Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. | | |
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| 2008 | Plasma enhanced chemical etching at atmospheric pressure for crystalline silicon wafer processing and process control by in-line FTIR gas spectroscopy
Linaschke, D.; Leistner, M.; Mäder, G.; Grählert, W.; Dani, I.; Kaskel, S.; Lopez, E.; Hopfe, V.; Kirschmann, M.; Frenck, J. | Conference Paper |
| 2008 | Plasma enhanced CVD and plasma chemical etching at atmospheric pressure for continuous processing of crystallien silicon solar wafers
Lopez, E.; Dresler, B.; Mäder, G.; Dani, I.; Hopfe, V.; Kaskel, S.; Heintze, M.; Möller, R.; Wanka, H.; Kirschmann, M.; Frenck, J.; Poruba, A.; Barinka, R.; Dahl, R.; Nussbaumer, H. | Conference Paper |
| 2007 | New developments in plasma enhanced chemical etching at atmospheric pressure for crystalline silicon wafer processing
Lopez, E.; Beese, H.; Mäder, G.; Dani, I.; Hopfe, V.; Heintze, M.; Moeller, R.; Wanka, H.; Kirschmann, M.; Frenck, J.A. et al. | Conference Paper |