Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Reducing EUV mask 3D effects by alternative metal absorbers
Philipsen, V.; Luong, K.V.; Souriau, L.; Hendrickx, E.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.
Conference Paper
2017Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers
Philipsen, V.; Luong, K.V.; Souriau, L.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.; Hendrickx, E.
Journal Article
2014Structure placement accuracy of wafer level stamps for substrate conformal imprint lithography
Fader, Robert; Förthner, Michael; Rumler, Maximilian; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar; Verschuuren, Marc; Butschke, Jörg; Irmscher, Mathias; Storace, Eleonora; Ji, Ran; Schömbs, Ulrike
Poster
2011Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning
Eder Kapl, S.; Loeschner, H.; Piller, W.; Witt, M.; Pilz, W.; Letzkus, F.; Jurisch, M.; Irmscher, M.; Platzgummer, E.
Journal Article
2009Charged particle multi-beam lithography evaluations for sub-16nm hp mask node fabrication and wafer direct write
Platzgummer, E.; Klein, C.; Joechl, P.; Loeschner, H.; Witt, M.; Pilz, W.; Butschke, J.; Jurisch, M.; Letzkus, F.; Sailer, H.; Irmscher, M.
Conference Paper
2009PML2: The maskless multibeam solution for the 22nm node and beyond
Klein, C.; Platzgummer, E.; Klikovits, J.; Piller, W.; Loeschner, H.; Bejdak, T.; Dolezel, P.; Kolarik, V.; Klingler, W.; Letzkus, F.; Butschke, J.; Irmscher, M.; Witt, M.; Pilz, W.; Jaschinsky, P.; Thrum, F.; Hohle, C.; Kretz, J.; Nogatch, J.T.; Zepka, A.
Conference Paper
2008Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method
Keil, Katja; Choi, Kang-Hoon; Hohle, Christoph; Kretz, Johannes; Lutz, Tarek; Bettin, Lutz; Boettcher, Monika; Hahmann, Peter; Kliem, Karl-Heinz; Schnabel, Bernd; Irmscher, Mathias; Sailer, Holger
Conference Paper, Journal Article
2008MAGIC: A european program to push the insertion of maskless lithography
Pain, L.; Icard, B.; Tedesco, S.; Kampherbeck, B.; Gross, G.; Klein, C.; Loeschner, H.; Platzgummer, E.; Morgan, R.; Manakli, S.; Kretz, J.; Holhe, C.; Choi, K.-H.; Thrum, F.; Kassel, E.; Pilz, W.; Keil, K.; Butschke, J.; Irmscher, M.; Letzkus, F.; Hudek, P.; Paraskevopoulos, A.; Ramm, P.; Weber, J.
Conference Paper
2008Projection maskless lithography (PML2)
Klein, C.; Platzgummer, E.; Loeschner, H.; Gross, G.; Dolezel, P.; Tmej, M.; Kolarik, V.; Klingler, W.; Letzkus, F.; Butschke, J.; Irmscher, M.; Witt, M.; Pilz, W.
Conference Paper
2007Resist processes for high resolution mask and direct write applications using the latest vistec VSB electron column
Sailer, H.; Irmscher, M.; Hohle, C.; Keil, K.; Boettcher, M.; Hahmann, P.
Conference Paper
2001Reference plate manufacturing process for the ion projection lithography pattern lock system
Letzkus, F.; Butschke, J.; Irmscher, M.; Reuter, C.; Springer, R.; Eder, S.; Loschner, H.; Eberhardt, R.; Mohaupt, M.; Ehrmann, A.; Mathuni, J.; Panzer, B.; Struck, T.
Journal Article