Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2020Back-End-of-Line Compatible Low-Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation
Lehninger, D.; Olivo, R.; Ali, T.; Lederer, M.; Kämpfe, T.; Mart, C.; Biedermann, K.; Kühnel, K.; Roy, L.; Kalkani, M.; Seidel, K.
Journal Article
2020Development of Rutile Titanium Oxide Thin Films as Battery Material Component Using Atomic Layer Deposition
Kia, A.M.; Bönhardt, S.; Zybell, S.; Kühnel, K.; Haufe, N.; Weinreich, W.
Journal Article
2020Effect of Substrate Implant Tuning on the Performance of MFIS Silicon Doped Hafnium Oxide (HSO) FeFET Memory
Ali, T.; Kühnel, K.; Mertens, K.; Czernohorsky, M.; Rudolph, M.; Duhan, P.; Lehninger, D.; Hoffmann, R.; Steinke, P.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Conference Paper
2020Impact of Ferroelectric Wakeup on Reliability of Laminate based Si-doped Hafnium Oxide (HSO) FeFET Memory Cells
Ali, T.; Kühnel, K.; Czernohorsky, M.; Rudolph, M.; Pätzold, B.; Olivo, R.; Lehninger, D.; Mertens, K.; Müller, F.; Lederer, M.; Hoffmann, R.; Mart, C.; Kalkani, M.N.; Steinke, P.; Kämpfe, T.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Conference Paper
2020Piezoelectric Response of Polycrystalline Silicon-Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles
Mart, Clemens; Kämpfe, Thomas; Hoffmann, Raik; Eßlinger, Sophia; Kirbach, Sven; Kühnel, Kati; Czernohorsky, Malte; Eng, Lukas M.; Weinreich, Wenke
Journal Article
2020A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: Pyroelectricity and Reliability
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lehninger, D.; Olivo, R.; Lederer, M.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M.
Journal Article
2020A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: A Temperature-Modulated Operation
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lederer, M.; Olivo, R.; Lehninger, D.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M.
Journal Article
2020Surface Dependent Performance of Ultrathin TiN Films as an Electrically Conducting Li Diffusion Barrier for Li-Ion Based Devices
Speulmanns, Jan; Kia, Alireza M.; Kühnel, Kati; Bönhardt, Sascha; Weinreich, Wenke
Journal Article
2019Antiferroelektrische, eingebettete Dünnschichtkondensatoren als Energiespeicher für autarke Sensorelemente
Czernohorsky, Malte; Weder, Andreas; Mart, Clemens; Falidas, K.; Kühnel, K.; Viegas, A.E.; Holland, H.-J.; Weinreich, W.
Conference Paper
2019Doping hafnium oxide by in-situ precursor mixing
Weinreich, Wenke; Mart, Clemens; Kühnel, Kati; Kämpfe, Thomas; Czernohorsky, Malte
Presentation
2019Ferroelectric and pyroelectric properties of polycrystalline La-doped HfO2 thin films
Mart, Clemens; Kühnel, Kati; Kämpfe, Thomas; Zybell, Sabine; Weinreich, Wenke
Journal Article
2019Formation of highly conformal spinel lithium titanate thin films based on a novel three-step atomic layer deposition process
Bönhardt, S.; Kühnel, K.; Kia, A.M.; Weinreich, W.
Journal Article
2019High-density energy storage in Si-doped hafnium oxide thin films on area-enhanced substrates
Kühnel, Kati; Czernohorsky, M.; Riedel, Steffen; Mart, Clemens; Weinreich, Wenke
Journal Article
2019Principles and Challenges for Binary Oxide Based Ferroelectric Memory FeFET
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Eng, L.M.; Seidel, K.
Conference Paper
2019Principles and Challenges for Binary Oxide Based Ferroelectric Memory FeFET
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Eng, L.M.; Seidel, K.
Poster
2019Theory and Experiment of Antiferroelectric (AFE) Si-Doped Hafnium Oxide (HSO) Enhanced Floating-Gate Memory
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Zimmermann, K.; Biedermann, K.; Eng, L.M.; Seidel, K.; Müller, J.
Journal Article
2018CMOS compatible pyroelectric applications enabled by doped HfO2 films on deep-trench structures
Mart, Clemens; Weinreich, Wenke; Czernohorsky, Malte; Riedel, Stefan; Zybell, Sabine; Kühnel, Kati
Conference Paper
2018High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty
Ali, T.; Polakowski, P.; Riedel, S.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Seidel, K.; Löhr, D.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Calvo, J.; Zimmermann, K.; Müller, J.
Journal Article
2018Lithium Detection and Tracking for Solid State Battery Test Stacks
Mohammadian Kia, Alireza; Haufe, Nora; Zybell, Sabine; Bönhardt, Sascha; Kühnel, Kati; Speulmanns, Jan K.; Weinreich, Wenke
Poster
2018LPCVD in-situ doped silicon for thermoelectric applications
Calvo, Jesús; Drescher, Maximilian; Kühnel, Kati; Sauer, Bodo; Müller, Michael; Schmidt, Christian; Boui, Fatima; Völklein, Friedemann; Wagner-Reetz, Maik
Journal Article, Conference Paper
2018Reliable high-density energy storage in Si-doped HfO2 thin films on 3D-structures
Kühnel, Kati; Riedel, Stefan; Mart, Clemens; Weinreich, Wenke
Presentation
2018Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET
Ali, T.; Polakowski, P.; Riedel, S.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Seidel, K.; Löhr, D.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Thrun, X.; Hanisch, N.; Steinke, P.; Calvo, J.; Müller, J.
Journal Article
2017Development of CMOS-compatible materials for thermoelectric and sensor applications in semiconductor industry
Wagner-Reetz, M.; Calvo, J.; Nichenametla, C.K.; Kühnel, K.; Göhler, T.; Schulz, S.; Burkov, A.; Uhlig, B.
Presentation
2017High-K metal gate stacks with ultra-thin interfacial layers formed by low temperature microwave-based plasma oxidation
Czernohorsky, M.; Seidel, K.; Kühnel, K.; Niess, J.; Sacher, N.; Kegel, W.; Lerch, W.
Journal Article
2016Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Kühnel, Kati; Riedel, Stefan; Weinreich, Wenke; Thrun, Xaver; Czernohorsky, Malte; Pätzold, Björn; Rudolph, Matthias
Presentation