Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Time-sequential working wavelength-selective filter for flat autostereoscopic displays
Barré, René de la; Bartmann, Roland; Jurk, Silvio; Kuhlmey, Mathias; Duckstein, Bernd; Seeboth, Arno; Lötzsch, Detlef; Rabe, Christian; Frach, Peter; Bartzsch, Hagen; Gittner, Matthias; Bruns, Stefan; Schottner, Gerhard; Fischer, Johanna
Journal Article
2016Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode
Barth, Stephan; Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Gittner, Mathias; Labitzke, Rainer
Journal Article, Conference Paper
2016Towards tuneable thin film filters with the use of liquid crystals
Bartzsch, H.; Frach, P.; Gittner, M.; Bruns, S.; Vergöhl, M.; Seeboth, A.; Lötzsch, D.; Rabe, C.
Conference Paper
2015Adjustment of Plasma Properties in Magnetron sputtering by Pulsed Powering in Mixed Unipolar and Bipolar Mode
Barth, Stephan; Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Gittner, Matthias; Labitzke, Rainer
Conference Paper
2012Low demage magnetron sputtering of TCO films
Bartzsch, H.; Glöß, D.; Frach, P.; Gittner, M.; Gottfried, C.; Suzuki, K.
Conference Paper
2012Reactive pulse magnetron sputtering for deposition of piezoelectric AlN layers
Glöß, D.; Bartzsch, H.; Gittner, M.; Frach, P.; Herzog, T.; Walter, S.; Heuer, H.
Conference Paper
2011Piezoelectric behaviour of sputtered aluminium nitride thin film for high frequency ultrasonic sensors
Herzog, T.; Walter, S.; Bartzsch, H.; Gittner, M.; Gloess, D.; Heuer, H.
Conference Paper
2011Properties of piezoelectric AlN layers deposited by reactive pulse magnetron sputtering
Bartzsch, H.; Gittner, M.; Glöß, D.; Frach, P.; Herzog, T.; Walter, S.; Heuer, H.
Conference Paper
2009Electrical insulation properties of sputter-deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 degrees C
Bartzsch, H.; Glöß, D.; Frach, P.; Gittner, M.; Schultheiß, E.; Brode, W.; Hartung, J.
Journal Article, Conference Paper
2009Highly insulating Al2O3, SiO2, and Si3N4 films for sensor applications deposited by reactive pulse magnetron sputtering
Frach, P.; Bartzsch, H.; Glöß, D.; Gittner, M.; Schultheiß, E.; Brode, W.; Hartung, J.
Conference Paper