Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2013Bimodal CAFM TDDB distributions in polycrystalline HfO2 gate stacks: The role of the interfacial layer and grain boundaries
Iglesias, V.; Martin-Martinez, J.; Porti, M.; Rodriguez, R.; Nafria, M.; Aymerich, X.; Erlbacher, T.; Rommel, M.; Murakami, K.; Bauer, A.J.; Frey, L.; Bersuker, G.
Journal Article
2013Conceptional design of nano-particulate ITO inks for inkjet printing of electron devices
Kölpin, Nadja; Wegener, Moritz; Teuber, Erik; Polster, Sebastian; Frey, Lothar; Roosen, Andreas
Journal Article
2013Influence of parasitic capacitances on conductive AFM I-V measurements and approaches for its reduction
Rommel, Mathias; Jambreck, Joachim D.; Lemberger, Martin; Bauer, Anton J.; Frey, Lothar; Murakami, Katsuhisa; Richter, Christoph; Weinzierl, Philipp
Journal Article
20124H-SiC MOSFETs with a stable protective coating for harsh environment applications
Daves, W.; Krauss, A.; Häublein, V.; Bauer, A.J.; Frey, L.
Conference Paper
2012Amplitude modulated resonant push-pull driver for piezoelectric transformers in switching power applications
Schwarzmann, Holger; Erlbacher, Tobias; Bauer, Anton J.; Ryssel, Heiner; Frey, Lothar
Conference Paper
2012Approaches for the reduction of the influence of parasitic capacitances on local IV characteristics for conductive AFM
Rommel, Mathias; Jambreck, Joachim D.; Murakami, Katsuhisa; Lemberger, Martin; Richter, Christoph; Weinzierl, Philip; Bauer, Anton J.; Frey, Lothar
Presentation
2012Characterization of grain boundaries in multicrystalline silicon with high lateral resolution using conductive atomic force microscopy
Rumler, Maximilian; Rommel, Mathias; Erlekampf, Jürgen; Azizi, Maral; Geiger, Tobias; Bauer, Anton J.; Meißner, Elke; Frey, Lothar
Journal Article
2012Effect of HfO2 polycrystallinity on distribution of the CAFM-induced TDDB in high-k gate stacks
Iglesias, V.; Erlbacher, T.; Rommel, M.; Murakami, K.; Bauer, A.J.; Frey, L.; Porti, M.; Martin-Martinez, J.; Rodriguez, R.; Nafria, M.; Aymerich, X.; Bersuker, G.
Poster
2012Efficient laser induced consolidation of nanoparticulate ZnO thin films with reduced thermal budget
Baum, M.; Polster, S.; Jank, M.P.M.; Alexeev, I.; Frey, L.; Schmidt, M.
Journal Article
2012Evaluation of resistless Ga+ beam lithography for UV-NIL stamp fabrication
Rumler, Maximilian; Fader, Robert; Haas, Anke; Rommel, Matthias; Bauer, Anton J.; Frey, Lothar
Poster
2012Fabrication and application of shielded probes for conductive AFM measurements
Jambreck, Joachim D.; Rommel, Mathias; Richter, Christoph; Weinzierl, Philip; Bauer, Anton J.; Frey, Lothar
Poster
2012Feasibility and limitations of anti-fuses based on bistable non-volatile switches for power electronic applications
Erlbacher, T.; Huerner, A.; Bauer, A.J.; Frey, L.
Journal Article
2012Feasiblity and limitations of anti-fuses based on bistable non-volatile switches for power electronic applications
Erlbacher, Tobias; Hürner A.; Bauer, Anton J.; Frey, Lothar
Journal Article
2012Ferroelectricity in simple binary ZrO2 and HfO2
Müller, J.; Böscke, T.S.; Schröder, U.; Mueller, S.; Bräuhaus, D.; Böttger, U.; Frey, L.; Mikolajick, T.
Journal Article
2012Functional epoxy polymer for direct nano-imprinting of micro optical elements
Fader, Robert; Landwehr Johannes; Rumler, Maximilian; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar; Völkel, Reinhard; Brehm, Markus; Kraft, Andreas
Poster
2012Improving module performance and reliability in power electronic applications by monolithic integration of RC-snubbers
Erlbacher, Tobias; Schwarzmann, Holger; Bauer, Anton J.; Berberich, Sven E.; Dorp, Joachim vom; Frey, Lothar
Conference Paper
2012In situ monitoring technologies for ammonthermal reactors
Alt, N.; Meissner, E.; Schlücker, E.; Frey, L.
Journal Article
2012Life time evaluation of PDMS stamps for UV-enhanced substrate conformal imprint lithography
Schmitt, H.; Duempelmann, P.; Fader, R.; Rommel, M.; Bauer, A.J.; Frey, L.; Brehm, M.; Kraft, A.
Journal Article, Conference Paper
2012Nanoscale characterization of TiO2 films grown by atomic layer deposition
Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar; Hudec, Boris; Rosova, A.; Hueková, K.; Fröhlich, Karol; Kasikov, A.; Ramula, R.; Aarik, J.; Han, J.H.; Han, S.; Lee, W.; Song, S.J.; Hwang, C.S.
Poster
2012Nanosecond polarization switching and long retention in a novel MFIS-FET based on ferroelectric HfO2
Müller, J.; Böscke, T.S.; Schröder, U.; Hoffmann, R.; Mikolajick, T.; Frey, L.
Journal Article
2012Novel cost-efficient contactless distributed monitoring concept for smart battery cells
Lorentz, V.R.H.; Wenger, M.M.; Grosch, J.L.; Giegerich, M.; Jank, M.P.M.; März, M.; Frey, L.
Conference Paper
2012Novel organic polymer for UV-enhanced substrate conformal imprint lithography
Fader, R.; Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.; Ji, R.; Hornung, M.; Brehm, M.; Vogler, M.
Journal Article, Conference Paper
2012Ohmic and rectifying contacts on bulk AlN for radiation detector applications
Erlbacher, Tobias; Bickermann, Matthias; Kallinger, Birgit; Meissner, Elke; Bauer, Anton J.; Frey, Lothar
Journal Article, Conference Paper
2012Plasma-assisted atomic layer deposition of alumina at room temperature
Lemberger, Martin; Fromm, Timo; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar
Poster
2012Purity of ion beams: Analysis and simulation of mass spectra and mass interferences in ion implantation
Häublein, V.; Ryssel, H.; Frey, L.
