Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2008Plasma enhanced chemical etching at atmospheric pressure for crystalline silicon wafer processing and process control by in-line FTIR gas spectroscopy
Linaschke, D.; Leistner, M.; Mäder, G.; Grählert, W.; Dani, I.; Kaskel, S.; Lopez, E.; Hopfe, V.; Kirschmann, M.; Frenck, J.
Conference Paper
2008Plasma enhanced CVD and plasma chemical etching at atmospheric pressure for continuous processing of crystallien silicon solar wafers
Lopez, E.; Dresler, B.; Mäder, G.; Dani, I.; Hopfe, V.; Kaskel, S.; Heintze, M.; Möller, R.; Wanka, H.; Kirschmann, M.; Frenck, J.; Poruba, A.; Barinka, R.; Dahl, R.; Nussbaumer, H.
Conference Paper
2007New developments in plasma enhanced chemical etching at atmospheric pressure for crystalline silicon wafer processing
Lopez, E.; Beese, H.; Mäder, G.; Dani, I.; Hopfe, V.; Heintze, M.; Moeller, R.; Wanka, H.; Kirschmann, M.; Frenck, J.A. et al.
Conference Paper