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| 2012 | Low demage magnetron sputtering of TCO films
Bartzsch, H.; Glöß, D.; Frach, P.; Gittner, M.; Gottfried, C.; Suzuki, K. | Conference Paper |
| 2012 | Magnetron assisted PECVD process for deposition of a-Si:H and µc-Si:H from a silane-hydrogen-argon gas mixture
Frach, P.; Pötschick, P.; Bartzsch, H.; Delan, A. | Conference Paper |
| 2012 | A novel nanoparticle source for vacuum deposition
Schmittgens, R.; Holst, E.; Gerlach, G.; Bartzsch, H.; Glöß, D.; Maicu, M.; Frach, P. | Conference Paper |
| 2012 | Präzisionsbeschichtung für Optik, Sensorik und Elektronik
Frach, Peter; Potinecke, Thomas; Slama, Alexander; Bartzsch, Hagen; Glöß, Daniel; Mehlstäubl, Marita | Book Article |
| 2012 | Pulse Magnetron Sputtering with High Power Density-Process and Film Properties
Frach, P.; Gottfried, C.; Fietzke, F.; Klostermann, H.; Bartzsch, H.; Gloess, D. | Conference Paper |
| 2012 | Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor deposition
Täschner, K.; Bartzsch, H.; Frach, P.; Schultheiss, E. | Journal Article, Conference Paper |
| 2011 | Anti-infective coatings based on dispersed TiO2 nanoparticles in polymer matrices
Rothe, H.; Glöß, D.; Frach, P.; Rose, K.; Kron, J.; Liefeith, K. | Journal Article |
| 2011 | High rate reactive sputter deposition of TiO2 films for photocatalyst and dye-sensitized solar cells
Sato, Y.; Hashimoto, T.; Miyamura, A.; Ohno, S.; Oka, N.; Suzuki, K.; Glöß, D.; Frach, P.; Shigesato, Y. | Journal Article |
| 2011 | Photocatalytic TiO2 films deposited by different methods
Vergöhl, M.; Althues, H.; Frach, P.; Glöß, D.; Graumann, T.; Hübner, C.; Neumann, F.; Neubert, T.; Schottner, G.; Song, D.-K. | Journal Article |
| 2011 | Process control in sputtering of optical coatings
Frach, P.; Bartzsch, H.; Glöß, D.; Täschner, K. | Conference Paper |
| 2011 | Properties of piezoelectric AlN layers deposited by reactive pulse magnetron sputtering
Bartzsch, H.; Gittner, M.; Glöß, D.; Frach, P.; Herzog, T.; Walter, S.; Heuer, H. | Conference Paper |
| 2011 | Reactive pulse magnetron sputtering for deposition of piezoelectric AlN layers
Glöß, D.; Bartzsch, H.; Gittner, M.; Frach, P.; Herzog, T.; Walter, S.; Heuer, H. | Conference Paper |
| 2010 | Advanced key technologies for magnetron sputtering and PECVD of inorganic and hybrid transparent coatings
Frach, P.; Glöß, D.; Bartzsch, H.; Täschner, K.; Liebig, J.; Schultheiss, E. | Journal Article |
| 2010 | Measurement of the photocatalytic activity of TiO2 films deposited by different methods
Vergöhl, M.; Althues, H.; Frach, P.; Glöß, D.; Graumann, T.; Hübner, C.; Neumann, F.; Neubert, T.; Schottner, G.; Song, D.K. | Conference Paper |
| 2010 | Multifunctional optical coatings on polymers deposited by pulse magnetron sputtering and magnetron enhanced PECVD
Frach, P.; Bartzsch, H.; Täschner, K.; Liebig, J.-S. | Journal Article, Conference Paper |
| 2010 | Scratch resistant optical coatings on polymers by magnetron-PECVD
Taeschner, K.; Bartzsch, H.; Frach, P.; Schultheiß, E. | Conference Paper |
| 2010 | Verfahren zum Abscheiden dielektrischer Schichten im Vakuum sowie Verwendung des Verfahrens
Bartzsch, H.; Frach, P.; Fahland, M.; Gottfried, C.; Pötschick, P. | Patent |
| 2009 | Electrical insulation properties of sputter-deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 degrees C
