Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Optimized phase-shifting masks for high-resolution resist patterning by interference lithography
Brose, S.; Danylyuk, S.; Bahrenberg, L.; Lebert, R.; Loosen, P.; Juschkin, L.
Conference Paper
2017Ptychographic imaging with partially coherent plasma EUV sources
Bußmann, J.; Odstrcil, M.; Teramoto, Y.; Juschkin, L.
Journal Article
2016Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation
Brose, S.; Tempeler, J.; Danylyuk, S.; Loosen, P.; Juschkin, L.
Journal Article
2016Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: Process window analysis
Brose, S.; Tempeler, J.; Danylyuk, S.; Loosen, P.; Juschkin, L.
Journal Article
2016Coherent Diffractive Imaging with a Laboratory-Scale, Gas-Discharge Plasma Extreme Ultraviolet Light Source
Bußmann, J.; Odstrcil, M.; Bresenitz, R.; Rudolf, D.; Miao, J.; Brocklesby, W.S.; Juschkin, L.
Conference Paper
2016Compact extreme ultaviolet source for laboratory-based photoemission spectromicroscopy
Wilson, D.; Schmitz, C.; Rudolf, D.; Wiemann, C.; Plucinski, L.; Riess, S.; Schuck, M.; Hardtdegen, H.; Schneider, C.M.; Tautz, F.S.; Juschkin, L.
Book Article
2016Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy
Schmitz, C.; Wilson, D.; Rudolf, D.; Wiemann, C.; Plucinski, L.; Riess, S.; Schuck, M.; Hardtdegen, H.; Schneider, C.M.; Tautz, F.S.; Juschkin, L.
Journal Article
2016Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths
Sertsu, M.G.; Giglia, A.; Brose, S.; Park, D.; Wang, Z.S.; Mayer, J.; Juschkin, L.; Nicolosi, P.
Journal Article
2016Enabling laboratory EUV research with a compact exposure tool
Brose, S.; Danylyuk, S.; Tempeler, J.; Kim, Hyun-su; Loosen, P.; Juschkin, L.
Conference Paper
2016Flächendetektor für EUV- und/oder weiche Röntgenstrahlung
Herbert, Stefan; Juschkin, Larissa; Danylyuk, Serhiy; Müller, Bernhard
Patent
2016Freeform lens collimating spectrum-folded Hadamard transform near-infrared spectrometer
Wang, X.; Liu, H.; Juschkin, L.; Li, Y.; Xu, Y.; Quan, X.; Lu, Z.
Journal Article
2016Laser-assisted vacuum arc extreme ultraviolet source. A comparison of picosecond and nanosecond laser triggering
Beyene, G.A.; Tobin, I.; Juschkin, L.; Hayden, P.; O'Sullivan, G.; Sokell, E.; Zakharov, V.S.; Zakharov, S.V.; O'Reilly, F.
Journal Article
2016Lensless proximity EUV lithography with a Xenon gas discharge plasma radiation
Kim, H.; Danylyuk, S.; Brose, S.; Loosen, P.; Bergmann, K.; Brocklesby, W.S.; Juschkin, L.
Conference Paper
2016Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Kim, H.; Baksh, P.; Odstrcil, M.; Miszczak, M.; Frey, J.G.; Juschkin, L.; Brocklesby, W.S.
Journal Article
2016Ptychographic imaging with a tin plasma based EUV light source
Bußmann, J.; Odstrcil, M.; Bresenitz, R.; Teramoto, Y.; Juschkin, L.
Book Article
2016Restorative self-image of rough-line grids
Kim, H.; Li, W.; Marconi, M.C.; Brocklesby, W.S.; Juschkin, L.
Journal Article
2016Single exposure imaging of talbot carpets and resolution characterization of detectors for micro- and nano-patterns
Kim, H.; Danylyuk, S.; Brocklesby, W.S.; Juschkin, L.
