Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1999Nondestructive analytical tools for characterization of thin titanium silicide films prepared by conventional and direct step silicidation with enhanced transition
Kal, S.; Ryssel, H.
Journal Article
1999Nondestructive analytical tools for characterization of thin titanium silicide films prepared by conventional and direct step silicidation with enhanced transition
Kal, S.; Ryssel, H.
Journal Article
1998Noncontacting measurement of thickness of thin titanium silicide films using spectroscopic ellipsometry
Kal, S.; Kasko, I.; Ryssel, H.
Journal Article
1997Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis
Kasko, I.; Kal, S.; Ryssel, H.
Conference Paper
1995Ion-beam mixed ultra-thin cobalt silicide (CoSi2) films by cobalt sputtering and rapid thermal annealing
Kal, S.; Kasko, I.; Ryssel, H.
Journal Article
1995Preparation and characterization of ultra-thin cobalt silicide for VLSI applications
Kal, S.; Kasko, I.; Ryssel, H.
Journal Article
1994Single crystal growth of Si-Ge alloy by ion implantation and sequential rapid thermal
Kal, S.; Kasko, I.; Ryssel, H.
Journal Article