Bartzsch, H.; Glöß, D.; Frach, P.; Gittner, M.; Schultheiß, E.; Brode, W.; Hartung, J. | Journal Article, Conference Paper |
| 2009 | Highly insulating Al2O3, SiO2, and Si3N4 films for sensor applications deposited by reactive pulse magnetron sputtering
Frach, P.; Bartzsch, H.; Glöß, D.; Gittner, M.; Schultheiß, E.; Brode, W.; Hartung, J. | Conference Paper |
| 2009 | Multifunctional optical coatings on polymers deposited by pulse magnetron sputtering and magnetron enhanced PECVD
Frach, P.; Bartzsch, H.; Taeschner, K.; Liebig, J.; Schultheiß, E. | Conference Paper |
| 2008 | Effect of structure and morphology on photocatalytic properties of TiO2 layers
Zywitzki, O.; Modes, T.; Frach, P.; Glöß, D. | Conference Paper, Journal Article |
| 2008 | Electrically insulating Al2O3 and SiO2 films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activated deposition and magnetron-PECVD
Frach, P.; Bartzsch, H.; Glöß, D.; Fahland, M.; Händel, F. | Journal Article, Conference Paper |
| 2008 | Multifunctional high-reflective and antireflective layer systems with easy-to-clean properties
Glöß, D.; Frach, P.; Gottfried, C.; Klinkenberg, S.; Liebig, J.-S.; Hentsch, W.; Liepack, H.; Krug, M. | Conference Paper, Journal Article |
| 2008 | Reactive magnetron sputter technologies for precision optical and antireflective coatings on glass and polymer substrates
Bartzsch, H.; Frach, P.; Lau, K.; Weber, J. | Conference Paper |
| 2008 | Reactive pulse magnetron sputtered SiOxNy coatings on polymers
Lau, K.; Weber, J.; Bartzsch, H.; Frach, P. | Conference Paper |
| 2008 | Sputter deposition of silicon oxynitride gradient and multilayer coatings
Weber, J.; Bartzsch, H.; Frach, P. | Journal Article |
| 2008 | Sputter process with time-variant reactive gas mixture for the deposition of optical multilayer and gradient layer systems
Bartzsch, H.; Weber, J.; Lau, K.; Glöß, D.; Frach, P. | Conference Paper |
| 2008 | Verfahren zum Abscheiden einer Gradientenschicht auf einem Kunststoffsubstrat sowie Kunststoffsubstrat mit einer Gradientenschicht
Bartzsch, H.; Taeschner, K.; Meyer, B.; Frach, P.; Kubusch, J. | Patent |
| 2008 | Verfahren zum Abscheiden einer Kratzschutzbeschichtung auf einem Kunststoffsubstrat
Bartzsch, H.; Frach, P.; Taeschner, K.; Gloess, D.; Gottfried, C.; Fahland, M. | Patent |
| 2007 | Chic und funktional. Dünne Funktionsschichten für die Veredelung großflächiger Konstruktionsmaterialien im Innen- und Außenbereich
Rögner, F.-H.; Metzner, C.; Scheffel, B.; Fietzke, F.; Frach, P.; Hübner, C. | Journal Article |
| 2007 | Physikalisch-chemische und mikrobiologische Wirkung gesputterter photokatalytischer Titanoxid-Schichten
Frach, P.; Glöß, D.; Vergöhl, M.; Hund-Rinke, K.; Trick, I. | Journal Article |
| 2007 | Plasma for surface technology - examples of current developments
Bräuer, G.; Diehl, W.; Frach, P.; Kirchhoff, V.; Sittinger, V.; Szyszka, B.; Vergöhl, M. | Conference Paper |
| 2007 | Plasma for surface technology - examples of current developments
Bräuer, G.; Diehl, W.; Frach, P.; Kirchhoff, V.; Sittinger, B.; Szyszka, B.; Vergöhl, M. | Conference Paper |
| 2007 | Process technology, applications and potentials of magnetron sputtering technology for optical coatings
Vergöhl, M.; Frach, P.; Bartzsch, H.; Pflug, A.; Rickers, C. | Conference Paper |