Journal Article
2012Reliability characterization of dielectrics in 200V trench capacitors
Erlbacher, Tobias; Schwarzmann, Holger; Bauer, Anton J.; Dorp, Joachim vom; Frey, Lothar
Poster
2012Significant on-resistance reduction of LDMOS devices by intermitted trench gates integration
Erlbacher, Tobias; Bauer, Anton J.; Frey, Lothar
Journal Article
2012Simple and efficient method to fabricate nano cone arrays by FIB milling demonstrated on planar substrates and on protruded structures
Rommel, M.; Bauer, A.J.; Frey, L.
Journal Article, Conference Paper
2012Structural and reliability analysis of ohmic contacts to SiC with a stable protective coating for harsh environment applications
Daves, W.; Kraus, A.; Häublein, V.; Bauer, A.J.; Frey, L.
Journal Article
20114H-SiC n-MOSFET logic circuits for high temperature operation
Le-Huu, M.; Grieb, M.; Schrey, F.F.; Schmitt, H.; Häublein, V.; Bauer, A.J.; Ryssel, H.; Frey, L.
Conference Paper
2011Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications
Daves, W.; Krauss, A.; Behnel, N.; Häublein, V.; Bauer, A.; Frey, L.
Journal Article
2011Analysis of the effect of germanium preamorphization on interface defects and leakage current for high-k metal-oxide-semiconductor field-effect transistor
Roll, G.; Jakschik, S.; Goldbach, M.; Wachowiak, A.; Mikolajick, T.; Frey, L.
Journal Article, Conference Paper
2011Characterization of thickness variations of thin dielectric layers at the nanoscale using scanning capacitance microscopy
Yanev, V.; Rommel, M.; Bauer, A.J.; Frey, L.
Journal Article, Conference Paper
2011Comparative study on metallization and passivation materials for high temperature sensor applications
Daves, W.; Krauss, A.; Le-Huu, M.; Kronmüller, S.; Häublein, V.; Bauer, A.J.; Frey, L.
Conference Paper
2011Conduction mechanisms and environmental sensitivity of solution-processed silicon nanoparticle layers for thin-film transistors
Weis, S.; Körmer, R.; Jank, M.P.M.; Lemberger, M.; Otto, M.; Ryssel, H.; Peukert, W.; Frey, L.
Journal Article
2011Conversion efficiency of radiation damage profiles into hydrogenrelated donor profiles
Laven, J.G.; Job, R.; Schustereder, W.; Schulze, H.-J.; Niedernostheide, F.-J.; Schulze, H.; Frey, L.
Conference Paper
2011Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy
Murakami, K.; Rommel, M.; Yanev, V.; Bauer, A.J.; Frey, L.
Poster
2011Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy
Murakami, Katsuhisa; Rommel, Mathias; Yanev, Vasil; Bauer, Anton J.; Frey, Lothar
Conference Paper
2011Dielectric layers suitable for high voltage integrated trench capacitors
Dorp, J. vom; Erlbacher, T.; Bauer, A.J.; Ryssel, H.; Frey, L.
Journal Article
2011Dopant profiles in silicon created by MeV hydrogen implantation: Influence of annealing parameters
Laven, J.G.; Schulze, H.-J.; Häublein, V.; Niedernostheide, F.-J.; Schulze, H.; Ryssel, H.; Frey, L.
Journal Article
2011Effects of oxygen and forming gas annealing on ZnO TFTs
Huang, J.; Radhakrishna, U.; Lemberger, M.; Jank, M.P.M.; Polster, S.; Ryssel, H.; Frey, L.
Conference Paper
2011Enhancement of the stability of Ti and Ni ohmic contacts to 4H-SiC with a stable protective coating for harsh environment applications
Daves, W.; Krauss, A.; Häublein, V.; Bauer, A.J.; Frey, L.
Journal Article
2011EPR investigations of non-oxidized silicon nanoparticles from thermal pyrolysis of silane
Körmer, R.; Otto, M.; Wu, J.; Jank, M.P.M.; Frey, L.; Peukert, W.
Journal Article
2011Experiments and simulation of the diffusion and activation of the n-Type dopants P, As, and Sb implanted into germanium
Koffel, S.; Kaiser, R.J.; Bauer, A.J.; Amon, B.; Pichler, P.; Lorenz, J.; Frey, L.; Scheiblin, P.; Mazzocchi, V.; Barnes, J.-P.; Claverie, A.
Journal Article, Conference Paper
2011Ferroelectric Zr0.5Hf0.5O2 thin films for nonvolatile memory applications
Müller, J.; Böscke, T.S.; Bräuhaus, D.; Schröder, U.; Böttger, U.; Sundqvist, J.; Kcher, P.; Mikolajick, T.; Frey, L.
Journal Article
2011Ferroelectricity in yttrium-doped hafnium oxide
Müller, J.; Schröder, U.; Böscke, T.S.; Müller, I.; Böttger, U.; Wilde, L.; Sundqvist, J.; Lemberger, M.; Kücher, P.; Mikolajick, T.; Frey, L.
Journal Article
2011Fluorine implantation for effective work function control in p-type metal-oxide-semiconductor high-k metal gate stacks
Fet, A.; Häublein, V.; Bauer, A.J.; Ryssel, H.; Frey, L.
Journal Article, Conference Paper
2011Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie. Leistungen und Ergebnisse. Jahresbericht 2010
: Richter, T.; Frey, L.
Annual Report
2011Gate oxide reliability at the nano-scale evaluated by combining cAFM and CVS
Erlbacher, T.; Yanev, V.; Rommel, M.; Bauer, A.J.; Frey, L.
Journal Article, Conference Paper
2011Germanium substrate loss during thermal processing
Kaiser, R.J.; Koffel, S.; Pichler, P.; Bauer, A.J.; Amon, B.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
2011A highly sensitive evaluation method for the determination of different current conduction mechanisms through dielectric layers
Murakami, M.; Rommel, M.; Yanev, V.; Erlbacher, T.; Bauer, A.J.; Frey, L.