Journal Article
2016Table-top EUV scatterometer MARYS with high-brightness discharge plasma source
Maryasov, O.; Juschkin, L.
Book Article
2015Analysis of buried interfaces in multilayer mirrors using grazing incidence extreme ultraviolet reflectometry near resonance edges
Sertsu, M.G.; Nardello, M.; Giglia, A.; Corso, A.J.; Maurizio, C.; Juschkin, L.; Nicolosi, P.
Journal Article
2015Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope
Bahrenberg, L.; Herbert, S.; Tempeler, J.; Maryasov, A.; Hofmann, O.; Danylyuk, S.; Lebert, R.; Loosen, P.; Juschkin, L.
Conference Paper
2015Employing partially coherent, compact gas-discharge sources for coherent diffractive imaging with extreme ultraviolet light
Bußmann, J.; Odstrčil, M.; Bresenitz, R.; Rudolf, D.; Miao, J.; Brocklesby, W.S.; Grützmacher, D.; Juschkin, L.
Conference Paper
2015Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas
Kunkemöller, G.; Maß, T.W.W.; Michel, A.-K.U.; Kim, H.-S.; Brose, S.; Danylyuk, S.; Taubner, T.; Juschkin, L.
Journal Article
2015Generation of circularly polarized radiation from a compact plasma-based EUV light source for tabletop X-ray magnetic circular dichroism studies
Wilson, D.; Rudolf, D.; Weier, C.; Adam, R.; Winkler, G.; Frömter, R.; Danylyuk, S.; Bergmann, K.; Grützmacher, D.; Schneider, C.M.; Juschkin, L.
Book Article
2015Interferometric broadband Fourier spectroscopy with a partially coherent gas-discharge extreme ultraviolet light source
Rudolf, D.; Bußmann, J.; Odstrcil, M.; Dong, M.; Bergmann, K.; Danylyuk, D.; Juschkin, L.
Journal Article
2015Irradiation of low energy ions damage analysis on multilayers
Sertsu, M.G.; Giglia, A.; Juschkin, L.; Nicolosi, P.
Conference Paper
2015Multi-angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces
Danylyuk, S.; Herbert, S.; Loosen, P.; Lebert, R.; Schäfer, A.; Schubert, J.; Tryus, M.; Juschkin, L.
Conference Paper, Journal Article
2015Nanophotonic applications of fs-laser radiation induced nanostructures and their theoretical description
Reininghaus, M.; Ivanov, D.; Maß, T.W.W.; Eckert, S.; Juschkin, L.; Garcia, M.E.; Taubner, T.; Poprawe, R.
Book Article
2015Optical and structural characterization of CeO2/B4C multilayers near boron K-edge energy
Sertsu, M.G.; Giglia, A.; Brose, S.; Comisso, A.; Wang, Z.S.; Juschkin, L.; Nicolosi, P.
Conference Paper
2015Optical properties of 2D fractional Talbot patterns under coherent EUV illumination
Kim, H.; Li, W.; Danylyuk, S.; Brocklesby, W.S.; Marconi, M.C.; Juschkin, L.
Journal Article
2015A phase retrieval algorithm based on three-dimensionally translated diffraction patterns
Loetgering, L.; Hammoud, R.; Juschkin, L.; Wilhein, T.
Journal Article
2015Ptychographic imaging with a compact gas–discharge plasma extreme ultraviolet light source
Odstrcil, M.; Bussmann, J.; Rudolf, D.; Bresenitz, R.; Miao, J.; Brocklesby, W.S.; Juschkin, L.
Journal Article
2015Table-Top EUV and Soft X-Ray Microscopy
Herbert, S.; Bahrenberg, L.; Maryasov, A.; Danylyuk, S.; Loosen, P.; Juschkin, L.; Bergmann, K.; Lebert, R.
Journal Article
2014Erratum: "Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies"[Rev. Sci. Instrum. 85, 103110 (2014)]
Wilson, D.; Rudolf, D.; Weier, C.; Adam, R.; Winkler, G.; Frömter, R.; Danylyuk, S.; Bergmann, K.; Grützmacher, D.; Schneider, C.M.; Juschkin, L.
