Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2014Reliability of monolithic RC-snubbers in MOS-based power modules
Erlbacher, T.; Schwarzmann, H.; Krach, F.; Bauer, A.J.; Berberich, S.E.; Kasko, I.; Frey, L.
Conference Paper
2010Advanced process control - lessons learned from semiconductor manufacturing
Schellenberger, M.; Roeder, G.; Öchsner, R.; Schöpka, U.; Kasko, I.
Journal Article
1998Noncontacting measurement of thickness of thin titanium silicide films using spectroscopic ellipsometry
Kal, S.; Kasko, I.; Ryssel, H.
Journal Article
1997Application of high energy resolved X-ray emission spectroscopy for monitoring of silicide formation in Co/SiO2/Si system
Kurmaev, E.Z.; Shamin, S.N.; Galakhov, V.R.; Kasko, I.
Journal Article
1997Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis
Kasko, I.; Kal, S.; Ryssel, H.
Conference Paper
1997Cleaning process optimization in a gate oxide cluster tool using an in-line XPS module
Froeschle, B.; Glowacki, F.; Bauer, A.J.; Kasko, I.; Öchsner, R.; Schneider, C.
Conference Paper
1997Integrated process control for cluster tools using an in-line analytical module
Kasko, I.; Oechsner, R.; Froeschle, B.; Schneider, C.; Pfitzner, L.; Ryssel, H.
Conference Paper
1997A novel XPS system for integration into advanced semiconductor equipment for in-line process control
Kasko, I.; Oechsner, R.; Schneider, C.; Pfitzner, L.; Ryssel, H.; Trubitsyn, A.A.; Kratenko, V.I.
Conference Paper
1995Ion-beam mixed ultra-thin cobalt silicide (CoSi2) films by cobalt sputtering and rapid thermal annealing
Kal, S.; Kasko, I.; Ryssel, H.
Journal Article
1995Preparation and characterization of ultra-thin cobalt silicide for VLSI applications
Kal, S.; Kasko, I.; Ryssel, H.
Journal Article
1994Ion-beam induced CoSi2 layers - formation and contact properties.
Dehm, C.; Kasko, I.; Ryssel, H.
Journal Article
1994Ion-beam mixing of Co-Si and Co-SiO2 - a comparison between Monte Carlo simulations experiments
Kasko, I.; Dehm, C.; Gyulai, J.; Ryssel, H.
Journal Article
1994Practical aspects of ion beam analysis of semiconductor structures
Frey, L.; Pichler, P.; Kasko, I.; Thies, I.; Lipp, S.; Streckfuß, N.; Gong, L.
Journal Article
1994Single crystal growth of Si-Ge alloy by ion implantation and sequential rapid thermal
Kal, S.; Kasko, I.; Ryssel, H.
Journal Article
1993Effect of ion-beam mixing temperature on cobalt silicide formation
Kasko, I.; Dehm, C.; Frey, L.; Ryssel, H.
Journal Article
1993Influence of impurities on ion beam induced TiSi2 formation
Dehm, C.; Raum, B.; Kasko, I.; Ryssel, H.
Journal Article
1992Influence of low-dose ion-beam mixing on CoSi2 formation
Kasko, I.; Dehm, C.; Ryssel, H.
Conference Paper
1992Interaction between Co and SiO2 during ion-beam mixing and rapid thermal annealing
Dehm, C.; Kasko, I.; Burte, E.P.; Ryssel, H.
Conference Paper