| 2006 | "SV in-line" equipment concept with uninterrupted stream of substrate carriers for reactive sputtered optical multi layer coatings
Hentsch, W.; Fendler, R.; Krug, M.; Liepack, H.; Goedicke, K.; Frach, P.; Gottfried, C. | Conference Paper |
| 2006 | A controlled pulsed reactive magnetron sputtering process for oxide film deposition
Kupfer, H.; Kleinhempel, R.; Herrmann, M.; Welzel, T.; Richter, F.; Krause, U.; Kopte, T.; Peters, C.; Frach, P.; Cheng, Y. | Conference Paper |
| 2006 | Decomposition ability and bioactivity of photocatalytic TiO2 based layers prepared by reactive pulse magnetron sputtering
Frach, P.; Glöß, D.; Zywitzki, O.; Vergöhl, M.; Neumann, F.; Hund-Rinke, K.; Trick, I. | Conference Paper |
| 2006 | Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation
Frach, P.; Glöß, D.; Metzner, C.; Modes, T.; Scheffel, B.; Zywitzki, O. | Conference Paper, Journal Article |
| 2006 | Effect of magnetron sputtered semiconducting TiO2 layers on the performance of dye sensitized solar cells
Frach, P.; Klinkenberg, S.; Kuang, D.; Zakeerruddin, S.-M.; Murakami,T.-N.; Liska, P.; Grätzel, M. | Conference Paper |
| 2006 | Elektrode fuer elektrochemische Farbstoffzelle und Verfahren zum Herstellen derselben
Frach, P.; Gloess, D.; Klinkenberg, S.; Kopte, T.; Fahland, M.; Metzner, C.; Zywitzki, O.; Scheffel, B. | Patent |
| 2006 | High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems
Ohno, S.; Kawaguchi, Y.; Miyamura, A.; Sato, Y.; Song, P.K.; Yoshikawa, M.; Frach, P.; Shigesato, Y. | Journal Article |
| 2006 | Innovations in stationary magnetron sputtering of optical coatings
Bartzsch, H.; Frach, P.; Weber, J. | Conference Paper |
| 2006 | Multi-functional high-reflective and anti-reflective layer systems with easy-to-clean properties
Glöß, D.; Frach, P.; Gottfried, C.; Klinkenberg, S.; Liebig, J.-S.; Hentsch, W.; Liepack, H.; Krug, M. | Conference Paper |
| 2006 | Nutzung des Pulsmodus als technologischer Parameter beim reaktiven Puls Magnetron Sputtern
Frach, P.; Bartzsch, H.; Glöß, D.; Kirchhoff, V. | Conference Paper |
| 2006 | Oberflaechenveredeltes Objekt, Verfahren zu dessen Herstellung sowie Verwendung des Objektes
Fietzke, F.; Goedicke, K.; Gloess, D.; Frach, P. | Patent |
| 2006 | Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Ohno, S.; Takasawa, N.; Sato, Y.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y. | Journal Article, Conference Paper, Journal Article |
| 2006 | Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings
Lange, S.; Bartzsch, H.; Frach, P.; Goedicke, K. | Conference Paper, Journal Article |
| 2006 | Verfahren zum Vakuumbeschichten mit einer photohalbleitenden Schicht und Anwendung des Verfahrens
Frach, P.; Gloess, D.; Goedicke, K.; Klinkenberg, S.; Gottfried, C.; Kirchhoff, V. | Patent |
| 2005 | Deposition of broadband antireflection coatings on plastic substrates by evaporation and reactive pulse magnetron sputtering
Weber, J.; Schulz, U.; Kaiser, N.; Bartzsch, H.; Frach, P. | Conference Paper |
| 2005 | Easy-to-clean coatings produced by high-rate pulse magnetron sputtering and plasma-activated evaporation
Glöß, D.; Frach, P.; Metzner, C.; Modes, T.; Zywitzki, O.; Scheffel, B. | Conference Paper |
| 2005 | Einrichtung zum Beschichten eines stationaer angeordneten Substrats durch Puls-Magnetron-Sputtern
Frach, P.; Goedicke, K.; Gottfried, C. | Patent |