Journal Article
2011Impact of carbon junction implant on leakage currents and defect distribution: Measurement and simulation
Roll, G.; Jakschik, S.; Burenkov, A.; Goldbach, M.; Mikolajick, T.; Frey, L.
Journal Article, Conference Paper
2011Implication of oxygen vacancies on current conduction mechanisms in TiN/Zr1-xAlxO2/TiN metal-insulator-metal structures
Paskaleva, A.; Lemberger, M.; Bauer, A.J.; Frey, L.
Journal Article
2011Influence of annealing parameters on surface roughness, mobility, and contact resistance of aluminium implanted 4H SiC
Schmitt, H.; Häublein, V.; Bauer, A.J.; Frey, L.
Conference Paper
2011Investigation of the reliability of 4H-SiC MOS devices for high temperature applications
Le-Huu, M.; Schmitt, H.; Noll, S.; Grieb, M.; Schrey, F.F.; Bauer, A.J.; Frey, L.; Ryssel, H.
Journal Article
2011Leakage current and defect characterization of p+n-source/drain diodes
Roll, G.; Goldbach, M.; Frey, L.
Journal Article
2011Life time evaluation of PDMS stamps for UV-enhanced substrate conformal imprint lithography
Schmitt, H.; Duempelmann, P.; Fader, R.; Rommel, M.; Bauer, A.J.; Frey, L.; Brehm, M.; Kraft, A.
Poster
2011Light confinement by structured metal tips for antenna-based scanning near-field optical microscopy
Jambreck, J.D.; Böhmler, M.; Rommel, M.; Hartschuh, A.; Bauer, A.J.; Frey, L.
Conference Paper
2011Manufacturing, characterization, and application of nanoimprinted metallic probe demonstrators for electrical scanning probe microscopy
Jambreck, J.D.; Yanev, V.; Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.
Journal Article, Conference Paper
2011Modulares Steuerungskonzept für integrierte Messtechnik in der Halbleiterfertigung am Beispiel einer Mehrkammerprozessanlage
Schellenberger, Martin
: Ryssel, H.; Frey, L.
Dissertation
2011Monolithic RC-snubber for power electronic applications
Dorp, Joachim vom; Berberich, Sven E.; Erlbacher, Tobias; Bauer, Anton J.; Ryssel, Heiner; Frey, Lothar
Conference Paper
2011Novel polymers for UV-enhanced substrate conformal imprint lithography
Fader, R.; Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.; Ji, R.; Hornung, M.; Brehm, M.; Vogler, M.
Poster
2011A novel PWM control for a bi-directional full-bridge DC-DC converter with smooth conversion mode transitions
Lorentz, V.R.H.; Schwarzmann, H.; März, M.; Bauer, A.J.; Ryssel, H.; Frey, L.; Poure, P.; Braun, F.
Journal Article
2011Properties of SiO2 and Si3N4 as gate dielectrics for printed ZnO transistors
Walther, S.; Polster, S.; Meyer, B.; Jank, M.; Ryssel, H.; Frey, L.
Journal Article, Conference Paper
2011Simple and efficient method to fabricate nano-cone arrays by FIB milling demonstrated on planar substrates and on protruded structures
Rommel, M.; Bauer, A.J.; Frey, L.
Poster
2011Thermal characterization of an axle-twin-drive with system integrated double-inverter
Hofmann, M.; Eckardt, B.; März, M.; Frey, L.
Conference Paper
2011Tuning of charge carrier density of ZnO nanoparticle films by oxygen plasma treatment
Walther, S.; Polster, S.; Jank, M.P.M.; Thiem, H.; Ryssel, H.; Frey, L.
Journal Article
2011UV-enhanced substrate conformal imprint lithography using an epoxy based polymer
Fader, R.; Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.; Ji, R.; Hornung, M.; Brehm, M.; Kraft, A.
Poster
2010Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
Hinz, J.; Bauer, A.J.; Frey, L.
Journal Article
2010Carbon junction implant: Effect on leakage currents and defect distribution
Roll, G.; Jakschik, S.; Goldbach, M.; Mikolajick, T.; Frey, L.
Conference Paper
2010Characterization of thickness variations of thin dielectric layers at a nanoscale using Scanning Capacitance Microscopy
Yanev, V.; Rommel, M.; Bauer, A.J.; Frey, L.
Poster
2010Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques
Rommel, M.; Spoldi, G.; Yanev, V.; Beuer, S.; Amon, B.; Jambreck, J.; Petersen, S.; Bauer, A.J.; Frey, L.
Journal Article
2010Deep doping profiles in silicon created by MeV hydrogen implantation: Influence of implantation parameters
Laven, J.G.; Schulze, H.-J.; Häublein, V.; Niedernostheide, F.-J.; Schulze, H.; Ryssel, H.; Frey, L.
Conference Paper
2010Direct imprinting, post processing, and characterization of functional UV-curing materials
Schmitt, H.; Kett, F.; Fader, R.; Rommel, M.; Bauer, A.J.; Hornung, M.; Frey, L.
Poster
2010Effective work function tuning in high-kappa dielectric metal-oxide-semiconductor stacks by fluorine and lanthanide doping
Fet, A.; Häublein, V.; Bauer, A.J.; Ryssel, H.; Frey, L.
Journal Article
2010Effects of oxygen and forming gas annealing on ZnO-TFTs
Huang, J.; Krishna, U.R.; Lemberger, M.; Jank, M.P.M.; Polster, S.; Ryssel, H.; Frey, L.
Poster
2010Effizienzoptimierung integrierter elektrischer Antriebssysteme für Hybrid- und Elektrofahrzeuge
Hofmann, M.; Eckardt, B.; März, M.; Frey, L.
Conference Paper
2010Electrical scanning probe microscopy techniques for the detailed characterization of high-k dielectric layers
Rommel, M.; Yanev, V.; Paskaleva, A.; Erlbacher, T.; Lemberger, M.; Bauer, A.J.; Frey, L.
Conference Paper
2010Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
Hinz, J.; Bauer, A.J.; Thiede, T.; Fischer, R.A.; Frey, L.
