliability
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lehninger, D.; Olivo, R.; Lederer, M.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M.
Journal Article
2020A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: A Temperature-Modulated Operation
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lederer, M.; Olivo, R.; Lehninger, D.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M.
Journal Article
2020Whether Ge-Rich ZrO2 and Ge-Rich HfO2 Materials Have Similar Reaction on Annealing Treatment?
Khomenkova, L.; Lehninger, D.; Agocs, E.; Petrik, P.; Portier, X.; Korsunska, N.; Melnichuk, O.; Gourbilleau, F.; Heitmann, J.
Conference Paper
2011Comparison of PVD, PECVD and PEALD Ru-TaN films with high Ru concentration for direct Cu plating
Wojcik, H.; Merkel, U.; Bartha, J.W.; Li, J.; Lehninger, D.; Engelmann, H.J.; Popatov, P.; Gluch, J.; Knaut, M.; Strehle, S.; Wenzel, C.; Adolphi, B.; Neumann, V.; Liske, R.
Conference Paper
2009Surface-sensitive strain analysis of Si/SiGe line structures by raman and UV-raman spectroscopy
Roelke, M.; Hecker, M.; Hermann, P.; Lehninger, D.; Ritz, Y.; Zschech, E.; Vartanian, V.
Conference Paper