| 2005 | Innovative stationary and in-line sputter technologies for precision optical coatings
Frach, P.; Bartzsch, H.; Liebig, J. | Conference Paper |
| 2005 | Innovative stationary sputter technologies for precision optical and antireflection coatings
Bartzsch, H.; Frach, P.; Hentsch, W. | Conference Paper |
| 2005 | Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature
Glöß, D.; Frach, P.; Zywitzki, O.; Modes, T.; Klinkenberg, S.; Gottfried, C. | Journal Article |
| 2005 | Photokatalytische Eigenschaften von gesputterten dotierten TiO2 Schichten
Vergöhl, M.; Neumann, F.; Frach, P.; Glöß, D. | Conference Paper |
| 2005 | Precision optical and antireflection multilayer and gradient coatings containing reactively sputtered oxides, nitrides and fluorides
Bartzsch, H.; Frach, P.; Weber, J.; Liebig, J.-S. | Conference Paper |
| 2005 | Transparente und farbige Kratzschutzschichten
Metzner, C.; Morgner, H.; Scheffel, B.; Fietzke, F.; Frach, P. | Journal Article |
| 2005 | Verfahren zur Herstellung eines Duennschichtsystems durch Puls-Magnetron-Sputtern
Goedicke, K.; Frach, P.; Bartzsch, H.; Kirchhoff, V.; Labitzke, R. | Patent |
| 2005 | Vorrichtung und Verfahren zum Aufbringen eines Duennschichtsystems mittels Zerstaeuben
Bartzsch, H.; Frach, P.; Goedicke, K.; Lange, S. | Patent |
| 2004 | Einrichtung und Verfahren zum Beschichten von Substraten
Frach, P.; Bartzsch, H.; Goedicke, K.; Winkler, T.; Liebig, J.; Kirchhoff, V. | Patent |
| 2004 | Einrichtung zum Beschichten durch Magnetron-Sputtern
Liebig, J.; Kirchhoff, V.; Goedicke, K.; Winkler, T.; Frach, P. | Patent |
| 2004 | Getting smarter
Neumann, F.; Vergöhl, M.; Frach, P.; Glöß, D. | Journal Article |
| 2004 | Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering
Bartzsch, H.; Lange, S.; Frach, P.; Goedicke, K. | Conference Paper, Journal Article |
| 2004 | Katodenzerstaeubungsverfahren
Bartzsch, H.; Gottfried, C.; Frach, P.; Goedicke, K.; Lange, S. | Patent |
| 2004 | Photocatalytic properties of doped TiO2 and of Ti-based mixed oxide thin films prepared by reactive pulse magnetron sputtering
Vergöhl, M.; Frach, P.; Neumann, F.; Hunsche, B.; Glöß, D. | Conference Paper |
| 2004 | Photocatalytic properties of TiO2 films deposited by reactive sputtering in mid-frequency mode with dual cathodes
Ohno, S.; Sato, D.; Kon, M.; Sato, Y.; Yoshikawa, M.; Frach, P.; Shigesato, Y. | Journal Article |
| 2004 | Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings
Lange, S.; Bartzsch, H.; Frach, P.; Goedicke, K. | Conference Paper |
| 2004 | Silicon oxynitride rugate filters grown by reactive pulse magnetron sputtering
Bartzsch, H.; Lange, S.; Frach, P.; Goedicke, K. | Conference Paper |
| 2004 | Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering
Zywitzki, O.; Modes, T.; Sahm, H.; Frach, P.; Goedicke, K.; Gloss, D. | Conference Paper, Journal Article |
| 2004 | Transparente und farbige Kratzschutzschichten für Anwendungen im Innen-und Außenbereich
Metzner, C.; Morgner, H.; Scheffel, B.; Fietzke, F.; Frach, P. | Conference Paper |
| 2004 | Ultra high-rate deposition of photocatalytic TiO2 films by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Takasawa, N.; Ohno, S.; Sato, D.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y. | Conference Paper |
| 2004 | Verfahren zum Bipolar-Magnetronsputtern
Liebig, J.; Kirchhoff, V.; Goedicke, K.; Frach, P.; Winkler, T. | Patent |