Journal Article
2010Evolution of shear strength and microstructure of die bonding technologies for high temperature applications during thermal aging
Egelkraut, S.; Frey, L.; Knoerr, M.; Schletz, A.
Conference Paper
2010Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing
Jambreck, J.D.; Schmitt, H.; Amon, B.; Rommel, M.; Bauer, A.J.; Frey, L.
Journal Article, Conference Paper
2010Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie. Leistungen und Ergebnisse. Jahresbericht 2009
: Richter, T.; Frey, L.
Annual Report
2010Full wafer microlens replication by UV imprint lithography
Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.; Bich, A.; Eisner, M.; Völkel, R.; Hornung, M.
Conference Paper, Journal Article
2010Future challenges in CMOS process modelling
Pichler, P.; Burenkov, A.; Lorenz, J.; Kampen, C.; Frey, L.
Journal Article, Conference Paper
2010Highly sensitive wavefront sensor for visual inspection of bare and patterned silicon wafers
Lazareva, I.; Nutsch, A.; Schellenberger, M.; Pfitzner, L.; Frey, L.
Conference Paper
2010Honeycomb voids due to ion implantation in germanium
Kaiser, R.J.; Koffel, S.; Pichler, P.; Bauer, A.J.; Amon, B.; Claverie, A.; Benassayag, G.; Scheiblin, P.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
2010Impact of forming gas annealing on ZnO-TFTs
Huang, J.; Krishna, U.R.; Lemberger, M.; Jank, M.P.M.; Ryssel, H.; Frey, L.
Conference Paper
2010The impact of helium co-implantation on hydrogen induced donor profiles in float zone silicon
Laven, J.G.; Job, R.; Schulze, H.-J.; Niedernostheide, F.-J.; Häublein, V.; Schulze, H.; Schustereder, W.; Ryssel, H.; Frey, L.
Conference Paper
2010The impact of helium co-implantation on hydrogen induced donor profiles in float zone silicon
Schulze, H.-J.; Niedernostheide, F.-J.; Häublein, V.; Schulze, H.; Schustereder, W.; Ryssel, H.; Frey, L.; Job, R.; Laven, J.G.
Journal Article, Conference Paper
2010Influence of annealing parameters on surface roughness, mobility, and contact resistance of aluminum implanted 4H SiC
Schmitt, H.; Häublein, V.; Bauer, A.J.; Frey, L.
Poster
2010Influence of annealing temperature and measurement ambient on TFTs based on gas phase synthesized ZnO nanoparticles
Walther, S.; Schäfer, S.; Jank, M.P.M.; Thiem, H.; Peukert, W.; Ryssel, H.; Frey, L.
Journal Article
2010Influence of FIB patterning strategies on the shape of 3D structures: Comparison of experiments with simulations
Rommel, M.; Jambreck, J.D.; Ebm, C.; Platzgummer, E.; Bauer, A.J.; Frey, L.
Journal Article, Conference Paper
2010Integrierbare Bauelemente zur Erhöhung der Betriebssicherheit elektronischer Systemkomponenten im Automobil
Dorp, J. vom; Erlbacher, T.; Lorentz, V.; Bauer, A.J.; Ryssel, H.; Frey, L.
Conference Paper
2010Lanthanoid implantation for effective work function control in NMOS high-k/metal gate stacks
Fet, A.; Häublein, V.; Bauer, A.J.; Ryssel, H.; Frey, L.
Conference Paper
2010Manufacturing, characterization, and application of nanoimprinted metallic probe demonstrators for electrical scanning probe microscopy
Jambreck, J.D.; Yanev, V.; Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.
Poster
2010Modeling of the effective work function instability in metal/high-kappa dielectric stacks
Fet, A.; Häublein, V.; Bauer, A.J.; Ryssel, H.; Frey, L.
Journal Article
2010Nanoimprinted metallic probe demonstrators for electrical scanning probe microscopy: Manufacturing, characterization, and application
Jambreck, J.D.; Yanev, V.; Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.
Poster
2010NMOS logic circuits using 4H-SiC MOSFETs for high temperature applications
Le-Huu, M.; Schrey, F.F.; Grieb, M.; Schmitt, H.; Häublein, V.; Bauer, A.J.; Ryssel, H.; Frey, L.
Conference Paper
2010Optical inspection of flat reflective surfaces by a wave front sensor
Lazareva, I.; Nutsch, A.; Pfitzner, L.; Frey, L.
Conference Paper
2010Polymer bonded soft magnetics for EMI filter applications in power electronics
Engelkraut, S.; Ryssel, H.; Frey, L.; Rauch, M.; Schletz, A.; März, M.
Conference Paper
2010Reduced on resistance in LDMOS devices by integrating trench gates into planar technology
Erlbacher, T.; Bauer, A.J.; Frey, L.
Journal Article
2010Trench gate integration into planar technology for reduced on-resistance in LDMOS devices
Erlbacher, T.; Rattmann, G.; Bauer, A.J.; Frey, L.
Poster
2010Trench gate integration into planar technology for reduced on-resistance in LDMOS devices
Erlbacher, T.; Rattmann, G.; Bauer, A.J.; Frey, L.
Conference Paper
2010Virtual equipment engineering: A novel approach for the integrated development of semiconductor manufacturing equipment
Koitzsch, M.; Mattes, A.; Schellenberger, M.; Pfitzner, L.; Frey, L.
Conference Paper
2009Characterization of Organic Contamination during Semiconductor Manufacturing Processing Employing Near Edge X-Ray Absorption Fine Structure Spectroscopy
Mueller, M.; Beckhoff, B.; Bedana, P.; Borionetti, G.; Corradi, A.; Frey, L.; Guerinoni, G.; Leibold, A.; Otto, M.; Nutsch, A.; Müller, M.; Beckhoff, B.; Bedana, P.; Borionetti, G.; Corradi, A.; Frey, L.; Guerinoni, G.; Leibold, A.; Otto, M.; Nutsch, A.
