Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2003Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques
Erdmann, A.; Kalus, C.K.; Schmöller, T.; Wolter, A.
Conference Paper
2003Rigorous simulation of defective EUV multilayer masks
Sambale, C.; Schmöller, T.; Erdmann, A.; Evanschitzky, P.; Kalus, C.
Conference Paper
2003Rigorous simulation of exposure over nonplanar wafers
Erdmann, A.; Kalus, C.K.; Schmöller, T.; Klyonova, Y.; Sato, T.; Endo, A.; Shibata, T.; Kobayashi, Y.
Conference Paper
2003Rigorous Simulation of Lithographic Exposure of Photoresist over a Nonplanar Wafer
Erdmann, A.; Kalus, C.
Conference Paper
2002Modification of boundaries conditions in the FDTD algorithm for EUV masks modeling
Vial, A.; Erdmann, A.; Schmoeller, T.; Kalus, C.
Conference Paper
2001Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applications
Kalus, C.; List, S.; Erdmann, A.; Gordon, R.; McCallum, M.; Semmler, A.
Journal Article
2000Optimizing edge topography of alternating phase shift masks using rigorous mask modelling
Friedrich, C.; Mader, L.; Erdmann, A.; List, S.; Gordon, R.; Kalus, C.; Griesinger, U.; Pforr, R.; Mathuni, J.; Ruhl, G.; Maurer, W.
Conference Paper
1999FIRM: a new software tool for calibration of lithography simulation
Krüger, D.; Kalus, C.K.; Erdmann, A.; Friedrich, C.; Käsmaier, R.; Feike, A.
Conference Paper
1997Integrated three-dimensional topography simulation of contact hole processing
Bär, E.; Benvenuti, A.; Henke, W.; Jünemann, B.; Kalus, C.; Niedermaier, P.; Lorenz, J.
Conference Paper