Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018MEMS integration on foundry-fabricated CMOS backplanes
Hohle, Christoph; Schulze, Matthias
Book Article
2018Novel 512 × 320 Tip-Tilt Micro Mirror Array in a CMOS-Integrated, Scalable Process Technology
Gehner, A.; Dürr, P.; Kunze, D.; Rudloff, D.; Elgner, A.; Heber, J.; Francés, S.; Skupsch, C.; Torlee, H.; Eckert, M.; Friedrichs, M.; Schmidt, J.; Pufe, W.; Döring, S.; Hohle, C.; Schulze, M.; Wagner, M.
Conference Paper
2017How to integrate MEMS on foundry-fabricated CMOS backplanes
Schulze, Matthias; Hohle, Christoph; Friedrichs, Martin
Conference Paper
2017Sicherheitsmerkmal, Verfahren zum Herstellen eines Sicherheitsmerkmals und Verfahren zum Authentifizieren eines Benutzers unter Verwendung eines Sicherheitsmerkmals
Reinig, Peter; Knobbe, Jens; Hohle, Christoph
Patent
2016Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools
Rudolph, Matthias; Esche, Silvio; Hohle, Christoph; Schumann, Dirk; Steinke, Philipp; Thrun, Xaver; Sonntag, Justus von
Conference Paper
2016Patterning and Imaging with Electrons: Assessing Multi-Beam SEM for e-Beam Structured CMOS Samples
Garbowski, Tomasz; Panteleit, Friedhelm; Dellemann, Gregor; Gutsch, Manuela; Hohle, Christoph; Reich, Elke; Rudolph, Matthias; Steidel, Katja; Thrun, Xaver; Zeidler, Dirk
Conference Paper
2016Reaktives Ionenätzen zur Mehrfachstrukturierung und Elektrodentrennung für Kondensatoranwendungen in der Halbleiterindustrie
Pätzold, Björn
: Hohle, Christoph; Rudolph, Matthias; Rennekamp, Reinhold
Master Thesis
2015Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write
Thrun, Xaver; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Rudolph, Matthias; Seidel, Konrad
Poster
2015Sensitivity analysis for high accuracy proximity effect correction
Thrun, Xaver; Browning, Clyde; Choi, Kang-Hoon; Figueiro, Thiago; Hohle, Christoph; Saib, Mohamed; Schiavone, Patrick; Bartha, Johann W.
Conference Paper
2015Verification of E-Beam direct write integration into 28nm BEOL SRAM technology
Hohle, Christoph; Choi, Kang-Hoon; Gutsch, Manuela; Hanisch, Norbert; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas
Conference Paper
2014Designoptimierung und Charakterisierung eines mittels Elektronenstrahldirektschreibens hergestellten Siliziumstempels zur Fertigung von plasmonisch aktiven Nanostrukturen
Kaiser, Michael
: Hohle, Christoph (Betreuer); Fischer, Wolf-Joachim (Betreuer)
Thesis
2014Effective corner rounding correction in the data preparation of electron beam lithography
Choi, Kang-Hoon; Browning, Clyde; Figueiro, Thiago; Hohle, Christoph; Kaiser, Michael; Schiavone, Patrick
Conference Paper
2014Innovative and water based stripping approach for thick and bulk photoresists
Rudolph, M.; Schumann, D.; Thrun, X.; Esche, S.; Hohle, C.
Conference Paper
2014Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match
Gutsch, Manuela; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Thrun, Xaver; Seidel, Robert; Werner, Thomas
Conference Paper
2014Introduction of an innovative water based photoresist stripping process using intelligent fluids
Rudolph, Matthias; Felten, Peter; Thrun, Xaver; Schumann, Dirk; Esche, Silvio; Hohle, Christoph
Conference Paper
2014Metasurfaces for colour printing
Zapata-Rodríguez, C.J.; Miret, J.J.; Rodríguez-Cantó, P.; Muñoz-Matutano, G.; Martínez-Pastor, J.P.; Abargues, R.; Pastor, D.; Kaiser, M.; Hohle, C.