Journal Article, Abstract
2009Characterization of organic contamination in semiconductor manufacturing processes
Nutsch, A.; Beckhoff, B.; Bedana, G.; Borionetti, G.; Codegoni, D.; Grasso, S.; Guerinoni, G.; Leibold, A.; Müller, M.; Otto, M.; Pfitzner, L.; Polignano, M.; Simone, D. de; Frey, L.
Conference Paper
2009Comparative study between conventional macroscopic IV techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscale
Yanev, V.; Erlbacher, T.; Rommel, M.; Bauer, A.J.; Frey, L.
Journal Article
2009Comparative study between conventional macroscopic IV techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscale
Yanev, V.; Erlbacher, T.; Rommel, M.; Bauer, A.J.; Frey, L.
Poster
2009Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing
Jambreck, J.D.; Schmitt, H.; Amon, B.; Rommel, M.; Bauer, A.J.; Frey, L.
Poster
2009Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie. Leistungen und Ergebnisse. Jahresbericht 2008
: Öchsner, R.; Frey, L.
Annual Report
2009Full wafer microlens replication by UV imprint lithography
Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.; Bich, A.; Eisner, M.; Voelkel, R.; Hornung, M.
Poster
2009Highly sensitive wavefront sensor for characterization of micro- to nanometer-scale surface flatness deviations
Lazareva, I.; Nutsch, A.; Pfitzner, L.; Frey, L.
Conference Paper
2009Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition
Müller, J.; Böscke, T.S.; Schröder, U.; Reinicke, M.; Oberbeck, L.; Zhou, D.; Weinreich, W.; Kücher, P.; Lemberger, M.; Frey, L.
Conference Paper, Journal Article
2009Influence of FIB patterning strategies on the shape of 3D structures: Comparison of experiments with simulations
Rommel, M.; Jambreck, J.; Ebm, C.; Platzgummer, E.; Bauer, A.; Frey, L.
Poster, Conference Paper
2009Lanthanum implantation for threshold voltage control in metal/high-k devices
Fet, A.; Häublein, V.; Bauer, A.J.; Ryssel, H.; Frey, L.
Conference Paper, Journal Article
2008Self-aligned growth of organometallic layers for nonvolatile memories: Comparison of liquid-phase and vapor-phase deposition
Erlbacher, T.; Jank, M.P.M.; Ryssel, H.; Frey, L.; Engl, R.; Walter, A.; Sezi, R.; Dehm, C.
Journal Article
2008Simulation of mass interferences considering charge exchange events and dissociation of molecular ions during extraction
Häublein, V.; Frey, L.; Ryssel, H.
Conference Paper
2007MOCVD of hafnium silicate films obtained from a single-source precursor on silicon and germanium for gate-dielectric applications
Lemberger, M.; Schön, F.; Dirnecker, T.; Jank, M.P.M.; Frey, L.; Ryssel, H.; Paskaleva, A.; Zürcher, S.; Bauer, A.J.
Journal Article
2007UV nanoimprint materials: Surface energies, residual layers, and imprint quality
Schmitt, H.; Frey, L.; Ryssel, H.; Rommel, M.; Lehrer, C.
Journal Article
2006Extracting activation and compensation ratio from aluminum implanted 4H-SiC by modeling of resistivity measurements
Rambach, M.; Frey, L.; Bauer, A.J.; Ryssel, H.
Conference Paper
2006The impact of mass resolution on molybdenum contamination for B, P, BF, and as implantations
Häublein, V.; Frey, L.; Ryssel, H.
Conference Paper
2006Ion implantation and annealing for an efficient N-doping of TiO2 nanotubes
Ghicov, A.; Macak, J.M.; Tsuchiya, H.; Kunze, J.; Haeublein, V.; Frey, L.; Schmuki, P.
Journal Article
2006Nanoscale morphology and photoemission of arsenic implanted germanium films
Petö, G.; Khanh, N.Q.; Horvath, Z.E.; Molnar, G.; Gyulai, J.; Kotai, E.; Guczi, L.; Frey, L.
Journal Article
2006Simulation of ion beam direct structuring for 3D nanoimprint template fabrication
Platzgummer, E.; Biedermann, A.; Langfischer, H.; Eder-Kapl, S.; Kuemmel, M.; Cernusca, S.; Loeschner, H.; Lehrer, C.; Frey, L.; Lugstein, A.; Bertagnolli, E.
Conference Paper, Journal Article
2006Well design in a bulk CMOS technology with low mask count
Jank, M.P.M.; Kandziora, C.; Frey, L.; Ryssel, H.
Conference Paper
2005Additional peaks in mass spectra due to charge exchange events and dissociation of molecular ions during extraction
Häublein, V.; Frey, L.; Ryssel, H.
Conference Paper
2005Annealing of aluminum implanted 4H-SiC
Rambach, M.; Bauer, A.J.; Frey, L.; Friedrichs, P.; Ryssel, H.
Conference Paper
2005Characterization of interface state densities by photocurrent analysis. Comparison of results for different insulator layers
Rommel, M.; Groß, M.; Ettinger, A.; Bauer, A.J.; Frey, L.; Ryssel, H.
Poster
2005Characterization of interface state densities by photocurrent analysis: Comparison of results for different insulator layers
Rommel, M.; Groß, M.; Ettinger, A.; Lemberger, M.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper, Journal Article
2005Electrical properties of hafnium silicate films obtained from a single-source MOCVD precursor
Lemberger, M.; Paskaleva, A.; Zurcher, S.; Bauer, A.J.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
2005High-k hafnium silicate films on silicon and germanium wafers by MOCVD using a single-source precursor
Lemberger, M.; Schön, F.; Dirnecker, T.; Jank, M.P.M.; Paskaleva, A.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper
2005Implantation and annealing of aluminum in 4H silicon carbide
Rambach, M.; Frey, L.; Bauer, A.J.; Ryssel, H.
Conference Paper
2005Investigations into the wear of a WL10 ion source
Häublein, V.; Sadrawetz, S.; Frey, L.; Martinz, H.-P.; Ryssel, H.
Conference Paper
2005Stempel für Mikrochips
Frey, L.; Fischer, B.
Journal Article
2005Thin Hf(x)Ti(y)Si(z)O films with varying Hf to Ti contents as candidates for high-k dielectrics
Bauer, A.J.; Paskaleva, A.; Lemberger, M.; Frey, L.; Ryssel, H.