| 2003 | Abscheidung optisch, elektrisch und akustisch wirksamer Schichten mit dem Doppel-Ring-Magnetron
Bartzsch, H.; Frach, P.; Goedicke, K. | Journal Article |
| 2003 | Effect of pulse mode in reactive magnetron sputtering on structure and properties of titanium dioxide films
Frach, P.; Glöß, D.; Goedicke, K.; Zywitzki, O.; Sahm, H.; Modes, T. | Conference Paper |
| 2003 | Effect of pulse mode in reactive magnetron sputtering on structure and properties of titanium dioxide films
Frach, P.; Zywitzki, O.; Goedicke, K.; Boecher, B.; Glöß, D.; Gottfried, C. | Conference Paper |
| 2003 | High Quality Photocatalytic TiO2 Films Deposited by Reactive Sputtering in Mid-Frequency Mode with Dual Cathodes
Ohno, S.; Sato, D.; Kon, M.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y. | Conference Paper |
| 2003 | High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications
Frach, P.; Glöß, D.; Goedicke, K.; Fahland, M.; Gnehr, W.-M. | Conference Paper, Journal Article |
| 2003 | Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
Kon, M.; Song, P.K.; Shigesato, Y.; Frach, P.; Ohno, S.; Suzuki, K. | Journal Article |
| 2003 | Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films
Ohno, S.; Sato, D.; Kon, M.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y. | Conference Paper, Journal Article |
| 2003 | Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering
Bartzsch, H.; Glöß, D.; Bocher, B.; Frach, P.; Goedicke, K. | Journal Article, Conference Paper |
| 2002 | Al-doped ZnO films deposited by reactive magnetron sputtering in r.f. mode with a single cathode and m.f. mode with dual cathodes
Kon, M.; Shigesato, Y.; Song, P.K.; Frach, P.; Kojima, H.; Suzuki, K. | Journal Article |
| 2002 | Energetic substrate bonbardment in reactive sputtering with flange-mounted magnetrons in different pulse modes
Bartzsch, H.; Frach, P.; Goedicke, K.; Gottfried, C. | Conference Paper |
| 2002 | Ensuring long term stability of process and film parameters during target lifetime in reactive magnetron sputtering
Bartzsch, H.; Frach, P.; Goedicke, K.; Böcher, B.; Gottfried, C. | Conference Paper |
| 2002 | Rutile and anatase phase TiO2 films obtained on unheated substrates by matched pulse mode and pulse parameters in reactive magnetron sputtering
Frach, P.; Zywitzki, O.; Goedicke, K.; Gottfried, C.; Klinkenberg, S.; Sahm, H.; Modes, T. | Conference Paper |
| 2001 | Einrichtung zum Magnetronzerstaeuben
Frach, P.; Goedicke, K.; Holfeld, A.; Gottfried, C. | Patent |
| 2001 | Einrichtung zum Magnetronzerstaeuben
Frach, P.; Goedicke, K.; Holfeld, A.; Gottfried, C.; Bartzsch, H. | Patent |
| 2001 | Einrichtung zur reaktiven Beschichtung
Frach, P.; Walde, H.; Gottfried, C.; Holfeld, A.; Goedicke, K. | Patent |
| 2001 | Influence of the unipolar or bipolar pulse mode in reactive magnetron sputtering on the deposition and properties of optical films
Frach, P.; Goedicke, K.; Gottfried, C.; Bartzsch, H.; Klinkenberg, S. | Conference Paper |
| 2001 | Modeling the stability of reactive sputtering processes
Bartzsch, H.; Frach, P. | Conference Paper |
| 2001 | Stationary reactive pulse magnetron sputtering of optical multilayers and gradient layers on 8" substrates
Frach, P.; Bartzsch, H.; Goedicke, K. | Conference Paper |
| 2001 | Verfahren und Einrichtung zur pulsfoermigen Energiezufuehrung fuer ein Niederdruckplasma und deren Anwendung