Conference Paper
201315 days electron beam exposure for manufacturing of large area silicon based NIL master
Thrun, X.; Choi, K.-H.; Freitag, M.; Gutsch, M.; Hohle, C.; Paul, J.; Rudolph, M.; Steidel, K.
Journal Article
2013Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography
Thrun, Xaver; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Guerrero, Douglas; Figueiro, Thiago; Bartha, Johann W.
Conference Paper
2013Evaluation of an advanced dual hard mask stack for high resolution pattern transfer
Paul, Jan; Rudolph, M.; Riedel, S.; Thrun, X.; Wege, S.; Hohle, C.
Conference Paper
2013Extreme long range process effects characterization and compensation
Figueiro, T.; Browning, C.; Thornton, M.J.; Vannuffel, C.; Hoon Choi, K.; Hohle, C.; Tortai, J.-H.; Schiavone, P.
Conference Paper
2013High resolution patterning for sub 30 nm technology nodes using a ceramic based dual hard mask
Paul, J.; Rudolph, M.; Riedel, S.; Thrun, X.; Beyer, V.; Wege, S.; Hohle, C.
Conference Paper
2013Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performance
Steidel, Katja; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Seidel, Robert; Thrun, Xaver; Werner, Thomas
Conference Paper
2013Metrology variability and its impact in process modeling
Figueiro, T.; Saib, M.; Choi, K.-H.; Hohle, C.; Thornton, M.J.; Vannufel, C.; Tortai, J.-H.; Schiavone, P.
Conference Paper
2013Scaling and optimization of high-density integrated Si-capacitors
Weinreich, W.; Seidel, K.; Rudolph, M.; Koch, J.; Paul, J.; Riedel, S.; Sundqvist, J.; Steidel, K.; Gutsch, M.; Beyer, V.; Hohle, C.
Conference Paper
2012Demonstration of 22nm SRAM features with patternable hafnium oxide based resist material using electron-beam lithography
Thrun, Xaver; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Grenville, Andrew; Stowers, Jason K.; Bartha, Johann W.
Conference Paper
2012Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography
Thrun, X.; Choi, K.H.; Freitag, M.; Grenville, A.; Gutsch, M.; Hohle, C.; Stowers, J.K.; Bartha, J.W.
Conference Paper, Journal Article
2012Feasibility study of optical/e-beam complementary lithography
Hohle, Christoph; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Rudolph, Matthias; Thrun, Xaver; Jaschinsky, Philipp; Kahlenberg, Frank; Klein, Christof; Klikovits, Jan
Conference Paper
2012Introduction of zirconium oxide in a hardmask concept for highly selective patterning of scaled high aspect ratio trenches in silicon
Paul, Jan; Riedel, Stefan; Rudolph, Matthias; Wege, Stephan; Czernohorsky, Malte; Sundqvist, Jonas; Hohle, Christoph; Beyer, Volkhard
Journal Article, Conference Paper
2011Efficient large volume data preparation for electron beam lithography for sub-45nm node
Choi, Kang-Hoon; Gutsch, Manuela; Freitag, Martin; Hohle, Christoph
Conference Paper
2011Fast characterization of line end shortening and application of novel correction algorithms in e-beam direct write
Freitag, M.; Choi, K.-H.; Gutsch, M.; Hohle, C.; Galler, R.; Krueger, M.; Weidenmueller, U.
Conference Paper
2011Fast characterization of line end shortening and application of novel correction algorithms in e-beam direct write
Freitag, Martin; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Galler, Reinhard; Krüger, Michael; Weidenmüller, Ulf
Journal Article
2011Geometrically induced dose correction: Method and performance results
Galler, R.; Choi, K.-H.; Gutsch, M.; Hohle, C.; Krueger, M.; Ramos, L.E.; Suelzle, M.; Weidenmueller, U.
Conference Paper
2011Line end shortening and application of novel correction algorithms in E-beam direct write
Freitag, M.; Choi, K.-H.; Gutsch, M.; Hohle, C.
