Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2016Benefit of Modern Arc Management in MF Dual Magnetron Sputtering Power Supplies: Stable deposition process for a wide range of materials
Heintze, M.; Kroyer, T.
Journal Article
2015Square wave or sine wave
Heintze, M.; Ulrich, S.
Conference Paper
2014Energiesparende funktionelle Beschichtungen von Fluorpolymermembranen
Seifert, W.; Georg, A.; Heintze, M.; Antochin, S.
Conference Paper
2008Plasma enhanced CVD and plasma chemical etching at atmospheric pressure for continuous processing of crystallien silicon solar wafers
Lopez, E.; Dresler, B.; Mäder, G.; Dani, I.; Hopfe, V.; Kaskel, S.; Heintze, M.; Möller, R.; Wanka, H.; Kirschmann, M.; Frenck, J.; Poruba, A.; Barinka, R.; Dahl, R.; Nussbaumer, H.
Conference Paper
2008Silicon nitride films deposited by atmospheric pressure microwave PECVD
Dresler, B.; Roch, J.; Leupolt, B.; Dani, I.; Hopfe, V.; Heintze, M.; Möller, R.
Conference Paper
2007In-line plasma etching at atmospheric pressue for edge isolation in crystalline Si solar cells
Heintze, M.; Hauser, A.; Möller, R.; Wanka, H.; Lopez, E.; Dani, I.; Hopfe, V.; Müller, J.W.; Huwe, A.
Conference Paper
2007New developments in plasma enhanced chemical etching at atmospheric pressure for crystalline silicon wafer processing
Lopez, E.; Beese, H.; Mäder, G.; Dani, I.; Hopfe, V.; Heintze, M.; Moeller, R.; Wanka, H.; Kirschmann, M.; Frenck, J.A. et al.
Conference Paper
2007Verfahren zur Entfernung einer dotierten Oberflaechenschicht an Rueckseiten von kristallinen Silizium-Solarwafern
Hopfe, V.; Dani, I.; Rosina, M.; Heintze, M.; Moeller, R.; Wanka, H.; Lopez, E.
Patent
2006Atmospheric pressure PECVD and atmospheric plasma chemical etching for continuous processing of crystalline silicon solar wafers
Hopfe, V.; Dani, I.; Lopez, E.; Rosina, M.; Mäder, G.; Möller, R.; Wanka, H.; Heintze, M.
Conference Paper
2006Plasma enhanced chemical etching at atmospheric pressure for silicon wafer processing
Lopez, E.; Dani, I.; Hopfe, V.; Wanka, H.; Heintze, M.; Möller, R.; Hauser, A.
Conference Paper
2006Plasma etching at atmospheric pressure for rear emitter removal in crystalline Si solar cells
Lopez, E.; Dani, I.; Hopfe, V.; Heintze, M.; Hauser, A.; Möller, R.; Wanka, H.
Conference Paper
2005Progress in the use of sprayed phosphoric acid as an inexpensive dopant source for industrial solar cells
Voyer, C.; Biro, D.; Wagner, K.; Benick, J.; Preu, R.; Koriath, J.; Heintze, M.; Wanka, H.N.
Conference Paper