Journal Article
2014Fractional Talbot lithography with extreme ultraviolet light
Kim, H.; Li, W.; Danylyuk, S.; Brocklesby, W.S.; Marconi, M.C.; Juschkin, L.
Journal Article
2014Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies
Wilson, D.; Rudolf, D.; Weier, C.; Adam, R.; Winkler, G.; Frömter, R.; Danylyuk, S.; Bergmann, K.; Grützmacher, D.; Schneider, C.M.; Juschkin, L.
Journal Article
2013Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays
Danylyuk, S.; Kim, H.; Brose, S.; Dittberner, C.; Loosen, P.; Taubner, T.; Bergmann, K.; Juschkin, L.
Journal Article
2013Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources
Danylyuk, S.; Loosen, P.; Bergmann, K.; Kim, H.; Juschkin, L.
Journal Article
2013Tabletop coherent diffraction imaging with a discharge plasma EUV source
Juschkin, L.; Lötgering, L.; Rudolf, D.; Xu, R.; Brose, S.; Danylyuk, S.; Miao, J.
Conference Paper
2012Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography
Brose, S.; Danylyuk, S.; Juschkin, L.; Dittberner, C.; Bergmann, K.; Moers, J.; Panaitov, G.; Trellenkamp, S.; Loosen, P.; Grützmacher, D.
Journal Article
2012Cross characterization of ultrathin interlayers in HfO2 high-k stacks by angle resolved x-ray photoelectron spectroscopy, medium energy ion scattering, and grazing incidence extreme ultraviolet reflectometry
Banyay, M.; Juschkin, L.; Bersch, E.; Franca, D.; Liehr, M.; Diebold, A.
Journal Article
2012Gateable micro channel plate detector for extreme ultraviolet radiation with high temporal resolution
Freiberger, R.; Hauck, J.; Lvovsky, D.; Adam, R.; Danylyuk, S.; Juschkin, L.
Book Article
2012Quantum efficiency determination of a novel CMOS design for fast imaging applications in the extreme ultraviolet
Herbert, Stefan; Banyay, Matus; Maryasov, Alexey; Hochschulz, Frank; Paschen, Uwe; Vogt, Holger; Juschkin, Larissa
Journal Article
2011Actinic EUV-mask metrology: Tools, concepts, components
Lebert, R.; Farahzadi, A.; Diete, W.; Schäfer, D.; Phiesel, C.; Wilhein, T.; Herbert, S.; Maryasov, A.; Juschkin, L.; Esser, D.; Hoefer, M.; Hoffmann, D.
Conference Paper
2011EUV actinic mask blank defect inspection: Results and status of concept realization
Maryasov, A.; Herbert, S.; Juschkin, L.; Lebert, R.; Bergmann, K.
Conference Paper
2011EUV dark-field microscopy for defect inspection
Juschkin, L.; Maryasov, A.; Herbert, S.; Aretz, A.; Bergmann, K.; Lebert, R.
Conference Paper
2011Performance benchmark of a gateable microchannel plate detector for extreme ultraviolet radiation with high temporal resolution
Hauck, J.; Freiberger, R.; Juschkin, L.
Conference Paper
2011Time resolved EUV pump-probe microscopy of fs-LASER induced nanostructure formation
Freiberger, R.; Hauck, J.; Reininghaus, M.; Wortmann, D.; Juschkin, L.
Conference Paper
2010Contributions to EUV mask metrology infrastructure
Farahzadi, A.; Lebert, R.; Benk, M.; Juschkin, L.; Herbert, S.; Maryasov, A.
Conference Paper
2010Defect inspection with an EUV microscope
Herbert, S.; Maryasov, A.; Juschkin, L.; Lebert, R.; Bergmann, K.