Conference Paper
2011Variable-shaped e-beam lithography enabling process development for future copper damascene technology
Jaschinsky, P.; Erben, J.-W.; Choi, K.-H.; Schulze, K.; Gutsch, M.; Freitag, M.; Schulz, S.E.; Steidel, K.; Hohle, C.; Gessner, T.; Kücher, P.
Journal Article, Conference Paper
2010Checkerboard pattern for PSF parameter determination in electron beam lithography
Gutsch, M.; Choi, K.-H.; Freitag, M.; Hauptmann, M.; Hohle, C.; Jaschinsky, P.; Keil, K.
Conference Paper
2010Conventional and reversed image printing in electron beam direct write lithography with proximity effect corrections based on dose and shape modification
Choi, K.-H.; Gutsch, M.; Freitag, M.; Keil, K.; Jaschinsky, P.; Hohle, C.
Conference Paper
2010Geometrically induced dose correction method for e-beam lithography applications
Galler, R.; Choi, K.-H.; Gutsch, M.; Hohle, C.; Krueger, M.; Ramos, L.E.; Suelzle, M.; Weidenmueller, U.
Conference Paper
2009Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write
Keil, K.; Jaschinsky, P.; Hohle, C.; Choi, K.-H.; Schneider, R.; Tesauro, M.; Thrum, F.; Zimmermann, R.; Kretz, J.
Conference Paper
2009Detailed characterization of hydrogen silsesquioxane for e-beam applications in a dynamic random access memory pilot line environment
Keil, K.; Choi, K.-H.; Hohle, C.; Kretz, J.; Szikszai, L.; Bartha, J.-W.
Journal Article
2009Determination of proximity effect parameters by means of CD-linearity in sub 100 nm electron beam lithography
Hauptmann, M.; Choi, K.-H.; Jaschinsky, P.; Hohle, C.; Kretz, J.; Eng, L.M.
Conference Paper, Journal Article
2009Fabrication of metrology test structures for future technology nodes using high resolution variable-shaped E-Beam direct write
Szikszai, L.; Jaschinsky, P.; Keil, K.; Hauptmann, M.; Mört, M.; Seifert, U.; Hohle, C.; Choi, K.-H.; Thrum, F.; Kretz, J.; Paz, V.F.; Boef, A.D.
Conference Paper
2009PML2: The maskless multibeam solution for the 22nm node and beyond
Klein, C.; Platzgummer, E.; Klikovits, J.; Piller, W.; Loeschner, H.; Bejdak, T.; Dolezel, P.; Kolarik, V.; Klingler, W.; Letzkus, F.; Butschke, J.; Irmscher, M.; Witt, M.; Pilz, W.; Jaschinsky, P.; Thrum, F.; Hohle, C.; Kretz, J.; Nogatch, J.T.; Zepka, A.
Conference Paper
2008Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method
Keil, Katja; Choi, Kang-Hoon; Hohle, Christoph; Kretz, Johannes; Lutz, Tarek; Bettin, Lutz; Boettcher, Monika; Hahmann, Peter; Kliem, Karl-Heinz; Schnabel, Bernd; Irmscher, Mathias; Sailer, Holger
Conference Paper, Journal Article
2008Printing of sub resolution shots in electron beam direct write with variable shaped beam machines
Thrum, F.; Kretz, J.; Hohle, C.; Choi, K.-H.; Keil, K.
Conference Paper
2007Defect inspection of positive and negative sub-60nm resist pattern printed with variable shaped E-Beam direct write lithography
Arndt, C.; Hohle, C.; Kretz, J.; Lutz, T.; Richter, M.; Keil, K.; Lapidot, M.; Zemach, D.; Kindler, M.
Conference Paper
2007Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications
Hohle, C.; Arndt, C.; Choi, K.-H.; Kretz, J.; Lutz, T.; Thrum, F.; Keil, K.
Journal Article
2007Resist processes for high resolution mask and direct write applications using the latest vistec VSB electron column
Sailer, H.; Irmscher, M.; Hohle, C.; Keil, K.; Boettcher, M.; Hahmann, P.
Conference Paper