Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Atomic Layer Deposition (ALD) and characterization of Ti- and Co-based films for Lithium-Ion Batteries (LIB)
Hoßbach, C.; Neumann, V.; Reddy, K.D.S.; Bönhardt, S.; Stoeck, A.; Fischer, D.; Reif, J.; Shukla, S.; Zybell, S.; Albert, M.; Giebeler, L.; Bartha, J.W.
Poster
2017PEALD and pulsed CVD of Cobalt thin films using the precursor cyclopentadienylcobalt dicarbonyl
Hossbach, Christoph; Shukla, Shashank; Fischer, Dustin; Reif, Johanna; Bönhardt, Sascha; Geidel, Marion; Albert, Matthias; Bartha, Johann W.
Poster
2016Atomic layer deposition system for fast precursor screening
Shukla, Shashank; Hossbach, Christoph; Sundqvist, Jonas; Bönhardt, Sascha; Feddersen-Clausen, Oliver; Sharma, Varun; Albert, Matthias; Bartha, Johann W.
Poster
2013Enhanced growth and Cu diffusion barrier properties of thermal ALD TaNC films in Cu/low-k interconnects
Wojcik, H.; Hossbach, C.; Kubasch, C.; Verdonck, P.; Barbarin, Y.; Merkel, U.; Bartha, J.W.; Hübner, R.; Engelmann, H.-J.; Friedemann, M.
Journal Article
2012Physical characterization of PECVD and PEALD Ru(-C) films and comparison with PVD ruthenium film properties
Wojcik, H.; Junige, M.; Bartha, W.; Albert, M.; Neumann, V.; Merkel, U.; Peeva, A.; Gluch, J.; Menzel, S.; Munnik, F.; Liske, R.; Utess, D.; Richter, I.; Klein, C.; Engelmann, H.J.; Ho, P.; Hossbach, C.; Wenzel, C.
Journal Article
2009Properties of plasma-enhanced atomic layer deposition-grown tantalum carbonitride thin films
Hossbach, C.; Teichert, S.; Thomas, J.; Wilde, L.; Wojcik, H.; Schmidt, D.; Adolphi, B.; Bertram, M.; Mühle, U.; Albert, M.; Menzel, S.; Hintze, B.; Bartha, J.W.
Journal Article