Frach, P.; Goedicke, K.; Junghaehnel, M.; Kirchhoff, V.; Winkler, T.; Handt, K. | Patent |
| 2001 | A versatile coating tool for reactive in-line sputtering in different pulse modes
Frach, P.; Goedicke, K.; Gottfried, C.; Bartzsch, H.; Klinkenberg, S. | Journal Article, Conference Paper |
| 2000 | Al-doped ZnO films deposited by reactive magnetron sputtering in r.f. mode with a single cathode and m.f. mode with dual cathodes
Kon, M.; Shigesato, Y.; Song, P.K.; Frach, P.; Kojima, H.; Suzuki, K. | Conference Paper |
| 2000 | Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering
Bartzsch, H.; Frach, P.; Goedicke, K. | Conference Paper |
| 2000 | ITO films deposited by dual magnetron sputtering (DMS) system using oxide targets
Shin, N.; Kon, M.; Song, P.K.; Shigesato, Y.; Frach, P.; Kojima, H.; Suzuki, K.; Utsumi, K. | Conference Paper |
| 2000 | Thin films TiO2 photocatalysis deposited by dual cathode magnetron sputtering
Kuriki, S.; Kon, M.; Sing. P.K.; Shigesato, Y.; Frach, P.; Kojima, H.; Suzuki, K. | Conference Paper |
| 1999 | Different pulse techniques for stationary reactive sputtering with double ring magnetron
Bartzsch, H.; Frach, P.; Goedicke, K.; Gottfried, C. | Journal Article |
| 1998 | Transformer-free semiconductor switches for the energization of a pulsed PVD plasma
Reschke, J.; Goedicke, K.; Junghähnel, M.; Frach, P.; Mark, G. | Conference Paper |
| 1998 | Verfahren zur reaktiven Beschichtung
Frach, P.; Gottfried, C.; Walde, H.; Goedicke, K. | Patent |
| 1997 | Advanced possibilities for the stationary coating of substrates by means of pulsed magnetron sputtering
Schiller, S.; Kirchhoff, V.; Goedicke, K.; Frach, P. | Conference Paper |
| 1997 | The double ring magnetron process module - a tool for stationary deposition of metals, insulators and reactive sputtered compounds
Frach, P.; Gottfried, C.; Bartzsch, H.; Goedicke, K. | Journal Article |
| 1997 | Verfahren zum Aufbringen von Kohlenstoffschichten durch reaktives Magnetron-Sputtern
Winkler, T.; Junghaehnel, M.; Goedicke, K.; Frach, P.; Mueller, M.; Haese, F.; Strecker, H.; Meyer, D.W. | Patent |
| 1996 | Numerical modelling of charged particle motion in electric and magnetic fields to assist magnetron design
Liebig, J.-S.; Frach, P.; Bartzsch, H.; Schulze, D.; Schwanbeck, H. | Conference Paper |
| 1996 | Verfahren und Schaltung zur bipolaren pulsfoermigen Energieeinspeisung in Niederdruckplasmen
Walde, H.; Reschke, J.; Goedicke, K.; Winkler, T.; Kirchhoff, V.; Frach, P. | Patent |
| 1995 | Advantageous possibilities, design aspects and technical use of double ring magnetron sputter source
Frach, P.; Goedicke, K.; Winkler, T.; Gottfried, C.; Walde, H.; Hentsch, W. | Conference Paper, Journal Article |
| 1993 | Aspects and results of long-term stable deposition of Al2O3 with high-rate pulsed reactive magnetron sputtering
Frach, P.; Heisig, U.; Gottfried, C.; Walde, H. | Conference Paper, Journal Article |
| 1993 | Einrichtung zum Aufbringen elektrisch schlecht leitender oder isolierender Schichten durch reaktives Magnetronsputtern
Gottfried, C.; Walde, H.; Frach, P.; Heisig, U. | Patent |
| 1992 | Zerstaeubungseinrichtung
Heisig, U.; Frach, P.; Liebergeld, H.; Holfeld, A.; Winkler, T. | Patent |
| 1992 | Zerstaeubungseinrichtung
Heisig, U.; Frach, P.; Goedicke, K. | Patent |