Conference Paper
2005Triple trench gate IGBTs
Berberich, S.E.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper
2005Wafer scale characterization of interface state densities without test structures by photocurrent analysis
Rommel, M.; Groß, M.; Frey, L.; Bauer, A.J.; Ryssel, H.
Conference Paper
2004Design, fabrication and characterization of a microactuator for nebulization of fluids
Yasenov, N.; Berberich, S.E.; Frey, L.; Ryssel, H.
Conference Paper
2004Electrical characterization and reliability aspects of zirconium silicate films obtained from novel MOCVD precursors
Lemberger, M.; Paskaleva, A.; Zurcher, S.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper, Journal Article
2004Integration of field emitters into scanning probe microscopy sensors using focused ion and electron beams
Lehrer, C.; Frey, L.; Petersen, S.; Ryssel, H.; Schäfer, M.; Sulzbach, T.
Journal Article
2004Investigation of rapid thermal annealed pn-junctions in SiC
Rambach, M.; Weiss, R.; Frey, L.; Bauer, A.J.; Ryssel, H.
Conference Paper
2003Different ion implanted edge terminations for Schottky diodes on SiC
Weiss, R.; Frey, L.; Ryssel, H.
Conference Paper
2003Electrical characterization of zirconium silicate films obtained from novel MOCVD precursors
Lemberger, M.; Paskaleva, A.; Zürcher, S.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper, Journal Article
2003ENCOTION - A new simulation tool for energetic contamination analysis
Häublein, V.; Frey, L.; Ryssel, H.
Conference Paper
2003Influence of antenna shape and resist patterns on charging damage during ion implantation
Dirnecker, T.; Bauer, A.J.; Beyer, A.; Frey, L.; Henke, D.; Ruf, A.; Ryssel, H.
Conference Paper
2003Investigation of implantation-induced defects in thin gate oxides using low field tunnel currents
Jank, M.; Frey, L.; Bauer, A.J.; Ryssel, H.
Conference Paper
2003Investigation of lanthanum contamination from a lanthanated tungsten ion source
Häublein, V.; Walser, H.; Frey, L.; Ryssel, H.
Conference Paper
2003Materialbearbeitung mittels fokussierter Ionenstrahlen zur TEM-Probenpräparation und Nanostrukturierung
Frey, L.; Lehrer, C.
Journal Article
2003Materials processing by focused ion-beams for TEM sample preparation and nanostructuring
Frey, L.; Lehrer, C.
Journal Article
2003Nanoscale effects in focused ion beam processing
Frey, L.; Lehrer, C.; Ryssel, H.
Journal Article
2003ROENTGENSTRAHLQUELLE MIT EINER KLEINEN BRENNFLECKGROESSE
Frey, L.; Lehrer, C.; Hanke, R.; Schmitt, P.
Patent
2003Surface properties and electrical characteristics of rapid thermal annealed 4H-SiC
Bauer, A.J.; Rambach, M.; Frey, L.; Weiss, R.; Rupp, R.; Friedrichs, P.; Schörner, R.; Peters, D.
Conference Paper
2003Trench sidewall doping for lateral power devices
Berberich, S.E.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper
2003Zirconium silicate films obtained from novel MOCVD precursors
Lemberger, M.; Paskaleva, A.; Zürcher, S.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper, Journal Article
2002Development of enhanced depth-resolution technique for shallow dopant profiles
Fujita, M.; Tajima, J.; Nakagawa, T.; Abo, S.; Kinomura, A.; Paszti, F.; Takai, M.; Schork, R.; Frey, L.; Ryssel, H.
Journal Article
2002Effect of barium contamination on gate oxide integrity in high-k DRAM
Boubekeur, H.; Mikolajick, T.; Nagel, N.; Bauer, A.; Frey, L.; Ryssel, H.
Journal Article
2002Influence of photoresist pattern on charging damage during high current ion implantation
Dirnecker, T.; Ruf, A.; Frey, L.; Beyer, A.; Bauer, A.J.; Henke, D.; Ryssel, H.
Conference Paper
2002MOCVD of titanium dioxide on the basis of new precursors
Leistner, T.; Lehmbacher, K.; Härter, P.; Schmidt, C.; Bauer, A.J.; Frey, L.; Ryssel, H.
Journal Article
2002Platinum contamination issues in ferroelectric memories
Boubekeur, H.; Mikolajick, T.; Pamler, W.; Hopfner, J.; Frey, L.; Ryssel, H.
Journal Article
2002Verfahren zur Herstellung einer hochtemperaturfesten Verbindung zwischen zwei Wafern
Kroener, F.; Fischer, K.; Frey, L.
Patent
2002Verkohltes Silizium. Neues Halbleitermaterial für die Leistungselektronik
Frey, L.; März, M.
Journal Article
2001Barium, strontium and bismuth contamination in CMOS processes
Boubekeur, H.; Mikolajick, T.; Höpfner, J.; Dehm, C.; Pamler, W.; Steiner, J.; Kilian, G.; Kolbesen, B.O.; Bauer, A.; Frey, L.; Ryssel, H.
Conference Paper
2001Electrical reliability aspects of through the gate implanted MOS-structures with thin oxides
Jank, M.; Lemberger, M.; Bauer, A.J.; Frey, L.; Ryssel, H.
Journal Article
2001Fabrication of silicon aperture probes for scanning near-field optical microscopy by focused Ion beam nano machining
Lehrer, C.; Frey, L.; Petersen, S.; Sulzbach, T.; Ohlsson, O.; Dziomba, T.; Danzebrink, H.U.; Ryssel, H.
Journal Article
2001High-resolution constant-height imaging with apertured silicon cantilever probes
Dziomba, T.; Danzebrink, H.U.; Lehrer, C.; Frey, L.; Sulzbach, T.; Ohlsson, O.
Journal Article
2001Impact of platinum contamination on ferroelectric memories
Boubekeur, H.; Mikolajick, T.; Nagel, N.; Dehm, C.; Pamler, W.; Bauer, A.; Frey, L.; Ryssel, H.
