Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Six-layer lamination of a new dry film negative-tone photoresist for fabricating complex 3D microfluidic devices
El Hasni, Akram; Pfirrmann, Stefan; Kolander, Anett; Yacoub-George, Erwin; König, Martin; Landesberger, Christof; Voigt, Anja; Grützner, Gabi; Schnakenberg, Uwe
Journal Article
2014Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL-resists
Thesen, Manuel; Rumler, Maximilian; Schlachter, Florian; Grützner, Susanne; Moormann, Christian; Rommel, Mathias; Nees, Dieter; Ruttloff, Stephan; Pfirrmann, Stefan; Vogler, Marko; Schleunitz, Arne; Grützner, Gabi
Conference Paper
2014Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography
Thesen, M.W.; Nees, D.; Ruttloff, S.; Rumler, Maximilian; Rommel, Mathias; Schlachter, F.; Grützner, S.; Vogler, M.; Schleunitz, A.; Grützner, G.
Journal Article
2014Photo-curable resists for inkjet dispensing applied in large area and high throughput roll-to-roll nanoimprint processes
Thesen, M.W.; Ruttloff, S.; Limberg, R.P.F.; Vogler, M.; Nees, D.; Grützner, G.
Journal Article
2007Innovative materials tailored for advanced micro-optic applications
Himmelhuber, R.; Fink, M.; Pfeiffer, K.; Ostrzinski, U.; Klukowska, A.; Grützner, G.; Houbertz, R.; Wolter, H.
Conference Paper
2007Investigations on possibilities of inline inspection of high aspect ratio microstructures
Engelke, R.; Ahrens, G.; Arndt-Staufenbiehl, N.; Kopetz, S.; Wiesauer, K.; Löchel, B.; Schröder, H.; Kastner, J.; Neyer, A.; Stifter, D.; Grützner, G.
Conference Paper, Journal Article
2007Organisches optoelektronisches Bauelement
Janietz, S.; Wedel, A.; Ruhmann, R.; Voigt, A.; Gruetzner, G.; Trenkler, T.
Patent
2005Polymerwellenleiter fuer opto-elektrische Schaltungstraeger
Pfeiffer, K.; Ostrzinski, U.; Schroeder, H.; Bauer, J.; Gruetzner, G.
Patent
2005A single layer negative tone lift-off photo resist for patterning a magnetron sputtered Ti/Pt/Au contact system and for solder bumps
Töpper, M.; Voigt, A.; Heinrich, M.; Hauck, K.; Mientus, R.; Gruetzner, G.; Ehrmann, O.
Conference Paper
2002Polymer stamps for nanoimprinting
Pfeiffer, K.; Fink, M.; Ahrens, G.; Gruetzner, G.; Reuther, F.; Seekamp, J.; Zankovych, S.; Torres, C.M.S.; Maximov, I.; Beck, M.; Graczy, M.; Montelius, L.; Schulz, H.; Scheer, H.-C.; Steingrüber, F.
Journal Article
1997Dependence of the quality of thick resist structures on resist baking
Bleidiessel, G.; Grützner, G.; Reuther, F.; Fehlberg, S.; Löchel, B.; Maciossek, A.
Conference Paper
1997A new generation of negative tone photoresists: ma-N 400
Grützner, G.; Fehlberg, S.; Voigt, A.; Löchel, B.; Rothe, M.
Journal Article
1996Application of optical lithography for high aspect ratio microstructures
Löchel, B.; Demmeler, R.; Rothe, M.; Brünger, W.; Grützner, G.; Fehlberg, S.
Journal Article
1996Influence of resist baking on the pattern quality of thick photoresist
Löchel, B.; Rothe, M.; Grützner, G.; Fehlberg, S.; Beidießel, G.
Conference Paper