Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2010Checkerboard pattern for PSF parameter determination in electron beam lithography
Gutsch, M.; Choi, K.-H.; Freitag, M.; Hauptmann, M.; Hohle, C.; Jaschinsky, P.; Keil, K.
Conference Paper
2010Conventional and reversed image printing in electron beam direct write lithography with proximity effect corrections based on dose and shape modification
Choi, K.-H.; Gutsch, M.; Freitag, M.; Keil, K.; Jaschinsky, P.; Hohle, C.
Conference Paper
2009Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write
Keil, K.; Jaschinsky, P.; Hohle, C.; Choi, K.-H.; Schneider, R.; Tesauro, M.; Thrum, F.; Zimmermann, R.; Kretz, J.
Conference Paper
2009Detailed characterization of hydrogen silsesquioxane for e-beam applications in a dynamic random access memory pilot line environment
Keil, K.; Choi, K.-H.; Hohle, C.; Kretz, J.; Szikszai, L.; Bartha, J.-W.
Journal Article
2009Fabrication of metrology test structures for future technology nodes using high resolution variable-shaped E-Beam direct write
Szikszai, L.; Jaschinsky, P.; Keil, K.; Hauptmann, M.; Mört, M.; Seifert, U.; Hohle, C.; Choi, K.-H.; Thrum, F.; Kretz, J.; Paz, V.F.; Boef, A.D.
Conference Paper
2009Fast backscattering parameter determination in e-beam lithography with a modified doughnut test
Keil, K.; Hauptmann, M.; Choi, K.H.; Kretz, J.; Eng, L.M.; Bartha, J.W.
Journal Article
2009Resolution and total blur: Correlation and focus dependencies in e-beam lithography
Keil, K.; Hauptmann, M.; Kretz, J.; Constancias, C.; Pain, L.; Bartha, J.-W.
Journal Article
2008Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method
Keil, Katja; Choi, Kang-Hoon; Hohle, Christoph; Kretz, Johannes; Lutz, Tarek; Bettin, Lutz; Boettcher, Monika; Hahmann, Peter; Kliem, Karl-Heinz; Schnabel, Bernd; Irmscher, Mathias; Sailer, Holger
Conference Paper, Journal Article
2008Gate edge roughness in electron beam direct write and its influence to device characteristics
Choi, K.-H.; Dittrich, R.; Goldbach, M.; Hohlea, C.; Keil, K.; Marschner, T.; Tesauro, M.; Thrum, F.; Zimmermann, R.; Kretz, J.
Conference Paper
2008MAGIC: A european program to push the insertion of maskless lithography
Pain, L.; Icard, B.; Tedesco, S.; Kampherbeck, B.; Gross, G.; Klein, C.; Loeschner, H.; Platzgummer, E.; Morgan, R.; Manakli, S.; Kretz, J.; Holhe, C.; Choi, K.-H.; Thrum, F.; Kassel, E.; Pilz, W.; Keil, K.; Butschke, J.; Irmscher, M.; Letzkus, F.; Hudek, P.; Paraskevopoulos, A.; Ramm, P.; Weber, J.
Conference Paper
2008Printing of sub resolution shots in electron beam direct write with variable shaped beam machines
Thrum, F.; Kretz, J.; Hohle, C.; Choi, K.-H.; Keil, K.
Conference Paper
2007Data preparation for EBDW
Thrum, F.; Kretz, J.; Lutz, T.; Keil, K.; Arndt, C.; Choi, K.-H.; Baetz, U.; Belie, N.; Lemke, M.; Denker, U.; Gramss, J.; Kliem, K.-H.
Conference Paper
2007Defect inspection of positive and negative sub-60nm resist pattern printed with variable shaped E-Beam direct write lithography
Arndt, C.; Hohle, C.; Kretz, J.; Lutz, T.; Richter, M.; Keil, K.; Lapidot, M.; Zemach, D.; Kindler, M.
Conference Paper
2007Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications
Hohle, C.; Arndt, C.; Choi, K.-H.; Kretz, J.; Lutz, T.; Thrum, F.; Keil, K.
Journal Article
2007Resist processes for high resolution mask and direct write applications using the latest vistec VSB electron column
Sailer, H.; Irmscher, M.; Hohle, C.; Keil, K.; Boettcher, M.; Hahmann, P.
Conference Paper