Journal Article
2001Limitations of focused ion beam nanomachining
Lehrer, C.; Frey, L.; Petersen, S.; Ryssel, H.
Journal Article
2001Tungsten, Nickel, and Molybdenum Schottky Diodes with Different Edge Termination
Weiss, R.; Frey, L.; Ryssel, H.
Journal Article
2000Aspects of barium contamination in high dielectric dynamic random-access memories
Boubekeur, H.; Hopfner, J.; Mikolajick, T.; Dehm, C.; Frey, L.; Ryssel, H.
Journal Article
2000Defects and gallium - contamination during focused ion beam micro machining
Lehrer, C.; Frey, L.; Petersen, S.; Mizutani, M.; Takai, M.; Ryssel, H.
Conference Paper
2000Enhanced depth-resolution analysis with medium energy ion scattering (MEIS) for shallow junction profiling
Tajima, J.; Park, Y.K.; Fujita, M.; Takai, M.; Schork, R.; Frey, L.; Ryssel, H.
Conference Paper
2000Field emitter array fabricated using focused ion and electron beam induced reaction
Yavas, O.; Ochiai, C.; Takai, M.; Park, Y.K.; Lehrer, C.; Lipp, S.; Frey, L.; Ryssel, H.; Hosono, A.; Okuda, S.
Journal Article
2000Gate oxide damage due to through the gate implantation in MOS-structures with ultrathin and standard oxides
Jank, M.P.M.; Lemberger, M.; Frey, L.; Ryssel, H.
Conference Paper
2000Phosphorus ion shower implantation for special power IC applications
Kröner, F.; Schork, R.; Frey, L.; Burenkov, A.; Ryssel, H.
Conference Paper
2000Wafer conserving full range construction analysis for IC fabrication and process development based on FIB/dual beam inline application
Boit, C.; Dawes, N.; Dziesiaty, A.; Demm, E.; Ebersberger, B.; Frey, L.; Geyer, S.; Hirsch, A.; Lehrer, C.; Meis, P.; Kamolz, M.; Lezec, H.; Rettenmaier, H.; Tittes, W.; Treichler, R.; Weiland, R.; Zimmermann, H.
Conference Paper
1999AFM and STM investigation of carbon nanotubes produced by high energy ion irradiation of graphite
Biro, L.P.; Mark, G.I.; Gyulai, J.; Havancszak, K.; Lipp, S.; Lehrer, C.; Frey, L.; Ryssel, H.
Journal Article
1999Carbon nanotubes produced by high energy (E greater than 100MeV), heavy ion irradiation of graphite
Biro, L.P.; Szabo, B.; Mark, G.I.; Gyulai, J.; Havancsak, K.; Kurti, J.; Dunlop, A.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
1999Comparison of beam-induced deposition using ion microprobe
Park, Y.S.; Nagai, T.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
1999Comparison of FIB-induced physical and chemical etching
Park, Y.K.; Paszti, F.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H.
Conference Paper
1999Forming nitrided gate oxides by nitrogen implantation into the substrate before gate oxidation by RTO
Bauer, A.J.; Mayer, P.; Frey, L.; Häublein, V.; Ryssel, H.
Conference Paper
1999Impact of nitrogen implantation into polysilicon to reduce boron penetration through the gate oxide
Bauer, A.J.; Mayer, P.; Frey, L.; Häublein, V.; Ryssel, H.
Conference Paper
1999Impurity incorporation during beam assisted processing analyzed using nuclear microprobe
Park, Y.K.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
1999Investigation of Cu films by focused ion beam induced deposition using nuclear microprobe
Park, Y.K.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H.
Journal Article
1999Ion beam-treated silicon probes operated in transmission and cross-polarized reflection mode near- infrared scanning near-field optical microscopy (NIR-SNOM)
Dziomba, T.; Sulzbach, T.; Ohlsson, O.; Lehrer, C.; Frey, L.; Danzebrink, H.U.
Journal Article
1999MOCVD of ferroelectric thin films
Schmidt, C.; Lehnert, W.; Leistner, T.; Frey, L.; Ryssel, H.
Conference Paper
1999Nano-slit probes for near-field optical microscopy fabricated by focused ion beams
Danzebrink, H.U.; Dziomba, T.; Sulzbach, T.; Ohlsson, T.; Lehrer, C.; Frey, L.
Journal Article
1999Scanning probe method investigation of carbon nanotubes produced by high energy ion irradiation of graphite
Biro, L.P.; Mark, G.I.; Gyulai, J.; Rozlosnik, N.; Kurti, J.; Szabo, B.; Frey, L.; Ryssel, H.
Journal Article
1998Distortion of SIMS Profiles due to Ion Beam Mixing: Shallow Arsenic Implants in Silicon
Montandon, C.; Burenkov, A.; Frey, L.; Pichler, P.; Biersack, J.P.
Journal Article
1998Fabrication of field emitter array using focused ion and electron beam induced reaction
Takai, M.; Kishimoto, T.; Morimoto, H.; Park, Y.K.; Lipp, S.; Lehrer, C.; Frey, L.; Ryssel, H.; Hosono, A.; Kawabuchi, S.
Conference Paper
1998Microanalysis of masklessly fabricated microstructures using nuclear microprobe
Park, Y.K.; Takai, M.; Nagai, T.; Kishimoto, T.; Seidl, A.; Lehrer, C.; Frey, L.; Ryssel, H.
Conference Paper, Journal Article
1998Microprobe analysis of Pt films deposited by beam induced reaction
Park, Y.K.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H.
Journal Article
1998Surface disorder production during plasma immersion implantation
Lohner, T.; Khanh, N.Q.; Petrik, P.; Biro, L.P.; Fried, M.; Pinter, I.; Lehnert, W.; Frey, L.; Ryssel, H.; Wentnik, D.J.; Gyulai, J.
Conference Paper
1997Distortion of SIMS profiles due to ion beam mixing
Saggio, M.; Montandon, C.; Burenkov, A.; Frey, L.; Pichler, P.
Conference Paper
1997In-depth damage distribution by scanning probe methods in targets irradiated with 200 MeV ions
Biro, L.P.; Gyulai, J.; Havancsak, K.; Didyk, A.Y.; Frey, L.; Ryssel, H.
