Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Miniature integrated micro-spectrometer array for snap shot multispectral sensing
Danz, N.; Höfer, B.; Förster, E.; Flügel-Paul, T.; Harzendorf, T.; Dannberg, P.; Leitel, R.; Kleinle, S.; Brunner, R.
Journal Article
2018Optische Anordnung zur spektralen Zerlegung von Licht
Flügel-Paul, Thomas; Harzendorf, Torsten; Michaelis, Dirk; Zeitner, Uwe Detlef
Patent
2018Surface relief gratings manufactured by lithographic means being a candidate for VLT MOONS instrument’s main dispersers
Harzendorf, T.; Michaelis, D.; Flügel-Paul, T.; Bianco, A.; Oliva, E.; Zeitner, U.
Conference Paper
2016Enhanced light coupling of white organic LED using sub-anode high index grids
Michaelis, D.; Wächter, C.A.; Wehlus, T.; Rausch, A.; Fuchs, F.; Stürzebecher, L.; Harzendorf, T.; Danz, N.; Bräuer, A.
Conference Paper
2016New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
Flügel-Paul, T.; Kalkowski, G.; Benkenstein, T.; Harzendorf, T.; Matthes, A.; Zeitner, U.D.
Conference Paper
2015Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
Paul, Thomas; Matthes, Andre; Harzendorf, Torsten; Ratzsch, Stephan; Zeitner, Uwe D.
Journal Article
2014Application of rigorously optimized phase masks for the fabrication of binary and blazed gratings with diffractive proximity lithography
Stuerzebecher, L.; Fuchs, F.; Harzendorf, T.; Meyer, S.; Zeitner, U.D.
Conference Paper
2014Efficient fabrication of complex nano-optical structures by E-beam lithography based on charakter projection
Zeitner, Uwe Detlef; Harzendorf, Torsten; Fuchs, Frank; Banasch, Michael; Schmidt, Holger; Kley, Ernst-Bernhard
Conference Paper
2014Fast character projection electron beam lithography for diffractive optical elements
Harzendorf, Torsten; Fuchs, Frank; Banasch, Michael; Zeitner, Uwe Detlef
Conference Paper
2014Pulse compression grating fabrication by diffractive proximity photolithography
Stürzebecher, Lorenz; Fuchs, Frank; Harzendorf, Torsten; Zeitner, Uwe Detlef
Journal Article
2013Ultra-high aspect ratio replaceable AFM tips using deformation-suppressed focused ion beam milling
Savenko, Alexey Yu; Yildiz, Izzet; Petersen, Dirch Hjorth; Bøggild, Peter; Bartenwerfer, Malte; Krohs, Florian; Oliva, Maria; Harzendorf, Torsten
Journal Article
2012High performance diffraction gratings made by e-beam lithography
Zeitner, Uwe D.; Oliva, Maria; Fuchs, Frank; Michaelis, Dirk; Benkenstein, Tino; Harzendorf, Torsten; Kley, Ernst-Bernhard
Journal Article
2012Novel gap alignment sensor for high-resolution proximity lithography
Harzendorf, Torsten; Stürzebecher, Lorenz; Zeitner, Uwe Detlef
Conference Paper
2012Sub-micrometer pattern generation by diffractive mask-aligner lithography
Zeitner, Uwe D.; Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Michaelis, Dirk
Conference Paper
2012Verfahren und Sensoreinheit zur Abstandsmessung in einer lithografischen Vorrichtung und lithographische Vorrichtung
Harzendorf, Torsten; Stürzebecher, Lorenz; Zeitner, U.; Vogler, U.; Völkel, R.
Patent
2012Verfahren und Vorrichtung zur Abstandsmessung mit einer diffraktiven Struktur
Harzendorf, Torsten; Stürzebecher, Lorenz; Zeitner, U.; Vogler, U.; Völkel, R.
Patent
2012Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography
Stürzebecher, Lorenz; Harzendorf, T.; Fuchs, F.; Zeitner, U.D.
Conference Paper
2012Waveguide grating radial polarizer for the photolithography of circularly symmetrical optical elements
Jourlin, Yves; Tonchev, Svetlen; Parriaux, Olivier; Sauvage-Vincent, Jean; Harzendorf, Torsten; Zeitner, Uwe D.
Journal Article
2011Effects of metallic nanoparticle arrays in Si solar cell structures
Benkenstein, T.; Flämmich, M.; Harzendorf, T.; Käsebier, T.; Michaelis, D.; Oliva, M.; Wächter, C.; Zeitner, U.D.
Conference Paper
2011Multilevel blazed gratings in resonance domain: An alternative to the classical fabrication approach
Oliva, M.; Harzendorf, T.; Michaelis, D.; Zeitner, U.D.; Tünnermann, A.
Journal Article
2011Nano-optical gratings for integrated laser interferometer arrays
Michaelis, D.; Oliva, M.; Benkenstein, T.; Harzendorf, T.; Matthes, A.; Zeitner, U.
Conference Paper
2010Advanced mask aligner lithography: Fabrication of periodic patterns using pinhole array mask and Talbot effect
Stürzebecher, L.; Harzendorf, T.; Vogler, U.; Zeitner, U.D.; Völkel, R.
Journal Article
2010Advanced mask aligner lithography: New illumination system
Voelkel, R.; Vogler, U.; Bich, A.; Pernet, P.; Weible, K.J.; Hornung, M.; Zoberbier, R.; Cullmann, E.; Stuerzebecher, L.; Harzendorf, T.; Zeitner, U.D.
Journal Article
2010Half-tone proximity lithography
Harzendorf, T.; Stürzebecher, L.; Vogler, U.; Zeitner, U.; Völkel, R.
Conference Paper
2010Highly efficient three-level blazed grating in the resonance domain
Oliva, M.; Michaelis, D.; Benkenstein, T.; Dunkel, J.; Harzendorf, T.; Matthes, A.; Zeitner, U.D.
Journal Article
2010Smart technology for blazed multilevel gratings in resonance domain
Oliva, M.; Benkenstein, T.; Dunkel, J.; Harzendorf, T.; Matthes, A.; Michaelis, D.; Zeitner, U.D.
Conference Paper