Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2016Patterning and Imaging with Electrons: Assessing Multi-Beam SEM for e-Beam Structured CMOS Samples
Garbowski, Tomasz; Panteleit, Friedhelm; Dellemann, Gregor; Gutsch, Manuela; Hohle, Christoph; Reich, Elke; Rudolph, Matthias; Steidel, Katja; Thrun, Xaver; Zeidler, Dirk
Conference Paper
2015Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write
Thrun, Xaver; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Rudolph, Matthias; Seidel, Konrad
Poster
2015Verification of E-Beam direct write integration into 28nm BEOL SRAM technology
Hohle, Christoph; Choi, Kang-Hoon; Gutsch, Manuela; Hanisch, Norbert; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas
Conference Paper
2014Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match
Gutsch, Manuela; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Thrun, Xaver; Seidel, Robert; Werner, Thomas
Conference Paper
201315 days electron beam exposure for manufacturing of large area silicon based NIL master
Thrun, X.; Choi, K.-H.; Freitag, M.; Gutsch, M.; Hohle, C.; Paul, J.; Rudolph, M.; Steidel, K.
Journal Article
2013Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performance
Steidel, Katja; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Seidel, Robert; Thrun, Xaver; Werner, Thomas
Conference Paper
2013Scaling and optimization of high-density integrated Si-capacitors
Weinreich, W.; Seidel, K.; Rudolph, M.; Koch, J.; Paul, J.; Riedel, S.; Sundqvist, J.; Steidel, K.; Gutsch, M.; Beyer, V.; Hohle, C.
Conference Paper
2012Demonstration of 22nm SRAM features with patternable hafnium oxide based resist material using electron-beam lithography
Thrun, Xaver; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Grenville, Andrew; Stowers, Jason K.; Bartha, Johann W.
Conference Paper
2012Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography
Thrun, X.; Choi, K.H.; Freitag, M.; Grenville, A.; Gutsch, M.; Hohle, C.; Stowers, J.K.; Bartha, J.W.
Conference Paper, Journal Article
2012Feasibility study of optical/e-beam complementary lithography
Hohle, Christoph; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Rudolph, Matthias; Thrun, Xaver; Jaschinsky, Philipp; Kahlenberg, Frank; Klein, Christof; Klikovits, Jan
Conference Paper
2011Data preparation solution for e-beam multiple pass exposure: Reaching sub-22nm nodes with a tool dedicated to 45nm
Martin, L.; Manakli, S.; Bayle, S.; Choi, K.-H.; Gutsch, M.; Pradelles, J.; Bustos, J.
Conference Paper
2011Efficient large volume data preparation for electron beam lithography for sub-45nm node
Choi, Kang-Hoon; Gutsch, Manuela; Freitag, Martin; Hohle, Christoph
Conference Paper
2011Fast characterization of line end shortening and application of novel correction algorithms in e-beam direct write
Freitag, M.; Choi, K.-H.; Gutsch, M.; Hohle, C.; Galler, R.; Krueger, M.; Weidenmueller, U.
Conference Paper
2011Fast characterization of line end shortening and application of novel correction algorithms in e-beam direct write
Freitag, Martin; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Galler, Reinhard; Krüger, Michael; Weidenmüller, Ulf
Journal Article
2011Geometrically induced dose correction: Method and performance results
Galler, R.; Choi, K.-H.; Gutsch, M.; Hohle, C.; Krueger, M.; Ramos, L.E.; Suelzle, M.; Weidenmueller, U.
Conference Paper
2011Line end shortening and application of novel correction algorithms in E-beam direct write
Freitag, M.; Choi, K.-H.; Gutsch, M.; Hohle, C.
Conference Paper
2011Variable-shaped e-beam lithography enabling process development for future copper damascene technology
Jaschinsky, P.; Erben, J.-W.; Choi, K.-H.; Schulze, K.; Gutsch, M.; Freitag, M.; Schulz, S.E.; Steidel, K.; Hohle, C.; Gessner, T.; Kücher, P.
Journal Article, Conference Paper
2010Checkerboard pattern for PSF parameter determination in electron beam lithography
Gutsch, M.; Choi, K.-H.; Freitag, M.; Hauptmann, M.; Hohle, C.; Jaschinsky, P.; Keil, K.
Conference Paper
2010Conventional and reversed image printing in electron beam direct write lithography with proximity effect corrections based on dose and shape modification
Choi, K.-H.; Gutsch, M.; Freitag, M.; Keil, K.; Jaschinsky, P.; Hohle, C.
Conference Paper
2010Geometrically induced dose correction method for e-beam lithography applications
Galler, R.; Choi, K.-H.; Gutsch, M.; Hohle, C.; Krueger, M.; Ramos, L.E.; Suelzle, M.; Weidenmueller, U.
Conference Paper
2010Practical resist model calibration for e-beam direct write processes
Schulz, M.; Stock, H.-J.; Klostermann, U.; Hoppe, W.; Bomholt, L.; Jaschinsky, P.; Choi, K.-H.; Gutsch, M.; Sailer, H.; Martens, S.
Conference Paper
2009Verfahren zur Bestimmung von Parametern einer Proximity-Funktion, insbesondere fuer die Korrektur des Proximity-Effekts bei der Elektronenstrahllithografie
Hauptmann, M.; Steidel, K.; Jaschinsky, P.; Choi, K.; Gutsch, M.
Patent