Journal Article
1997Measurement of shallow arsenic impurity profiles in semiconductor silicon using ToF-SIMS and TXRF
Schwenke, H.; Knoth, J.; Fabry, L.; Pahlke, S.; Scholz, R.; Frey, L.
Journal Article
1997New method based on atomic force microscopy for in-depth characterization of damage in Si irradiated with 209 MeV Kr
Biro, L.P.; Gyulai, J.; Havancsak, K.; Didyk, A.Y.; Bogen, S.; Frey, L.; Ryssel, H.
Journal Article
1997Range and damage distributions in ultra low-energy boron ion implantation
Hatzopoulos, N.; Suder, S.; Berg, J. van den; Donnelly, S.E.; Armour, D.G.; Panknin, D.; Fukark, W.; Frey, L.; Foad, M.A.; Moffatt, S.; Bailey, P.; Noakes, C.T.Q.
Conference Paper
1997Reduction of lateral parasitic current flow by buried recombination layers formed by high-energy implantation of C or O into silicon
Bogen, S.; Herden, M.; Frey, L.; Ryssel, H.
Conference Paper
1997SiC formation by high-temperature carbon implantation into SiO2, the role of Si/SiO2 interface
Frey, L.; Stoemenos, J.; Schork, R.; Nejim, A.; Hemment, P.L.
Journal Article
1996A comparison of focused ion beam and electron beam induced deposition processes
Lipp, S.; Frey, L.; Lehrer, C.; Demm, C.; Pauthner, S.; Ryssel, H.
Conference Paper, Journal Article
1996Investigations on the topology of structures milled and etched by focused ion beams
Lipp, S.; Frey, L.
Journal Article
1996Modification of field emitter array tip shape by focused ion-beam irradiation
Takai, M.; Kishimoto, T.; Yamashita, M.; Morimoto, H.; Yura, S.; Hosono, A.; Okuda, S.; Lipp, S.; Frey, L.; Ryssel, H.
Journal Article
1996Modifikation integrierter Schaltungen mittels fokussierter Ionenstrahlen. Ein Weg zur schnellen Bereitstellung und Optimierung von ASICs
Frey, L.; Lipp, S.
Book Article
1996Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiO(x)) deposition
Lipp, S.; Frey, L.; Lehrer, C.; Frank, B.; Demm, E.; Pauthner, S.; Ryssel, H.
Journal Article
1995Analysis of contamination - a must for ultraclean technology
Ryssel, H.; Streckfuß, N.; Aderhold, W.; Berger, R.; Falter, T.; Frey, L.
Conference Paper
1995Comparison of retrograde and conventional p-wells in regard latch-up susceptibility
Bogen, S.; Gong, L.; Frey, L.; Ryssel, H.; Körber, K.
Journal Article
1995Gitterdeformation in Silicium nach Implantationen von Phosphor
Remmler, M.; Frey, L.; Ryssel, H.
Conference Paper
1995Improved delineation technique for two dimensional dopant profiling
Gong, L.; Petersen, S.; Frey, L.; Ryssel, H.
Journal Article
1995Local material removal by focused ion beam milling and etching
Lipp, S.; Frey, L.; Franz, G.; Demm, E.; Petersen, S.; Ryssel, H.
Journal Article
1995Local material removal by focused ion beam milling and etching
Lipp, K.; Frey, L.; Franz, G.; Demm, E.; Petersen, S.; Ryssel, H.
Conference Paper
1995Model for the electronic stopping of channeled ions in silicon around the stopping power maximum
Simionescu, A.; Hobler, G.; Bogen, S.; Frey, L.; Ryssel, H.
Journal Article
1995Recombination of charge carriers in buried layers formed by high energy oxygen or carbon implantation into silicon
Bogen, S.; Frey, L.; Herder, M.; Ryssel, H.
Conference Paper
1995Strain profiles in phosphorus implanted /100/-silicon
Remmler, M.; Frey, L.; Horvath, Z.E.; Ryssel, H.
Conference Paper
1994Analytical description of high energy implantation profiles of bordon and phosphorus into crystalline silicon
Gong, L.; Bogen, S.; Frey, L.; Jung, W.; Ryssel, H.
Journal Article
1994Investigation of the effect of altered defect structure produced by photon assisted the diffusion of As in silicon during thermal anneallagation
Biro, L.P.; Gyulai, J.; Bogen, S.; Frey, L.; Ryssel, H.
Journal Article
1994Practical aspects of ion beam analysis of semiconductor structures
Frey, L.; Pichler, P.; Kasko, I.; Thies, I.; Lipp, S.; Streckfuß, N.; Gong, L.
Journal Article
1993Contamination control and ultrasensitive chemical analysis
Ryssel, H.; Frey, L.; Streckfuß, N.; Schork, R.; Kroninger, F.; Falter, T.
Journal Article
1993Effect of ion-beam mixing temperature on cobalt silicide formation
Kasko, I.; Dehm, C.; Frey, L.; Ryssel, H.
Journal Article
1993High energy implantation of high10 B and high11 B into -100- silicon in channel and in random
Gong, L.; Frey, L.; Bogen, S.; Ryssel, H.
Journal Article
1993A novel delineation technique for 2D-profiling of dopants in crystalline silicon
Gong, L.; Frey, L.; Bogen, S.; Ryssel, H.
Journal Article
1993Photon assisted implantation -PAI-
Biro, L.P.; Gyulai, J.; Ryssel, H.; Frey, L.; Kormany, T.; Tuan, N.M.
Journal Article
1992Characterization of metal impurities in silicon-on-insulator material
Frey, L.; Kroninger, F.; Streckfuß, N.; Ryssel, H.
Conference Paper
1992High energy ion implantation for semiconductor application at Fraunhofer-AIS, Erlangen
Frey, L.; Bogen, S.; Gong, L.; Jung, W.; Gyulai, J.; Ryssel, H.
Journal Article
1991Effect of oxygen on the formation of end-of-range disorder in implantation amorphized silicon
Frey, L.; Khanh, N.Q.; Gyulai, J.; Lorenz, E.
Journal Article