Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2011Influence of metal gate and capping film stress on TANOS cell performance
Czernohorsky, M.; Melde, T.; Beyer, V.; Beug, M.F.; Paul, J.; Hoffmann, R.; Knöfler, R.; Tilke, A.T.
Journal Article, Conference Paper
2011TaN and Al2O3 sidewall gate-etch damage influence on program, erase, and retention of sub-50-nm TANOS nand flash memory cells
Beug, M.F.; Melde, T.; Paul, J.; Knoefler, R.
Journal Article
2010Analysis of TANOS memory cells with sealing oxide containing blocking dielectric
Beug, M. Florian; Melde, Thomas; Czernohorsky, Malte; Hoffmann, Raik; Paul, Jan; Knöfler, Roman; Tilke, Armin T.
Journal Article
2010Improved high-temperature etch processing of high-k metal gate stacks in scaled TANOS memory devices
Paul, Jan; Beyer, Volkhard; Czernohorsky, Malte; Beug, M. Florian; Biedermann, Kati; Mildner, Marcus; Michalowski, Pawel Piotr; Schütze, Enrico; Melde, Thomas; Wege, S.; Knöfler, Roman; Mikolajick, Thomas
Conference Paper, Journal Article
2009Improvement of 48 nm TANOS NAND cell performance by introduction of a removable encapsulation liner
Beug, M. Florian; Melde, Thomas; Paul, Jan; Bewersdorff-Sarlette, Ulrike; Czernohorsky, Malte; Beyer, Volkhard; Hoffmann, Raik; Seidel, Konrad; Löhr, Daniel-Andre; Bach, Lars; Knöfler, R.; Tilke, Armin T.
Conference Paper
2009Select device disturb phenomenon in TANOS NAND flash memories
Melde, Thomas; Beug, M. Florian; Bach, Lars; Tilke, Armin T.; Knöfler, Roman; Bewersdorff-Sarlette, Ulrike; Beyer, Volkhard; Czernohorsky, Malte; Paul, Jan; Mikolajick, Thomas
Journal Article
2009TaN metal gate damage during high-k (Al2O3) high-temperature etch
Paul, Jan; Beyer, Volkhard; Michalowski, Pawel Piotr; Beug, M. Florian; Bach, Lars; Ackermann, Marco; Wege, S.; Tilke, Armin T.; Chan, N.; Mikolajick, Thomas; Bewersdorff-Sarlette, Ulrike; Knöfler, Roman; Czernohorsky, Malte; Ludwig, C.
Conference Paper, Journal Article
2002A novel high aspect ratio technology for MEMS fabrication using standard silicon wafers
Bertz, A.; Küchler, M.; Knöfler, R.; Gessner, T.
Journal Article
2000Stress-induced laterial deflections of microstructures
Küchler, M.; Knöfler, R.; Steiniger, c.; Raschke, T.; Gessner, T.; Dudek, R.; Döring, R.
Conference Paper
1999Untersuchungen zur Herstellung von lateralen Tastnadeln für die Rasterkraftmikroskopie
Knöfler, R.; Bertz, A.; Wolf, K.; Küchler, M.; Gessner, T.
Conference Paper