Conference Paper
2010EUV-pump-probe microscopy of FS-laser induced nano-structure formation
Wortmann, D.; Reininghaus, M.; Juschkin, L.; Freiberger, R.
Conference Paper
2010Spectral sharpening algorithm for a polychromatic reflectometer in the extreme ultraviolet
Banyay, M.; Juschkin, L.
Journal Article
2009Characterization of ultra-thin layers in MOS-devices with XUV reflectometry
Banyay, M.; Juschkin, L.; Loosen, P.; Roeckerath, M.; Schubert, J.
Book Article
2009EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
Juschkin, L.; Freiberger, R.; Bergmann, K.
Journal Article, Conference Paper
2009Line image sensors for spectroscopic applications in the extreme ultraviolet
Banyay, M.; Brose, S.; Juschkin, L.
Journal Article
2009Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm
Bergmann, K.; Danylyuk, S.V.; Juschkin, L.
Journal Article
2009Table-top reflectometer in the extreme ultraviolet for surface sensitive analysis
Banyay, M.; Juschkin, L.
Journal Article
2009Two magnification steps EUV microscopy with a Schwarzschild objective and an adapted zone plate lens
Juschkin, L.; Freiberger, R.
Conference Paper
2009XUV interference lithography for sub-10 nm patterning
Danylyuk, S.; Juschkin, L.; Brose, S.; Bergmann, K.; Loosen, P.
Book Article
2009XUV metrology: Surface analysis with extreme ultraviolet radiation
Banyay, M.; Juschkin, L.; Bücker, T.; Loosen, P.
Conference Paper
2008EUV light sources
Juschkin, L.; Derra, G.; Bergmann, K.
Book Article
2008Extreme ultraviolet lithography
Bergmann, K.; Juschkin, L.; Poprawe, R.
Book Article
2008Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources
Banyay, M.; Juschkin, L.
Conference Paper
2007Mit weicher Röntgenstrahlung hochgenau messen
Schmitt, R.; Damm, B.E.; Juschkin, L.
Conference Paper
2007Vorrichtung und Verfahren fuer die XUV-Mikroskopie
Juschkin, L.; Bergmann, K.; Neff, W.
Patent
2004Compact laboratory EUV-lamps: "In-house beamlines" for technologies based on extreme ultraviolet radiation
Lebert, R.; Jägle, B.; Juschkin, L.; Wies, C.; Neff, W.; Barthel, J.; Walter, K.; Bergmann, K.; Schürmann, M.C.; Mißalla, T.
Book Article
2004Extreme ultraviolet radiation from pulsed discharges: A new access to "nanoscopy" and "nanolytics"
Lebert, R.; Wies, C.; Juschkin, L.; Jägle, B.; Neff, W.; Barthel, J.; Walter, K.; Bergmann, K.
Book Article
2004Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography
Krücken, T.; Bergmann, K.; Juschkin, L.; Lebert, R.
Journal Article
2004High-throughput EUV reflectometer for EUV mask blanks
Lebert, R.; Wies, C.; Juschkin, L.; Jägle, B.; Meisen, M.; Aschke, L.; Sobel, F.; Seitz, H.; Scholze, F.; Ulm, G.; Walter, K.; Neff, W.; Bergmann, K.; Biel, W.
Conference Paper
2004Status of EUV-lamp development and demonstration of applications
Lebert, R.; Wies, C.; Jägle, B.; Juschkin, L.; Bieberle, U.; Meisen, M.; Neff, W.; Bergmann, K.; Walter, K.; Rosier, O.; Schuermann, M.C.; Missalla, T.
Conference Paper
2001Comparison of different source concepts for EUVL
Lebert, R.; Bergmann, K.; Juschkin, L.; Rosier, O.; Neff, W.
Conference Paper
2001Pinch plasma radiation sources for the extreme ultraviolet
Neff, W.; Bergmann, K.; Rosier, O.; Lebert, R.; Juschkin, L.
Journal Article